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Description

The Sapphire Wafer is an advanced optical component designed specifically for the semiconductor and photonics industries. Manufactured from 99.999% pure AL₂O₃ monocrystalline sapphire, it offers unparalleled durability and performance. With customizable dimensions ranging from 1 inch (25.4 mm) to 8 inches (203.2 mm) and thickness options from 150 µm to 1 mm, it can meet diverse application requirements.

The wafer's C-axis orientation and total thickness variation (TTV) of less than 10 µm ensure exceptional precision and quality. This feature is crucial for high-performance devices, as it minimizes the risk of defects. Additionally, the Sapphire Wafer’s outstanding thermal conductivity and optical clarity make it ideal for demanding applications, including high-power lasers, optics, and integrated circuits. Its ability to withstand extreme environments further enhances its suitability for various technological advancements.
 

Sapphire Wafer for Semiconductor and Photonics Applications

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Specifications

Substrate Material: Sapphire
Diameter (or Largest Dimension): 203.2 mm
Thickness: 1 mm
Antireflection Coating: Uncoated
Surface Quality (Scratch-Dig): 60-40
Surface Flatness: <= Lambda/4
Total Thickness Variation: Lower than 10 µm

Got questions about specs? Use the inquiry form to ask.

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Features

  • High Purity Material: Composed of 99.999% pure AL₂O₃ monocrystalline sapphire for superior optical and thermal performance
  • Custom Dimensions: Available in sizes from 1 inch (25.4 mm) to 8 inches (203.2 mm) for versatile applications
  • Varied Thickness: Thickness options from 150 µm to 1 mm, accommodating a range of uses
  • C-Axis Orientation: Specifically oriented for optimal performance in semiconductor and photonics applications
  • Low Total Thickness Variation: TTV of less than 10 µm ensures high-quality substrate characteristics

Applications

  • Semiconductor Manufacturing: Ideal for use in the production of semiconductor devices
  • Photonics: Suitable for optical devices, including lasers and waveguides
  • Optical Coatings: Serves as a substrate for high-performance optical coatings
  • Research and Development: Supports experimental setups in advanced material science

Frequently Asked Questions

What is the material of the Sapphire Wafer?
The Sapphire Wafer is made from 99.999% pure AL₂O₃ monocrystalline sapphire.
What are the available dimensions?
The Sapphire Wafer is available in sizes ranging from 1 inch (25.4 mm) to 8 inches (203.2 mm).
What is the thickness range?
The thickness can be customized from 150 µm to 1 mm.
What orientation does the wafer have?
The Sapphire Wafer features a C-axis orientation, which is essential for its optical properties.
What is the total thickness variation (TTV)?
The TTV of the Sapphire Wafer is lower than 10 µm, ensuring high precision and quality.
What applications are suitable for this wafer?
The Sapphire Wafer is ideal for use in the semiconductor and photonics industries, including high-power lasers and optics.
How does the Sapphire Wafer perform in extreme environments?
It is designed to withstand extreme environments, making it suitable for demanding applications.
Is the Sapphire Wafer coated?
No, the Sapphire Wafer is offered without coating.
What are the advantages of using sapphire?
Sapphire provides excellent thermal conductivity, optical clarity, and resistance to high temperatures and harsh conditions, enhancing its usability in advanced technologies.

Got more questions? Use the inquiry form to ask the supplier directly.

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