Description
The OPTOMAN PCX-F200-UVFS-25.4-ET2.0-AR784-AR784 is a premium plano-convex laser lens engineered for demanding ultrafast laser applications operating at 515 nm. Manufactured from high-quality UV fused silica (JGS1), this precision optical component features advanced ion beam sputtered (IBS) anti-reflective coatings that deliver exceptionally low residual reflectance below 0.1%, maximizing optical throughput while minimizing thermal losses.
With a 200 mm focal length, λ/6 surface irregularity, 20-10 scratch-dig surface quality, and high laser-induced damage threshold, this lens provides outstanding beam focusing performance for femtosecond and picosecond laser systems used in industrial processing, precision manufacturing, and scientific research.
PCX-F200-UVFS-25.4-ET2.0-AR784-AR784 Plano-Convex UV Fused Silica Lens 200 mm
Specifications
| Lens Type: | Plano-Convex |
|---|---|
| Material: | UVFS |
| Diameter: | 25.4 mm |
| Focal Length: | 200 mm |
| Edge Thickness, Te: | 2 mm |
| Surface Quality, S1/S2 (scratch-dig): | 20-10 |
| Surface Irregularity, S1/S2: | <= Lambda/6 |
| Manufacturer Part Number (MPN): | PCX-F200-UVFS-25.4-ET2.0-AR784-AR784 |
| FindLight SKU: | FL-24743 |
Got questions about specs? Use the inquiry form to ask.
Download Data Sheet
Features
- Manufacturer Part Number: PCX-F200-UVFS-25.4-ET2.0-AR784-AR784
- Plano-convex UV fused silica (JGS1) lens optimized for 515 nm laser wavelength
- Precision 200 mm focal length with ±1% tolerance
- 25.4 mm diameter with >80% clear aperture
- IBS anti-reflective coatings on both surfaces with <0.1% reflectance at 515 nm
- High laser-induced damage threshold suitable for ultrafast femtosecond and picosecond lasers
- λ/6 surface irregularity over the clear aperture for excellent wavefront quality
- 20-10 scratch-dig surface quality for low scatter and high optical performance
- Low absorption coating design minimizes thermal effects during high-power operation
- Laser-engraved orientation markings simplify installation and alignment
Applications
- Frequency-doubled Yb:YAG laser systems (515 nm)
- Ultrafast laser beam focusing
- Precision laser micromachining
- Semiconductor and electronics manufacturing
- Medical laser instrumentation
- Scientific and laboratory optical setups
- Nonlinear optics experiments
- Laser materials processing
- High-precision metrology
- Research and development photonics systems
Export & Trade Information
| ECCN: | EAR99 |
|---|---|
| HTS Code: | 9001.90.4000 |
| Estimated US Tariff: | 10% |
Frequently Asked Questions
What laser wavelength is this lens designed for?
Why is UV fused silica used for this lens?
What types of laser systems is this lens compatible with?
What benefits do IBS anti-reflective coatings provide?
Is this lens suitable for high-power ultrafast lasers?
Got more questions? Use the inquiry form to ask the supplier directly.
Similar Products
Your inquiry has been received.
Create an account by adding a password
Why create an account?
- Auto-complete inquiry forms
- View and manage all your past messages
- Save products to your favorites
- Close your account anytime — no hassle