Description

The OPTOMAN PP-UVFS-25.4-5.0-ULLM5 is a premium ultrafast laser mirror engineered for demanding femtosecond and picosecond laser systems. Manufactured on a UV fused silica substrate and coated using advanced ion beam sputtering (IBS) technology, this mirror delivers exceptionally high reflectivity, low optical losses, excellent environmental stability, and outstanding laser-induced damage threshold (LIDT).

With a 25.4 mm diameter and 5.0 mm thickness, this mirror provides an excellent balance of mechanical stability and compact integration. The ULLM5 coating series is optimized to preserve ultrashort pulse quality through low group delay dispersion (GDD), making it ideal for high-power ultrafast laser applications where beam quality and long-term reliability are critical.

Designed for research laboratories, OEM laser manufacturers, and industrial laser systems, the PP-UVFS-25.4-5.0-ULLM5 offers dependable optical performance for beam steering, laser cavities, amplification stages, and precision scientific instrumentation.

PP-UVFS-25.4-5.0-ULLM5 Ultrafast Laser Mirror

Specifications

Diameter: 25.4 mm
Thickness: 5 mm
Wavelength Range: 1010 – 1050 nm
Clear Aperture (CA): 216 %
Substrate Material: UV Grade Fused Silica
Angle Of Incidence (AOI): 45 – 45 deg
Surface Quality, S1 (scratch-dig): 20-10
Surface Quality, S2 (scratch-dig): Inspection Polished
Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): Lambda/6
Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): Unspecified
Parallelism: 2 arcmin
S1 Surface: Coated
S2 Surface: Uncoated
Reflectivity (HRs @ AOI, @ Peak Wavelength): 99.95 %
Reflectivity (HRp @ AOI, @ Peak Wavelength): 99.9 %
GDD Rs @ AOI, @ Peak Wavelength: 10 fs^2
GDD Rp @ AOI, @ Peak Wavelength: 20 fs^2
Manufacturer Part Number (MPN): PP-UVFS-25.4-5.0-ULLM5
FindLight SKU: FL-24444

Got questions about specs? Use the inquiry form to ask.

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Features

  • Manufacturer Part Number: PP-UVFS-25.4-5.0-ULLM5
  • UV fused silica (UVFS) substrate for excellent optical transmission and thermal stability
  • 25.4 mm diameter with 5.0 mm thickness for compact optical assemblies
  • Advanced IBS dielectric coating for exceptional durability and coating uniformity
  • Very high reflectivity optimized for ultrafast laser wavelengths
  • Low group delay dispersion (GDD) to minimize pulse distortion
  • High laser-induced damage threshold for demanding high-energy laser operation
  • Low absorption and scatter to maximize optical efficiency
  • Excellent environmental and long-term coating stability
  • Suitable for femtosecond and picosecond laser systems

Applications

  • Ultrafast femtosecond lasers
  • Picosecond laser systems
  • CPA laser amplifiers
  • Beam steering optics
  • Optical delay lines
  • High-power scientific lasers
  • Nonlinear optics experiments
  • Precision spectroscopy
  • Micromachining and laser material processing
  • Research and OEM photonics integration

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What is the PP-UVFS-25.4-5.0-ULLM5 designed for?
This mirror is designed for ultrafast laser applications where high reflectivity, minimal pulse distortion, and excellent laser damage resistance are required. It is well suited for femtosecond and picosecond laser systems used in scientific, industrial, and research environments.
Why is ion beam sputtering (IBS) coating beneficial?
IBS coatings produce dense, highly uniform dielectric films with extremely low absorption and scatter. They provide superior environmental durability, long-term stability, and high laser damage thresholds compared to many conventional coating technologies.
How does low GDD improve laser performance?
Low group delay dispersion helps preserve the duration and shape of ultrashort laser pulses. This minimizes pulse broadening and ensures maximum peak power reaches the target, which is essential in ultrafast laser applications.
Can this mirror be used in high-power laser systems?
Yes. The ULLM5 mirror family is specifically engineered for high-power ultrafast lasers and features coatings optimized for excellent laser-induced damage resistance, making it suitable for demanding continuous operation.
Which applications benefit most from this mirror?
The mirror is commonly used in laser amplifiers, beam delivery systems, spectroscopy setups, nonlinear optics, precision manufacturing, biomedical imaging, and advanced photonics research where stable, high-reflectivity optics are essential.

Got more questions? Use the inquiry form to ask the supplier directly.

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