Description

The OPTOMAN PP-UVFS-12.7-6.35-ULLM31 is a high-performance ultrafast laser mirror designed for precise beam steering in green femtosecond and picosecond laser systems. Featuring a UV fused silica (UVFS) substrate and an ion beam sputtered (IBS) dielectric coating, this mirror provides exceptional reflectivity above 99.9% at 515 nm while maintaining low group delay dispersion (GDD) across a wide 0° to 45° angle of incidence range.

Engineered for frequency-doubled Yb-based ultrafast laser applications, the PP-UVFS-12.7-6.35-ULLM31 supports reliable pulse transmission and beam quality preservation in demanding optical setups. Its high optical surface quality, low absorption coating technology, and excellent laser-induced damage resistance make it suitable for advanced research, industrial laser processing, and precision photonics systems where angular flexibility and pulse fidelity are critical.

PP-UVFS-12.7-6.35-ULLM31 Ultrafast Laser Mirror 515nm Wide-Angle

Specifications

Diameter: 12.7 mm
Thickness: 6.35 mm
Wavelength Range: 515 – 515 nm
Clear Aperture (CA): 90 %
Substrate Material: UV Grade Fused Silica
Angle Of Incidence (AOI): 0 – 45 deg
Surface Quality, S1 (scratch-dig): 10-5
Surface Quality, S2 (scratch-dig): Inspection Polished
Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): Lambda/8
Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): Lambda/8
Parallelism: 5 arcmin
S1 Surface: Coated
S2 Surface: Uncoated
Reflectivity (HRa @ AOI, @ Peak Wavelength): 99.9 %
GDD R @ AOI, @ Peak Wavelength: 500 fs^2
Manufacturer Part Number (MPN): PP-UVFS-12.7-6.35-ULLM31
FindLight SKU: FL-24466

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Features

  • 515 nm high-reflectivity ultrafast laser mirror with HR >99.9% performance
  • Wide-angle operation from 0° to 45° angle of incidence with stable optical performance
  • Low group delay dispersion (GDD) design optimized for femtosecond and picosecond pulses
  • UV fused silica substrate for excellent thermal stability and UV transmission
  • Ion beam sputtered dielectric coating for high durability and low optical absorption
  • 12.7 mm diameter and 6.35 mm thickness compact optical format
  • High surface quality of 10-5 scratch-dig and λ/7 flatness at 633 nm over clear aperture
  • Designed for high-power green laser beam steering applications

Applications

  • Ultrafast femtosecond laser systems
  • Picosecond laser beam delivery and steering
  • Frequency-doubled Yb:YAG laser systems
  • Second harmonic generation (SHG) optical setups
  • Precision laser micromachining
  • Industrial laser processing systems
  • Biomedical and scientific laser instrumentation
  • Optical assemblies requiring wide-angle laser mirrors with low dispersion

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What wavelength is the OPTOMAN PP-UVFS-12.7-6.35-ULLM31 designed for? The PP-UVFS-12.7-6.35-ULLM31 is optimized for operation at 515 nm, making it suitable for green ultrafast laser systems, particularly frequency-doubled Yb-based laser platforms.
What wavelength is the OPTOMAN PP-UVFS-12.7-6.35-ULLM31 designed for? The PP-UVFS-12.7-6.35-ULLM31 is optimized for operation at 515 nm, making it suitable for green ultrafast laser systems, particularly frequency-doubled Yb-based laser platforms.
What makes this mirror suitable for ultrafast laser applications?
This mirror uses an IBS dielectric coating engineered for high reflectivity and low group delay dispersion, helping preserve femtosecond and picosecond pulse characteristics during beam routing.
Can this mirror operate at different angles of incidence?
Yes. The PP-UVFS-12.7-6.35-ULLM31 is designed for wide-angle operation from 0° to 45° angle of incidence, providing consistent optical performance in flexible beam path configurations.
What type of lasers are compatible with this ultrafast mirror?
This mirror can be integrated into second harmonic Yb:YAG ultrafast laser systems, including platforms such as Light Conversion PHAROS and CARBIDE, Coherent Monaco, TRUMPF TruMicro, Spectra-Physics IceFyre FS, Amplitude Tangor and similar laser architectures.
Why is UV fused silica used as the substrate material?
UV fused silica provides excellent optical transmission, low thermal expansion, and strong resistance to thermal effects, making it a reliable substrate choice for high-performance ultrafast laser optics.

Got more questions? Use the inquiry form to ask the supplier directly.

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