Description

VioNeer Deep UV / VUV Spectrometer (155–410 nm)

The VioNeer Deep UV / VUV Spectrometer is an advanced, research-grade instrument engineered for accurate measurements in the 155–410 nm wavelength range. This spectral band covers the deep ultraviolet and vacuum ultraviolet regions that are critical for semiconductor manufacturing, photoresist development, gas and water phase analysis, and biomolecular absorption spectroscopy. By combining a back-thinned 2048‑pixel CCD detector with a high‑efficiency grating optimized around 200 nm, the VioNeer offers high sensitivity and low stray light performance that rival specialized deep‑UV spectrometers commonly used in process control and analytical laboratories.

With an optical resolution ranging from 0.3 to 1.8 nm, adjustable via 10–200 µm slit widths, users can tune the system for either high spectral resolution or enhanced throughput, depending on the application. This makes the VioNeer suitable for tasks that demand precise line shape characterization—such as monitoring excimer laser sources, characterizing photoresist absorption edges, or resolving narrow gas absorption lines—as well as for broader band measurements in environmental and industrial sensing. A numerical aperture of 0.11, coupled with low dark noise and a signal‑to‑noise ratio of 450, supports both low‑light measurements and high‑dynamic‑range spectral acquisition over integration times from 1.5 ms up to 65 s.

For maximum flexibility in system integration, the spectrometer provides both SMA905 fiber input and a free‑space optical interface. The SMA905 input simplifies connection to UV‑enhanced fibers and sampling probes for routine measurements above approximately 180 nm. For measurements deeper into the VUV, below about 180 nm where standard silica fibers exhibit strong absorption, the dedicated free‑space coupling path allows direct optical access, similar to what is found in more complex VUV bench systems. This design supports applications such as in‑line semiconductor process monitoring, plasma diagnostics, and high‑energy photochemistry studies that require robust coupling at shorter wavelengths.

On the electronics side, the VioNeer spectrometer supports USB Type B and Ethernet (RJ45) connectivity, along with a 16‑pin GPIO interface for triggering and synchronization in automated setups. This makes it easy to integrate into existing measurement platforms, OEM instruments, or industrial control systems where remote operation and data streaming are essential. The compact housing—approximately 180 mm × 144 mm × 59.9 mm and under 2 kg—allows the VioNeer to be mounted directly into equipment racks, optical enclosures, or mobile analytical systems without the footprint of traditional monochromator‑based setups.

Compared to many conventional UV‑VIS spectrometers that start above 190–200 nm, the VioNeer is specifically optimized to push further into the deep‑UV and VUV region. This enables more complete characterization of absorption edges, electronic transitions, and short‑wavelength emission lines that are inaccessible with standard laboratory instruments. Whether used for photoresist characterization in lithography R&D, monitoring trace species in gas and water analysis, or probing biomolecular structures via deep‑UV absorption, the VioNeer spectrometer offers a powerful combination of sensitivity, dynamic range, and wavelength coverage tailored to demanding next‑generation UV applications.

VioNeer Deep UV VUV Spectrometer 155–410 nm Back Thinned CCD

Specifications

Wavelength Range (reflectance): 155 – 410 nm
Resolution: 0.3 nm
Grating: 8xx grooves/mm, 200 nm blaze wavelength
Shipping Availability: Q1 2027
Weight: <2 kg
Dimensions: 180 (L) × 144 (W) × 59.9 (H) mm (excluding main board and connector)
Data Interface: USB Type B, Ethernet (RJ45), 16-pin GPIO
Optical Interfaces: Free-space and SMA905
Fiber Input Interface: SMA905 (optional free-space input port)
Stray Light: <0.2%
Integration Time: 1.5 ms – 65 s
Model: VioNeer VN5190 / VN5194
Numerical Aperture (NA): 0.11
Dark Noise (average): Approx. 13
Dynamic Range: 5000
Signal-to-Noise Ratio (SNR): 450
Slit Width: 10–200 µm selectable
Optical Resolution: 0.3–1.8 nm
Number Of Pixels: 2048
Sensor Type: Back-thinned CCD

Got questions about specs? Use the inquiry form to ask.

