Description
The OPTOMAN PP-UVFS-12.7-6.35-ULLM8SHL is a high-performance 1030 nm ultrafast laser mirror engineered for precision beam steering in femtosecond and picosecond laser applications. Featuring a 12.7 mm diameter UV fused silica substrate with a 6.35 mm thickness, this SuperHero Power mirror provides exceptional reflectivity with an HR>99.9% IBS coating at 1030 nm and optimized performance at 0° angle of incidence.
Designed to maintain ultrashort pulse characteristics, the mirror offers excellent surface quality, low dispersion, and high laser-induced damage threshold (LIDT), making it suitable for demanding ultrafast laser systems used in industrial processing, research, and advanced photonics applications. The durable ion beam sputtered coating ensures reliable operation under challenging environmental conditions and high-intensity laser exposure.
PP-UVFS-12.7-6.35-ULLM8SHL 1030nm Ultrafast Laser Mirror
Specifications
| Diameter: | 12.7 mm |
|---|---|
| Thickness: | 6.35 mm |
| Wavelength Range: | 1030 – 1030 nm |
| Clear Aperture (CA): | 10 % |
| Substrate Material: | UV Grade Fused Silica |
| Angle Of Incidence (AOI): | 0 – 0 deg |
| Surface Quality, S1 (scratch-dig): | 10-5 |
| Surface Quality, S2 (scratch-dig): | Inspection Polished |
| Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): | Lambda/10 |
| Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): | Unspecified |
| Parallelism: | 0.17 arcmin |
| S1 Surface: | Coated |
| S2 Surface: | Uncoated |
| Reflectivity (HRa @ AOI, @ Peak Wavelength): | 99.9 % |
| GDD R @ AOI, @ Peak Wavelength: | 15 fs^2 |
| Manufacturer Part Number (MPN): | PP-UVFS-12.7-6.35-ULLM8SHL |
| FindLight SKU: | FL-24478 |
Got questions about specs? Use the inquiry form to ask.
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Features
- High-reflectivity coating with HR>99.9% performance at 1030 nm for efficient ultrafast laser beam control
- 12.7 mm diameter and 6.35 mm thickness UV fused silica substrate for excellent thermal and optical stability
- SuperHero Power design optimized for high-energy femtosecond and picosecond laser applications
- Ion Beam Sputtered (IBS) coating technology for enhanced durability and environmental resistance
- Designed for 0° angle of incidence configurations in precision laser systems
- Low Group Delay Dispersion (GDD) performance to preserve ultrashort pulse integrity
- High surface flatness of <λ/10 over clear aperture for demanding optical setups
Applications
- Ultrafast femtosecond laser systems
- Picosecond laser beam delivery systems
- 1030 nm Yb-based laser platforms
- Laser micromachining and precision materials processing
- Nonlinear optics and harmonic generation systems
- Biomedical laser instrumentation
- Spectroscopy and scientific research equipment
- OEM laser integration and advanced photonics systems
Export & Trade Information
| ECCN: | EAR99 |
|---|---|
| HTS Code: | 9001.90.6000 |
| Estimated US Tariff: | 10% |
Frequently Asked Questions
What type of coating is used on this ultrafast laser mirror?
What laser systems are compatible with this 1030 nm mirror?
Why is UV fused silica used as the substrate material?
What applications commonly use the PP-UVFS-12.7-6.35-ULLM8SHL mirror?
Got more questions? Use the inquiry form to ask the supplier directly.
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