Frequently Asked Questions

The applications of the YLF(Unioriental) laser instrument include dopant concentration tolerance of 0.1%, parallelism of <10 arc seconds, perpendicularity of <5 arc minutes, chamfer of 0.1mm @45°, clear aperture of 95%, surface quality of 10/5, surface flatness of λ/10 @ 633nm, wavefront distortion of <7mm diameter: λ/10@633nm, ≥7mm diameter: λ/8@633nm, and damage threshold of 15J/CM2 TEM00, 10NS, 10HZ.

The features of the YLF(Unioriental) laser instrument include dopant concentrations between 0.5 and 3.0mol%; rod sizes from 1mm to 25.4mm in diameter and from 1mm to 180mm in length; large rod and slab dimensions and non-standard dopant concentrations are available upon request; AR, HR and HT coating are available upon request; and orientation of rod axis to crystal a-axis or c-axis within 2 degrees.

The coating options available for the YLF(Unioriental) laser instrument include AR, HR and HT coating, which are available upon request.

The dopant concentration range available in the YLF(Unioriental) laser instrument is between 0.5 and 3.0mol%.

Unioriental grows Nd, Pr, Er, Ho and no doped YLF crystals using the Czochralski technique.

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