Description

The OPTOMAN PP-UVFS-25.4-6.35-LLM121 is a premium ion beam sputtered (IBS) ultrafast laser mirror engineered for simultaneous high-reflectivity performance at 1030 nm and 515 nm. Designed specifically for Yb-based femtosecond and picosecond laser systems, it enables efficient steering of both the fundamental wavelength and its second harmonic without changing optics. Its exceptionally low group delay dispersion (GDD) helps preserve ultrashort pulse duration, while the high-damage-threshold dielectric coating ensures reliable operation in demanding scientific and industrial laser applications.

Manufactured on a precision UV fused silica substrate with excellent surface flatness and optical quality, this 25.4 mm mirror delivers outstanding beam quality, low scattering, and long-term coating stability. It is an ideal choice for harmonic generation setups, precision micromachining, nonlinear optics, laser research, and advanced photonics systems where multi-wavelength performance and pulse integrity are essential. Product specifications and applications are based on the manufacturer's published data.

PP-UVFS-25.4-6.35-LLM121 Ultrafast Laser Mirror

Specifications

Diameter: 25.4 mm
Thickness: 6.35 mm
Wavelength Range: 1030 – 1030 nm
Clear Aperture (CA): 20 %
Substrate Material: UV Grade Fused Silica
Angle Of Incidence (AOI): 45 – 45 deg
Surface Quality, S1 (scratch-dig): 10-5
Surface Quality, S2 (scratch-dig): Inspection Polished
Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): Lambda/8
Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): Unspecified
Parallelism: 10 arcmin
S1 Surface: Coated
S2 Surface: Coated
Reflectivity (HRs @ AOI, @ Peak Wavelength): 99.9 %
Reflectivity (HRp @ AOI, @ Peak Wavelength): 99.9 %
GDD Rs @ AOI, @ Peak Wavelength: 10 fs^2
GDD Rp @ AOI, @ Peak Wavelength: 20 fs^2
Manufacturer Part Number (MPN): PP-UVFS-25.4-6.35-LLM121
FindLight SKU: FL-24435

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Features

  • Manufacturer Part Number: PP-UVFS-25.4-6.35-LLM121
  • High reflectivity (>99.9%) at both 1030 nm and 515 nm
  • Optimized for 45° angle of incidence
  • Ultra-low group delay dispersion for ultrafast pulse preservation
  • IBS dielectric coating for exceptional durability and long operational lifetime
  • UV fused silica substrate with excellent thermal and optical stability
  • Surface flatness better than λ/8 at 633 nm
  • 25.4 mm diameter with 6.35 mm thickness
  • High laser-induced damage threshold for high-power femtosecond and picosecond lasers
  • Suitable for simultaneous routing of the fundamental and second harmonic beams

Applications

  • Yb:YAG ultrafast laser systems
  • Femtosecond and picosecond laser beam steering
  • Harmonic generation (1030 nm / 515 nm)
  • Precision laser micromachining
  • Nonlinear optics experiments
  • Scientific laser laboratories
  • Optical beam delivery systems
  • Industrial laser processing
  • Ultrafast spectroscopy
  • Research and photonics instrumentation

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What wavelengths is the PP-UVFS-25.4-6.35-LLM121 optimized for?
This mirror is designed to provide greater than 99.9% reflectivity at both 1030 nm and 515 nm, allowing a single optic to efficiently handle the fundamental wavelength and its second harmonic.
Why is low group delay dispersion important?
Low GDD minimizes pulse broadening, helping maintain the duration and quality of ultrashort laser pulses, which is critical in femtosecond laser processing and precision scientific experiments.
Which laser systems is this mirror compatible with?
It is suitable for many Yb-based ultrafast laser platforms, including systems used for industrial micromachining, nonlinear optics, spectroscopy, and scientific research that operate at 1030 nm and generate a 515 nm second harmonic.
What coating technology is used?
The mirror uses an ion beam sputtered (IBS) dielectric coating, providing high reflectivity, excellent environmental stability, low optical losses, and a high laser-induced damage threshold for demanding laser applications.
What makes this mirror suitable for high-power ultrafast lasers?
Its combination of precision UV fused silica substrate, high-reflectivity IBS coating, low dispersion characteristics, excellent surface quality, and high damage resistance enables stable long-term performance in high-power ultrafast laser systems.

Got more questions? Use the inquiry form to ask the supplier directly.

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