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Features

  • Deep-UV / VUV Coverage (155–410 nm) – Precisely engineered for measurements in the deep-UV and vacuum-UV range, ideal for applications that require reliable access below 200 nm where conventional spectrometers and silica-fiber–based systems fail.
  • High-Performance Back-Thinned 2048-Pixel CCD Sensor – Uses a low-noise, back-thinned CCD array with 2048 pixels for high quantum efficiency in the deep-UV, improved sensitivity at short wavelengths, and excellent baseline stability.
  • Tunable Optical Resolution (0.3–1.8 nm) – Selectable slit widths from 10–200 µm allow users to balance between spectral resolution and throughput; achieve up to 0.3 nm resolution for fine spectral features or higher throughput for low-light signals.
  • Optimized for Direct VUV Access – For wavelengths below ~180 nm, the system supports free-space coupling to avoid silica fiber absorption, enabling accurate VUV measurements that many standard fiber-based spectrometers cannot perform.
  • High Signal Quality: SNR 450 & Dynamic Range 5000 – Provides a signal-to-noise ratio of 450 and a 5000:1 dynamic range, supporting precise quantitative measurements across weak and strong signals in a single acquisition.
  • Low Stray Light (<0.2%) – Carefully optimized optical design and grating minimize stray light below 0.2%, critical for deep-UV absorbance measurements, trace detection, and demanding analytical applications.
  • Fast to Long Integration Times (1.5 ms–65 s) – Wide integration time range enables rapid process monitoring in high-signal environments as well as long exposures for low-intensity deep-UV or VUV sources.
  • Precision Grating for Deep-UV – Equipped with an ~8xx grooves/mm grating with a 200 nm blaze wavelength, providing high efficiency and balanced performance across the 155–410 nm spectral range.
  • Flexible Optical Interfaces: SMA905 & Free-Space Input – Standard SMA905 fiber input for convenient integration into existing setups, plus optional free-space input port for highest transmission at <180 nm and custom beam geometries.
  • Numerical Aperture 0.11 – Optimized NA for stable coupling from typical UV/VUV optical systems, ensuring good throughput while preserving spectral performance.
  • Robust Connectivity: USB & Ethernet with GPIO – Features USB Type B and Ethernet (RJ45) interfaces plus a 16‑pin GPIO port for integration into automated tools, industrial control systems, and remote data acquisition networks.
  • Compact and Lightweight Form Factor – Measures approximately 180 (L) × 144 (W) × 59.9 (H) mm and weighs <2 kg, making it easy to integrate into OEM instruments, benchtop analyzers, and in-line monitoring systems.
  • Designed for Semiconductor and Advanced Materials – Ideal for semiconductor process monitoring, photoresist characterization, thin-film metrology, and EUV-related precursor processes where accurate deep-UV response is essential.
  • Suited for Gas, Water, and Biomolecular Analysis – Wavelength coverage supports key absorption bands for gas and water analysis as well as biomolecular and protein absorption spectroscopy in the deep-UV range.
  • Stable Dark Noise Performance – Average dark noise around 13 counts (typical) allows detection of low-level signals and improves reliability in long integration time experiments.
  • Future-Ready OEM Platform – The combination of Ethernet networking, GPIO control, flexible input optics, and compact size makes the VioNeer Series a strong candidate for OEM integration into commercial analytical, process, and inspection tools.
  • Deep-UV Focus vs. Conventional Spectrometers – Unlike standard UV–VIS instruments that typically start at 190–200 nm and suffer from low efficiency below 200 nm, this spectrometer is specifically optimized for 155–410 nm, offering higher sensitivity and more accurate VUV/deep-UV measurements.
  • Pre-Order Availability with Early-Bird Savings – Shipping planned for Q1 2027; pre-order customers can secure early access to deep-UV / VUV performance and benefit from a 10% discount off list price (preliminary specifications subject to change).

