Description

The OPTOMAN PP-UVFS-12.7-3.0-MW98 is a premium multiwavelength ultrafast laser mirror engineered for demanding femtosecond and picosecond laser systems operating at 343 nm, 515 nm, and 1030 nm. Manufactured on a high-quality UV-grade fused silica substrate, this dielectric mirror combines exceptional reflectivity, excellent wavefront quality, and outstanding optical stability in a compact 12.7 mm format.

Produced using advanced Ion Beam Sputtering (IBS) technology, the mirror delivers durable, low-loss coatings with excellent environmental resistance and high optical performance. Its optimized 45° angle of incidence design makes it well suited for harmonic generation stages, beam steering, ultrafast laser routing, and precision scientific instrumentation where multiple laser wavelengths must be handled with minimal losses.

PP-UVFS-12.7-3.0-MW98 Multiwavelength Ultrafast Laser Mirror

Specifications

Diameter: 12.7 mm
Thickness: 3 mm
Wavelength Range: 515 – 515 nm
Clear Aperture (CA): 80 %
Substrate Material: UV Grade Fused Silica
Angle Of Incidence (AOI): 45 – 45 deg
Surface Quality, S1 (scratch-dig): 20-10
Surface Quality, S2 (scratch-dig): Inspection Polished
Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): Lambda/8
Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): Unspecified
Parallelism: 10 arcmin
S1 Surface: Coated
S2 Surface: Uncoated
Reflectivity (HRs @ AOI, @ Peak Wavelength): 99.3 %
Reflectivity (HRp @ AOI, @ Peak Wavelength): 99.5 %
GDD R @ AOI, @ Peak Wavelength: 50 fs^2
Manufacturer Part Number (MPN): PP-UVFS-12.7-3.0-MW98
FindLight SKU: FL-24476

Got questions about specs? Use the inquiry form to ask.

Document icon Download Data Sheet Download icon

Features

  • Manufacturer Part Number: PP-UVFS-12.7-3.0-MW98
  • Multiwavelength high-reflectivity coating for 343 nm, 515 nm, and 1030 nm
  • Reflectivity of >99.3% at 343 nm, >99.5% at 515 nm, and >99.8% at 1030 nm
  • Designed for 45° angle of incidence
  • UV fused silica (UVFS) substrate for excellent optical transmission and thermal stability
  • Diameter: 12.7 mm
  • Thickness: 3.0 mm
  • Surface flatness: < λ/8 @ 633 nm over any 5 mm diameter within the clear aperture
  • IBS dielectric coating for high durability and long operational lifetime
  • Suitable for femtosecond and picosecond laser systems
  • Compact optical component for research, OEM integration, and industrial laser platforms

Applications

  • Ultrafast laser beam steering
  • Yb:YAG and Yb-fiber laser systems
  • Harmonic generation setups
  • Nonlinear optics experiments
  • Multiphoton microscopy
  • Precision laser machining
  • Scientific spectroscopy
  • Optical laboratories and photonics R&D
  • Industrial ultrafast laser integration
  • Advanced laser diagnostics

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What wavelengths is the PP-UVFS-12.7-3.0-MW98 optimized for?
This mirror is optimized for simultaneous high reflectivity at 343 nm, 515 nm, and 1030 nm, making it suitable for laser systems that utilize a fundamental wavelength together with its harmonics.
Why is Ion Beam Sputtering (IBS) beneficial for this mirror?
IBS produces dense, low-defect dielectric coatings with excellent durability, low optical losses, high environmental stability, and consistent long-term performance, making the mirror ideal for demanding laser applications.
Which laser systems commonly use this mirror?
The mirror is well suited for Yb-based ultrafast lasers, harmonic generation systems, femtosecond amplifiers, nonlinear optical experiments, and precision laser processing equipment operating at 343 nm, 515 nm, and 1030 nm.
Is the mirror designed for a specific angle of incidence?
Yes. The coating is optimized for operation at a 45° angle of incidence to maximize reflectivity at all three design wavelengths.
What advantages does the UV fused silica substrate provide?
UV fused silica offers excellent transmission, low thermal expansion, outstanding optical homogeneity, and high resistance to laser-induced stress, making it an excellent substrate for precision ultrafast laser optics.

Got more questions? Use the inquiry form to ask the supplier directly.

Similar Products

Add to Cart