Description

The OPTOMAN PP-UVFS-12.7-6.35-ULLM8 is a premium ultrafast laser mirror engineered for high-reflectivity beam steering in Yb-based femtosecond and picosecond laser systems operating around 1030 nm. Manufactured on a precision UV fused silica substrate using advanced Ion Beam Sputtering (IBS) coating technology, this dielectric mirror delivers greater than 99.9% reflectivity across the 1010–1050 nm wavelength range at normal incidence while maintaining excellent optical stability and low optical losses.

Its 12.7 mm diameter and 6.35 mm thickness make it well suited for OEM laser integration, research laboratories, and industrial photonics equipment. High-quality surface polishing, precise flatness, and durable IBS coatings ensure reliable long-term performance in demanding ultrafast laser environments where beam quality and system stability are essential. The mirror is an excellent choice for beam steering, cavity optics, laser delivery systems, and precision scientific instrumentation.

PP-UVFS-12.7-6.35-ULLM8 Ultrafast Laser Mirror for 1030 nm Lasers

Specifications

Diameter: 12.7 mm
Thickness: 6.35 mm
Wavelength Range: 1010 – 1050 nm
Clear Aperture (CA): 80 %
Substrate Material: UV Grade Fused Silica
Angle Of Incidence (AOI): 0 – 0 deg
Surface Quality, S1 (scratch-dig): 10-5
Surface Quality, S2 (scratch-dig): Inspection Polished
Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): Lambda/10
Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): Lambda/8
Parallelism: 5 arcmin
S1 Surface: Coated
S2 Surface: Uncoated
Reflectivity (HRa @ AOI, @ Peak Wavelength): 99.9 %
GDD R @ AOI, @ Peak Wavelength: 15 fs^2
Manufacturer Part Number (MPN): PP-UVFS-12.7-6.35-ULLM8
FindLight SKU: FL-24469

Got questions about specs? Use the inquiry form to ask.

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Features

  • Manufacturer Part Number: PP-UVFS-12.7-6.35-ULLM8
  • Designed for ultrafast lasers operating at 1030 nm
  • High reflectivity >99.9% across the 1010–1050 nm spectral range
  • Optimized for 0° angle of incidence
  • UV fused silica substrate for excellent thermal and optical stability
  • Precision 12.7 mm diameter × 6.35 mm thickness
  • Ion Beam Sputtering (IBS) dielectric coating for outstanding durability
  • Surface flatness better than λ/8 over a 10 mm area
  • Suitable for femtosecond and picosecond laser beam steering
  • Ideal for OEM, industrial, scientific, and research applications

Applications

  • Yb-doped fiber laser systems
  • Yb:YAG ultrafast lasers
  • Femtosecond laser beam delivery
  • Picosecond laser beam steering
  • Laser cavity optics
  • Precision laser micromachining systems
  • Scientific spectroscopy setups
  • Optical research laboratories
  • OEM photonics equipment
  • Industrial laser processing systems

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What lasers is the PP-UVFS-12.7-6.35-ULLM8 designed for?
This mirror is optimized for ultrafast laser systems operating near 1030 nm, making it an excellent choice for Yb:fiber, Yb:YAG, femtosecond, and picosecond laser platforms requiring high reflectivity and stable optical performance.
Why is Ion Beam Sputtering (IBS) important for this mirror?
IBS coatings create extremely dense, low-loss dielectric films with excellent environmental stability, high durability, and consistent optical performance, making them ideal for demanding ultrafast laser applications.
Can this mirror be used in high-power laser systems?
Yes. The IBS coating technology and UV fused silica substrate provide excellent resistance to optical stress, making the mirror suitable for many high-power ultrafast laser systems when operated within the manufacturer's specified limits.
What is the advantage of using a UV fused silica substrate?
UV fused silica offers excellent optical homogeneity, low thermal expansion, high laser damage resistance, and outstanding stability, helping preserve beam quality in precision laser systems.
Which applications benefit most from this mirror?
The mirror is ideal for beam steering, laser resonators, optical beam delivery, nonlinear optics experiments, laser micromachining equipment, spectroscopy systems, and advanced photonics research where high reflectivity and stable optical performance are critical.

Got more questions? Use the inquiry form to ask the supplier directly.

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