Applications

  • Semiconductor Process Monitoring and Lithography
    • Real-time monitoring of deep-UV (DUV) and VUV lithography sources at 193 nm, 248 nm, and neighboring wavelengths
    • In-situ endpoint detection for plasma etch and deposition processes using emission lines in the 155–410 nm region
    • Tracking photoresist outgassing and by‑product signatures during exposure and bake steps
    • Verification and stability control of excimer lasers and VUV lamps used in wafer processing
    • Process qualification of advanced patterning flows and multi-patterning schemes that rely on DUV exposure
  • Photoresist and Photomask Characterization
    • Absorption spectroscopy of deep‑UV photoresists for 193 nm and shorter wavelengths
    • Measuring bleaching dynamics, standing wave effects, and film uniformity in the 155–410 nm range
    • Optical density and transmission mapping of photomasks and pellicles at deep‑UV wavelengths
    • Characterization of antireflective coatings (BARC/ARC) and topcoats in DUV and VUV
  • Gas Phase Spectroscopy and Environmental Monitoring
    • Detection and quantification of atmospheric gases with strong signatures in the VUV and deep‑UV, such as O3, SO2, NO, NO2, and VOCs
    • Differential Optical Absorption Spectroscopy (DOAS) for air quality monitoring in the 155–410 nm band
    • Monitoring exhaust gases and process effluents in semiconductor, chemical, and photovoltaic manufacturing
    • Characterization of combustion emissions, plume analysis, and flame diagnostics
  • Water Quality and Dissolved Species Analysis
    • Deep‑UV absorption spectroscopy of dissolved organics, nitrates, nitrites, and aromatic compounds
    • Monitoring industrial wastewater, ultrapure process water, and cooling water using 200 nm–300 nm signatures
    • Real-time tracking of disinfectants, oxidants, and by‑products in water treatment processes
    • Quantification of low‑concentration analytes using the strong deep‑UV absorption bands of biomolecules and organic contaminants
  • Biomolecular and Biochemical Absorption Spectroscopy
    • Absorption measurements of proteins, peptides, and nucleic acids below 260 nm for label‑free concentration and structural studies
    • Characterization of aromatic amino acids (tryptophan, tyrosine, phenylalanine) in the 190–300 nm region
    • Monitoring conformational changes, protein folding, and aggregation via deep‑UV spectral signatures
    • Enzyme kinetics and reaction monitoring by tracking substrate and product absorbance in the deep‑UV
  • Materials Science and Thin Film Characterization
    • Optical characterization of UV‑transparent materials, optical coatings, and windows down to 155 nm
    • Determining band‑edge, defect states, and absorption tails in wide bandgap semiconductors and insulators
    • Measuring reflectance, transmittance, and absorbance of thin films and multilayer stacks in the VUV/DUV
    • Quality control for UV‑grade fused silica, CaF2, MgF2, and other UV optical substrates
  • Plasma Diagnostics and Discharge Monitoring
    • Emission spectroscopy of low‑pressure and atmospheric plasmas used in etching, deposition, and surface treatment
    • Characterization of VUV and deep‑UV emission lines from rare gases (Ar, Kr, Xe) and reactive species
    • Monitoring plasma stability, composition, and process drifts via line intensity ratios in the 155–410 nm range
    • Diagnostics of dielectric barrier discharges, corona discharges, and UV lamps
  • Excimer and VUV Light Source Characterization
    • Spectral analysis of excimer lasers (ArF, KrF, F2) and VUV lamps for wavelength, bandwidth, and stability
    • Qualification and lifetime tracking of DUV and VUV LEDs, lasers, and deuterium lamps
    • Optimization of source coupling into free-space or fiber setups for lithography, cleaning, and curing systems
    • Verification of spectral purity and stray line suppression in high‑power UV light sources
  • Surface Cleaning, Activation, and Sterilization Processes
    • Monitoring DUV/VUV lamps used for surface activation, photo‑cleaning, and photo‑oxidation
    • Verifying dose and spectral distribution in UV sterilization and decontamination equipment
    • Studying photochemical reaction pathways on surfaces under deep‑UV exposure
    • Optimization of UV‑based surface preparation prior to bonding, coating, or lithography
  • Forensic, Security, and Anti‑Counterfeiting Analysis
    • Inspection of deep‑UV responsive inks, tags, and security features in documents and packaging

