Description

The OPTOMAN PCV-F100-UVFS-25.4-CT2.0-AR548-AR548 is a premium plano-concave laser lens engineered for ultrafast laser applications requiring exceptional beam expansion and wavefront control. Manufactured from high-purity UV fused silica (JGS1) and coated with ultra-low-loss ion beam sputtered (IBS) anti-reflection coatings optimized for 1030 nm, this precision optical component delivers outstanding transmission while minimizing back reflections and thermal effects.

Featuring a 25.4 mm diameter, -100 mm focal length, and 2.0 mm center thickness, the lens offers excellent optical quality with λ/6 surface irregularity, 20-10 scratch-dig surface quality, and low centration error. Its high laser-induced damage threshold makes it well suited for demanding femtosecond and picosecond laser systems used in industrial processing, scientific research, and advanced photonics applications.

PCV-F100-UVFS-25.4-CT2.0-AR548-AR548 Plano-Concave UV Fused Silica Laser Lens

Specifications

Lens Type: Plano-Concave
Material: UVFS
Diameter: 25.4 mm
Focal Length: -100 mm
Edge Thickness, Te: 3.788 mm
Surface Quality, S1/S2 (scratch-dig): 20-10
Surface Irregularity, S1/S2: <= Lambda/6
Manufacturer Part Number (MPN): PCV-F100-UVFS-25.4-CT2.0-AR548-AR548
FindLight SKU: FL-24715

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Features

  • Manufacturer Part Number: PCV-F100-UVFS-25.4-CT2.0-AR548-AR548
  • Plano-concave design for laser beam expansion and divergence control
  • UV fused silica (JGS1) substrate with excellent optical homogeneity
  • 25.4 mm diameter for compatibility with standard optical mounts
  • -100 mm focal length for controlled beam shaping
  • IBS anti-reflection coatings on both surfaces with AR <0.1% at 1030 nm
  • High transmission and extremely low optical absorption
  • Surface irregularity better than λ/6 over the clear aperture
  • 20-10 scratch-dig surface quality for high-performance laser systems
  • High laser damage threshold suitable for ultrafast laser applications
  • Precision manufacturing with low centration error and excellent dimensional tolerances

Applications

  • Ultrafast femtosecond laser systems
  • Picosecond laser beam expansion
  • Industrial laser micromachining
  • Scientific laser experiments
  • Optical beam conditioning
  • Laser spectroscopy
  • Nonlinear optics research
  • Precision optical instrumentation
  • Biomedical laser systems
  • Advanced photonics laboratories

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.4000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What is the primary purpose of this plano-concave lens?
This lens is designed to increase beam divergence or serve as the negative element in beam expanders, enabling precise control of laser beam size and propagation in high-performance optical systems.
Why is UV fused silica used for this lens?
UV fused silica provides excellent transmission, outstanding thermal stability, low fluorescence, and high resistance to laser damage, making it an ideal material for demanding ultrafast laser applications.
What wavelength is the anti-reflection coating optimized for?
The dual-side IBS anti-reflection coating is optimized for 1030 nm, providing reflectance below 0.1% to maximize optical throughput and reduce unwanted reflections.
Is this lens suitable for high-power ultrafast lasers?
Yes. The combination of premium UV fused silica, ion beam sputtered coatings, and a high laser-induced damage threshold makes it well suited for femtosecond and picosecond laser systems operating at high peak powers.
Which industries commonly use this optical lens?
This lens is widely used in laser manufacturing, semiconductor processing, photonics research, optical laboratories, precision metrology, biomedical instrumentation, and advanced scientific imaging systems.

Got more questions? Use the inquiry form to ask the supplier directly.

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