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Description

The OPTOMAN PP-UVFS-12.7-6.35-LLM198 is a high-performance multiwavelength ultrafast laser mirror designed for demanding femtosecond and picosecond laser applications. Manufactured with a UV fused silica substrate and advanced dielectric coating technology, this optical mirror provides high reflectivity across visible and near-infrared wavelengths, including 515 nm and 1030 nm laser harmonics.

Featuring excellent surface quality, low dispersion performance, and optimized reflection at a 45° angle of incidence, this round optical mirror is engineered to maintain pulse integrity in ultrafast laser systems. The mirror’s multiwavelength coating design makes it suitable for applications requiring precise beam steering and wavelength management in advanced photonics, research, and industrial laser platforms.

PP-UVFS-12.7-6.35-LLM198 Multiwavelength Ultrafast Laser Mirror

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Specifications

Diameter: 12.7 mm
Thickness: 6.35 mm
Wavelength Range: 1000 – 1070 nm
Clear Aperture (CA): 80 %
Substrate Material: UV Grade Fused Silica
Angle Of Incidence (AOI): 45 – 45 deg
Surface Quality, S1 (scratch-dig): 10-5
Surface Quality, S2 (scratch-dig): Inspection Polished
Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): Lambda/8
Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): Unspecified
Parallelism: 3 arcmin
S1 Surface: Coated
S2 Surface: Uncoated
Reflectivity (HRs @ AOI, @ Peak Wavelength): 99.9 %
Reflectivity (HRp @ AOI, @ Peak Wavelength): 99.9 %
GDD Rs @ AOI, @ Peak Wavelength: 35 fs^2
GDD Rp @ AOI, @ Peak Wavelength: 50 fs^2
Manufacturer Part Number (MPN): PP-UVFS-12.7-6.35-LLM198
FindLight SKU: FL-24463

Got questions about specs? Use the inquiry form to ask.

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Features

  • Multiwavelength ultrafast laser mirror optimized for 515 nm and 1030 nm laser systems
  • UV fused silica substrate for excellent thermal stability and optical performance
  • High reflectivity coating: Rs >99.9% at 500–540 nm and 1000–1070 nm ranges
  • Designed for 45° angle of incidence operation
  • Low group delay dispersion performance for ultrafast pulse applications
  • Precision surface quality of 10-5 scratch-dig
  • Surface flatness of <λ/6 over a 9 mm aperture area
  • Compact 12.7 mm diameter and 6.35 mm thickness design
  • Suitable for femtosecond and picosecond laser systems

Applications

  • Ultrafast femtosecond laser systems
  • Picosecond laser beam delivery systems
  • Yb-based laser harmonic generation setups
  • Optical parametric amplification systems
  • Nonlinear optics experiments
  • Laser research and development laboratories
  • Precision micromachining applications
  • Biomedical and spectroscopy laser systems
  • High-power visible and near-infrared laser applications

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

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Frequently Asked Questions

What type of optical component is the OPTOMAN PP-UVFS-12.7-6.35-LLM198?
The OPTOMAN PP-UVFS-12.7-6.35-LLM198 is a multiwavelength ultrafast laser mirror designed for controlling and directing laser beams in advanced photonics systems. It uses a UV fused silica substrate with a specialized dielectric coating optimized for visible and near-infrared wavelengths.
Which wavelengths are supported by this ultrafast laser mirror?
This mirror is optimized for multiwavelength operation, providing high reflectivity in the 500–540 nm and 1000–1070 nm spectral ranges, making it suitable for applications involving 515 nm and 1030 nm laser sources.
Why is UV fused silica used as the substrate material?
UV fused silica offers excellent optical transmission, low thermal expansion, and strong resistance to laser-induced damage, making it a reliable substrate material for demanding ultrafast laser applications.
Can the PP-UVFS-12.7-6.35-LLM198 be used with high-power lasers?
Yes. The mirror is designed for ultrafast laser environments where high reflectivity, low dispersion, and reliable optical performance are required. Its coating design supports demanding laser beam handling applications.
What makes this mirror suitable for femtosecond laser systems?
Its low group delay dispersion characteristics and optimized dielectric coating help minimize pulse distortion, allowing femtosecond laser systems to maintain better temporal performance during beam manipulation.

Got more questions? Use the inquiry form to ask the supplier directly.

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