Description
The OPTOMAN PCX-F175-UVFS-25.4-ET2.0-AR784-AR784 is a precision plano-convex lens manufactured from premium UV-grade fused silica (JGS1) and optimized for demanding ultrafast laser applications operating at 515 nm. Featuring advanced ion beam sputtered (IBS) anti-reflective coatings on both surfaces, the lens delivers exceptionally low reflectance, high transmission, minimal absorption, and excellent laser-induced damage resistance for femtosecond and picosecond laser systems.
With a 175 mm focal length, 25.4 mm diameter, superior surface quality, and excellent wavefront performance, it is an ideal choice for beam focusing, imaging, and laser processing applications where optical efficiency and long-term stability are critical.
PCX-F175-UVFS-25.4-ET2.0-AR784-AR784 Plano-Convex UV Fused Silica Lens 175 mm
Specifications
| Lens Type: | Plano-Convex |
|---|---|
| Material: | UVFS |
| Diameter: | 25.4 mm |
| Focal Length: | 175 mm |
| Edge Thickness, Te: | 2 mm |
| Surface Quality, S1/S2 (scratch-dig): | 20-10 |
| Surface Irregularity, S1/S2: | <= Lambda/6 |
| Manufacturer Part Number (MPN): | PCX-F175-UVFS-25.4-ET2.0-AR784-AR784 |
| FindLight SKU: | FL-24740 |
Got questions about specs? Use the inquiry form to ask.
Features
- Manufacturer Part Number: PCX-F175-UVFS-25.4-ET2.0-AR784-AR784
- Plano-convex spherical lens with 175 mm focal length
- UV-grade fused silica (JGS1) substrate for outstanding UV-visible transmission
- Precision IBS anti-reflective coatings optimized for 515 nm
- Surface reflectance below 0.1% for maximum optical throughput
- Designed for ultrafast femtosecond and picosecond laser systems
- High laser-induced damage threshold for high-power laser operation
- 25.4 mm diameter with 2.0 mm edge thickness
- Surface quality of 20-10 scratch-dig and surface irregularity better than λ/6
- Excellent beam quality preservation with low optical losses and minimal pulse distortion
Applications
- Ultrafast laser beam focusing
- Precision laser micromachining
- Semiconductor and electronics manufacturing
- Scientific spectroscopy and laboratory research
- Biomedical laser instrumentation
- Nonlinear optics experiments
- Optical imaging systems
- Beam delivery and conditioning
- Second-harmonic Yb:YAG laser systems operating at 515 nm
- Industrial laser processing equipment
Export & Trade Information
| ECCN: | EAR99 |
|---|---|
| HTS Code: | 9001.90.4000 |
| Estimated US Tariff: | 10% |
Frequently Asked Questions
What is the PCX-F175-UVFS-25.4-ET2.0-AR784-AR784 designed for?
Why is UV fused silica used for this lens?
What advantages do IBS anti-reflective coatings provide?
Can this lens be used with femtosecond and picosecond lasers?
Which industries commonly use this optical lens?
Got more questions? Use the inquiry form to ask the supplier directly.
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