Description
The OPTOMAN PP-UVFS-12.7-3.0-MW98 is a premium multiwavelength ultrafast laser mirror engineered for demanding femtosecond and picosecond laser systems operating at 343 nm, 515 nm, and 1030 nm. Manufactured on a high-quality UV-grade fused silica substrate, this dielectric mirror combines exceptional reflectivity, excellent wavefront quality, and outstanding optical stability in a compact 12.7 mm format.
Produced using advanced Ion Beam Sputtering (IBS) technology, the mirror delivers durable, low-loss coatings with excellent environmental resistance and high optical performance. Its optimized 45° angle of incidence design makes it well suited for harmonic generation stages, beam steering, ultrafast laser routing, and precision scientific instrumentation where multiple laser wavelengths must be handled with minimal losses.
PP-UVFS-12.7-3.0-MW98 Multiwavelength Ultrafast Laser Mirror
Specifications
| Diameter: | 12.7 mm |
|---|---|
| Thickness: | 3 mm |
| Wavelength Range: | 515 – 515 nm |
| Clear Aperture (CA): | 80 % |
| Substrate Material: | UV Grade Fused Silica |
| Angle Of Incidence (AOI): | 45 – 45 deg |
| Surface Quality, S1 (scratch-dig): | 20-10 |
| Surface Quality, S2 (scratch-dig): | Inspection Polished |
| Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): | Lambda/8 |
| Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): | Unspecified |
| Parallelism: | 10 arcmin |
| S1 Surface: | Coated |
| S2 Surface: | Uncoated |
| Reflectivity (HRs @ AOI, @ Peak Wavelength): | 99.3 % |
| Reflectivity (HRp @ AOI, @ Peak Wavelength): | 99.5 % |
| GDD R @ AOI, @ Peak Wavelength: | 50 fs^2 |
| Manufacturer Part Number (MPN): | PP-UVFS-12.7-3.0-MW98 |
| FindLight SKU: | FL-24476 |
Got questions about specs? Use the inquiry form to ask.
Features
- Manufacturer Part Number: PP-UVFS-12.7-3.0-MW98
- Multiwavelength high-reflectivity coating for 343 nm, 515 nm, and 1030 nm
- Reflectivity of >99.3% at 343 nm, >99.5% at 515 nm, and >99.8% at 1030 nm
- Designed for 45° angle of incidence
- UV fused silica (UVFS) substrate for excellent optical transmission and thermal stability
- Diameter: 12.7 mm
- Thickness: 3.0 mm
- Surface flatness: < λ/8 @ 633 nm over any 5 mm diameter within the clear aperture
- IBS dielectric coating for high durability and long operational lifetime
- Suitable for femtosecond and picosecond laser systems
- Compact optical component for research, OEM integration, and industrial laser platforms
Applications
- Ultrafast laser beam steering
- Yb:YAG and Yb-fiber laser systems
- Harmonic generation setups
- Nonlinear optics experiments
- Multiphoton microscopy
- Precision laser machining
- Scientific spectroscopy
- Optical laboratories and photonics R&D
- Industrial ultrafast laser integration
- Advanced laser diagnostics
Export & Trade Information
| ECCN: | EAR99 |
|---|---|
| HTS Code: | 9001.90.6000 |
| Estimated US Tariff: | 10% |
Frequently Asked Questions
What wavelengths is the PP-UVFS-12.7-3.0-MW98 optimized for?
Why is Ion Beam Sputtering (IBS) beneficial for this mirror?
Which laser systems commonly use this mirror?
Is the mirror designed for a specific angle of incidence?
What advantages does the UV fused silica substrate provide?
Got more questions? Use the inquiry form to ask the supplier directly.
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