Description

The OPTOMAN PP-UVFS-12.7-6.35-LLM267 is a precision ion beam sputtered (IBS) ultrafast laser mirror engineered for demanding ultraviolet laser applications at 343 nm. Designed on a high-quality UV fused silica substrate, it delivers greater than 99.9% reflectivity for s-polarized light at a 45° angle of incidence while maintaining group delay dispersion (GDD) below 30 fs². This combination helps preserve ultrashort pulse duration and beam quality in femtosecond and picosecond laser systems.

Manufactured with stringent optical tolerances, including λ/10 surface flatness and 10-5 scratch-dig surface quality, the mirror provides exceptional wavefront accuracy and long-term durability. Its IBS coating technology offers excellent environmental stability, high laser damage resistance, and consistent performance in high-power UV laser environments.

Optimized for the third harmonic (343 nm) of Yb:YAG ultrafast laser systems, the PP-UVFS-12.7-6.35-LLM267 is an excellent choice for precision micromachining, semiconductor processing, scientific research, nonlinear optics, and advanced photonics applications.

PP-UVFS-12.7-6.35-LLM267 Ultrafast UV Laser Mirror

Specifications

Diameter: 12.7 mm
Thickness: 6.35 mm
Wavelength Range: 342 – 347 nm
Clear Aperture (CA): 90 %
Substrate Material: UV Grade Fused Silica
Angle Of Incidence (AOI): 45 – 45 deg
Surface Quality, S1 (scratch-dig): 10-5
Surface Quality, S2 (scratch-dig): Inspection Polished
Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): Lambda/10
Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): Unspecified
Parallelism: 5 arcmin
S1 Surface: Coated
S2 Surface: Uncoated
Reflectivity (HRa @ AOI, @ Peak Wavelength): 99.9 %
GDD R @ AOI, @ Peak Wavelength: 30 fs^2
Manufacturer Part Number (MPN): PP-UVFS-12.7-6.35-LLM267
FindLight SKU: FL-24490

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Features

  • Manufacturer Part Number: PP-UVFS-12.7-6.35-LLM267
  • Optimized for 343 nm ultraviolet ultrafast laser applications>
  • 99.9% s-polarized reflectivity at 45° angle of incidence
  • Low group delay dispersion (GDD <30 fs²) to preserve ultrashort pulses
  • Premium UV fused silica (Corning 7980 0F) substrate
  • Ion Beam Sputtered (IBS) coating for excellent durability and optical stability
  • Surface flatness better than λ/10 at 633 nm
  • High-quality 10-5 scratch-dig optical surfaces
  • Precision parallelism below 10 arcsec
  • Ideal for femtosecond and picosecond Yb:YAG third-harmonic laser systems.

Applications

  • Femtosecond UV laser beam steering
  • Picosecond laser material processing
  • Precision laser micromachining
  • Semiconductor manufacturing
  • Ultrafast spectroscopy
  • Nonlinear optics experiments
  • Biomedical laser instrumentation
  • Scientific research laboratories
  • Harmonic generation optical systems
  • Industrial UV laser beam delivery

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What wavelength is the PP-UVFS-12.7-6.35-LLM267 designed for?
This mirror is specifically optimized for 343 nm, making it ideal for third-harmonic Yb:YAG ultrafast laser systems operating in the ultraviolet spectrum.
Why is low group delay dispersion important?
Low GDD minimizes pulse broadening, allowing femtosecond and picosecond laser pulses to maintain their original duration and peak power after reflection. This is critical for high-precision ultrafast laser applications.
What benefits does IBS coating provide?
Ion Beam Sputtering produces dense, highly durable optical coatings with outstanding environmental stability, low optical losses, excellent coating uniformity, and high resistance to laser-induced damage compared to conventional coating methods.
Which laser systems is this mirror compatible with?
The mirror is suitable for many 343 nm Yb:YAG ultrafast laser platforms, including systems used for micromachining, spectroscopy, and research. Typical compatible platforms include third-harmonic versions of lasers from manufacturers such as Light Conversion, Coherent, TRUMPF, Spectra-Physics, Amplitude, EKSPLA, Thorlabs, Lumentum, Fluence, and Photonics Industries.
Can this mirror be used in high-power UV laser applications?
Yes. Its precision UV fused silica substrate, IBS coating technology, excellent surface quality, and high reflectivity make it well suited for demanding high-power femtosecond and picosecond UV laser systems where beam quality and optical reliability are essential.

Got more questions? Use the inquiry form to ask the supplier directly.

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