Description
The OPTOMAN PP-UVFS-50.8-9.52-LLM66 is a precision laser mirror engineered for high-power 1064 nm laser systems requiring exceptional optical performance and long-term reliability. Manufactured on a premium JGS1 UV fused silica substrate and coated using advanced Ion Beam Sputtering (IBS) technology, this mirror delivers greater than 99.95% absolute reflectivity at a 45° angle of incidence while maintaining extremely low absorption and scatter.
Designed for demanding industrial, scientific, and research applications, the mirror combines excellent surface quality, λ/8 surface flatness, and a high laser-induced damage threshold of 15 J/cm² (20 ns, 20 Hz), making it well suited for pulsed Nd:YAG and fiber laser systems operating at 1064 nm. Its precision optical fabrication ensures stable beam steering, minimal wavefront distortion, and consistent performance in high-energy laser environments.
PP-UVFS-50.8-9.52-LLM66 1064 nm High-Reflectivity IBS Laser Mirror
Specifications
| Substrate Material: | UV Fused Silica |
|---|---|
| Diameter: | 50.8 mm |
| Thickness: | 9.52 mm |
| Wavelength Range: | 1064 – 1064 nm |
| Angle Of Incidence (AOI): | 45 – 45 deg |
| Surface Quality, S1 (scratch-dig): | 10-5 |
| Surface Quality, S2 (scratch-dig): | Inspection Polished |
| Surface Flatness Over CA, S1 (@633 Nm Or Per Manufacturer): | Lambda/10 |
| Surface Flatness Over CA, S2 (@633 Nm Or Per Manufacturer): | Unspecified |
| Parallelism: | 3 arcmin |
| S1 Surface: | Coated |
| S2 Surface: | Uncoated |
| Reflectivity (HRa @ AOI, @ Peak Wavelength): | 99.95 % |
| Manufacturer Part Number (MPN): | PP-UVFS-50.8-9.52-LLM66 |
| FindLight SKU: | FL-24551 |
Got questions about specs? Use the inquiry form to ask.
Download Data Sheet
Features
- Manufacturer Part Number: PP-UVFS-50.8-9.52-LLM66
- Designed for 1064 nm laser wavelength at 45° angle of incidence
- >99.95% absolute reflectivity for maximum optical efficiency
- Premium JGS1 UV fused silica substrate for outstanding thermal and optical stability
- Advanced Ion Beam Sputtered (IBS) dielectric coating for superior durability and coating uniformity
- High Laser-Induced Damage Threshold (LIDT): 15 J/cm² @ 1064 nm, 20 ns, 20 Hz
- Precision 50.8 mm diameter with 9.52 mm thickness
- Surface flatness of λ/8 or better @ 633 nm
- Excellent 10-5 scratch-dig surface quality to minimize scatter
- Low absorption and minimal optical losses for demanding laser systems
- Suitable for high-power, nanosecond, and industrial laser applications
Applications
- Nd:YAG laser beam steering
- Fiber laser optical systems
- Industrial laser material processing
- Laser marking and engraving equipment
- Laser cutting and welding systems
- Scientific and laboratory laser experiments
- High-power laser beam delivery
- OEM laser manufacturing
- Medical laser instrumentation
- Precision photonics and optical research
Export & Trade Information
| ECCN: | EAR99 |
|---|---|
| HTS Code: | 9001.90.6000 |
| Estimated US Tariff: | 10% |
Frequently Asked Questions
What wavelength is the PP-UVFS-50.8-9.52-LLM66 optimized for?
What coating technology is used on this mirror?
Can this mirror be used with high-power pulsed lasers?
Which laser systems commonly use this mirror?
Why choose a UV fused silica substrate for laser mirrors?
Got more questions? Use the inquiry form to ask the supplier directly.
Similar Products
Your inquiry has been received.
Create an account by adding a password
Why create an account?
- Auto-complete inquiry forms
- View and manage all your past messages
- Save products to your favorites
- Close your account anytime — no hassle