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Description

The OPTOMAN PP-UVFS-25.4-6.35-UBBHR18-SCC is a broadband ultrafast laser mirror engineered for high-performance femtosecond and picosecond laser applications. Featuring an ion beam sputtered (IBS) coating on a UV fused silica substrate, this optical mirror provides exceptional reflectivity, low group delay dispersion (GDD), and high laser-induced damage resistance across the 700–900 nm wavelength range.

With a 25.4 mm diameter and 6.35 mm thickness, the mirror is optimized for 45° angle-of-incidence operation in Ti:Sapphire laser systems and other broadband ultrafast optical setups. The stress-compensating coating configuration helps maintain optical precision and mechanical stability, making it suitable for demanding scientific and industrial photonics applications.

P-UVFS-25.4-6.35-UBBHR18-SCC Broadband Ultrafast Laser Mirror

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Specifications

Diameter: 25.4 mm
Thickness: 6.35 mm
Wavelength Range: 700 – 900 nm
Clear Aperture (CA): 90 %
Substrate Material: UV Grade Fused Silica
Angle Of Incidence (AOI): 45 – 45 deg
Surface Quality, S1 (scratch-dig): 10-5
Surface Quality, S2 (scratch-dig): Inspection Polished
Surface Flatness Over CA, S1 (@633nm Or Per Manufacturer): Lambda/8
Surface Flatness Over CA, S2 (@633nm Or Per Manufacturer): Lambda/8
Parallelism: 5 arcmin
S1 Surface: Coated
S2 Surface: Coated
Reflectivity (HRs @ AOI, @ Peak Wavelength): 99.9 %
Reflectivity (HRp @ AOI, @ Peak Wavelength): 99.5 %
GDD R @ AOI, @ Peak Wavelength: 20 fs^2
Manufacturer Part Number (MPN): PP-UVFS-25.4-6.35-UBBHR18 (SCC)
FindLight SKU: FL-24465

Got questions about specs? Use the inquiry form to ask.

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Features

  • Broadband high-reflectivity performance from 700–900 nm for ultrafast laser applications
  • IBS dielectric coating technology for excellent optical durability and stability
  • High reflectivity with Rs >99.9% at 700–900 nm and Rp >99.5% at 730–870 nm at 45° angle of incidence
  • Low group delay dispersion with |GDD| <20 fs² for reduced pulse distortion
  • UV fused silica substrate providing excellent thermal and optical properties
  • High laser-induced damage threshold suitable for high-power femtosecond systems
  • 25.4 mm diameter and 6.35 mm thickness standard optical format
  • Stress-compensating coating design for improved surface quality and performance
  • Surface quality of 10-5 scratch-dig and high optical flatness for precision applications

Applications

  • Ti:Sapphire femtosecond laser systems
  • Ultrafast laser pulse steering and beam routing
  • Pump-probe spectroscopy setups
  • Nonlinear optics experiments
  • Quantum optics and attosecond science research
  • Multiphoton microscopy and advanced imaging systems
  • High-power ultrafast laser laboratories
  • Optical delay lines and pulse characterization systems

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What wavelength range is the OPTOMAN PP-UVFS-25.4-6.35-UBBHR18-SCC mirror designed for?
This ultrafast laser mirror is optimized for broadband operation from 700 nm to 900 nm, making it suitable for many Ti:Sapphire laser systems and other near-infrared ultrafast applications.
What type of coating is used on this OPTOMAN laser mirror?
The mirror uses an ion beam sputtered (IBS) dielectric coating designed to provide high reflectivity, excellent durability, and low dispersion performance for ultrafast laser applications.
What makes this mirror suitable for femtosecond laser systems?
Its broadband reflectivity, low group delay dispersion, and high damage threshold help preserve ultrashort pulse characteristics while efficiently directing high-energy laser beams.
What substrate material is used for the PP-UVFS-25.4-6.35-UBBHR18-SCC mirror?
The mirror is manufactured using UV fused silica, a substrate material known for excellent transmission properties, thermal stability, and low expansion characteristics.
Can this mirror be used in commercial Ti:Sapphire laser platforms?
Yes. This broadband ultrafast mirror is designed for integration into Ti:Sapphire oscillator and amplifier systems commonly used in spectroscopy, microscopy, nonlinear optics, and ultrafast research laboratories.

Got more questions? Use the inquiry form to ask the supplier directly.

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