Description

The OPTOMAN PP-UVFS-12.7-6.35-ULLM9 is a premium ion beam sputtered (IBS) ultrafast laser mirror engineered for demanding femtosecond and picosecond laser applications operating in the 500–530 nm spectral range. Built on a precision UV fused silica substrate with a 12.7 mm diameter and 6.35 mm thickness, this dielectric mirror delivers exceptionally high reflectivity, low group delay dispersion (GDD), and excellent wavefront preservation for ultrashort pulse manipulation.

Manufactured using OPTOMAN's advanced IBS coating technology, the mirror provides outstanding coating durability, low optical losses, and high resistance to laser-induced damage. These characteristics make it an excellent choice for high-power laser laboratories, OEM laser manufacturers, scientific instrumentation, nonlinear optics, and precision beam delivery systems where pulse fidelity and long-term stability are essential.

PP-UVFS-12.7-6.35-ULLM9 Ultrafast Laser Line Mirror

Specifications

Diameter: 12.7 mm
Thickness: 6.35 mm
Wavelength Range: 500 – 530 nm
Clear Aperture (CA): 80 %
Substrate Material: UV Grade Fused Silica
Angle Of Incidence (AOI): 0 – 0 deg
Surface Quality, S1 (scratch-dig): 10-5
Surface Quality, S2 (scratch-dig): Inspection Polished
Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): Lambda/8
Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): Unspecified
Parallelism: 5 arcmin
S1 Surface: Coated
S2 Surface: Uncoated
Reflectivity (HRa @ AOI, @ Peak Wavelength): 99.9 %
GDD R @ AOI, @ Peak Wavelength: 10 fs^2
Manufacturer Part Number (MPN): PP-UVFS-12.7-6.35-ULLM9
FindLight SKU: FL-24452

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Features

  • Manufacturer Part Number: PP-UVFS-12.7-6.35-ULLM9
  • Optimized for 500–530 nm ultrafast laser operation
  • Ultra-low Group Delay Dispersion (Low GDD) for minimal pulse distortion
  • High-reflectivity dielectric IBS coating for excellent optical efficiency
  • Precision UV fused silica substrate for superior thermal and optical stability
  • 12.7 mm diameter and 6.35 mm thickness for straightforward system integration
  • Excellent wavefront quality for demanding beam steering applications
  • High laser-induced damage threshold suitable for high-peak-power ultrafast lasers
  • Low absorption coating promotes long service life and stable performance
  • Ideal for research, industrial, and OEM photonics systems

Applications

  • Beam steering in femtosecond and picosecond laser systems
  • Ultrafast laser pulse delivery
  • Optical parametric amplifier (OPA) setups
  • Harmonic generation experiments
  • Precision laser micromachining
  • Nonlinear optics research
  • Biomedical imaging systems
  • Scientific spectroscopy instruments
  • Semiconductor and photonics research laboratories
  • OEM integration into ultrafast laser platforms

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What is the PP-UVFS-12.7-6.35-ULLM9 designed for?
This mirror is designed for ultrafast laser systems operating in the 500–530 nm wavelength range where high reflectivity and minimal pulse broadening are required for accurate beam delivery and pulse preservation.
Why is low Group Delay Dispersion important?
Low GDD minimizes temporal broadening of femtosecond and picosecond laser pulses, helping maintain pulse duration, peak intensity, and overall system performance throughout the optical path.
What advantages does IBS coating provide?
Ion Beam Sputtering produces dense, durable optical coatings with low absorption, excellent environmental stability, outstanding repeatability, and high laser damage resistance, making them ideal for demanding ultrafast laser applications.
Can this mirror be used in high-power laser systems?
Yes. The mirror is intended for high-power ultrafast laser applications where high laser-induced damage threshold, coating durability, and stable optical performance are critical.
Which industries commonly use this ultrafast laser mirror?
The PP-UVFS-12.7-6.35-ULLM9 is widely applicable in scientific research, industrial laser processing, semiconductor manufacturing, biomedical imaging, nonlinear optics, spectroscopy, and OEM photonics equipment requiring precision beam steering with ultrashort laser pulses.

Got more questions? Use the inquiry form to ask the supplier directly.

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