Frequently Asked Questions

What is the VioNeer Deep UV / VUV Spectrometer and what wavelength range does it cover?
The VioNeer Deep UV / VUV Spectrometer (models VN5190/VN5194) is a compact, high‑sensitivity spectrometer optimized for deep ultraviolet (DUV) and vacuum ultraviolet (VUV) measurements. It covers a wavelength range of 155–410 nm, making it suitable for applications that require access to wavelengths well below 200 nm, where standard UV spectrometers and silica-fiber-based systems typically cannot operate effectively.
What are the key optical performance specifications of the VioNeer spectrometer?
The VioNeer Deep UV / VUV Spectrometer uses a back-thinned 2048‑pixel CCD sensor and offers an optical resolution from approximately 0.3 to 1.8 nm, depending on the selected slit width (10–200 µm). It provides a signal-to-noise ratio of about 450, a dynamic range of approximately 5000, typical dark noise around 13 counts, and stray light below 0.2%. The numerical aperture (NA) of the input optics is 0.11, and the internal grating has around 8xx grooves/mm with a 200 nm blaze wavelength, optimized for deep-UV/VUV efficiency.
How is the VioNeer spectrometer coupled optically and can it measure below 180 nm?
The VioNeer supports both fiber-coupled and free-space optical input. The standard interface is an SMA905 fiber connector, and there is an optional free-space input port. For wavelengths below about 180 nm, free-space coupling is required because standard silica optical fibers strongly absorb in the VUV region and will significantly attenuate or block the signal. For 180–410 nm, either SMA905 fiber input or free-space coupling may be used, depending on your optical setup and throughput requirements.
What interfaces and connectivity options does the VioNeer Deep UV / VUV Spectrometer provide?
The VioNeer spectrometer offers multiple data and control interfaces to simplify integration into laboratory and industrial setups. It includes USB Type B for direct connection to a PC, Ethernet (RJ45) for network-based access and remote operation, and a 16‑pin GPIO connector for hardware triggering, synchronization, and integration into OEM or process-control systems. This combination allows both stand-alone bench use and embedded use in production tools or monitoring equipment.
What applications is the VioNeer spectrometer suitable for in comparison with other deep-UV spectrometers?
The VioNeer is designed for demanding deep‑UV and VUV applications similar to those served by other specialized DUV spectrometers on the market. Typical use cases include semiconductor process monitoring (e.g., plasma emission monitoring in etch and deposition tools), photoresist characterization and lithography-related measurements, gas and water analysis via UV absorption, and biomolecular absorption spectroscopy in the 190–300 nm region and below. Its extended lower wavelength limit down to 155 nm and VUV-optimized grating give it an advantage over standard UV‑VIS spectrometers that typically start near 190–200 nm and are not optimized for VUV throughput.
What are the integration time range and dynamic behavior of the VioNeer spectrometer?
The VioNeer Deep UV / VUV Spectrometer supports integration times from approximately 1.5 ms up to about 65 seconds. This wide range allows you to capture fast, bright signals with very short exposures (useful, for example, in plasma monitoring or bright emission sources) and very weak absorption or fluorescence signals with longer exposures. Combined with a dynamic range of around 5000 and a signal-to-noise ratio of about 450, this enables quantitative spectroscopy over a broad intensity range comparable to other advanced deep‑UV CCD-based spectrometers.
When will the VioNeer Deep UV / VUV Spectrometer be available and are the specifications final?
The VioNeer Deep UV / VUV Spectrometer is currently in a draft, pre‑release phase. According to the preliminary documentation, volume shipping is planned for Q1 2027. Customers can pre‑order now and receive an estimated 10% discount off the list price. Because the specifications are labeled as preliminary, details such as wavelength range limits, optical resolution options, and interface implementation may be subject to change prior to final release. It is recommended to confirm the latest specifications and availability directly with Evolve Sensing or an authorized distributor before final system design or qualification.

Got more questions? Use the inquiry form to ask the supplier directly.

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