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Description

The OPTOMAN PP-UVFS-25.4-6.35-MW51 is a premium ion beam sputtered (IBS) multiwavelength laser mirror engineered for demanding industrial, scientific, and OEM laser systems operating at multiple wavelengths. Designed on a high-quality UV fused silica substrate, this mirror delivers exceptionally high reflectivity at 1064 nm, 532 nm, and the 635–650 nm visible alignment range, enabling reliable beam steering in multi-harmonic Nd:YAG laser platforms.

Optimized for a 45° angle of incidence, the mirror combines outstanding optical performance with excellent laser-induced damage threshold (LIDT), making it suitable for high-power pulsed laser applications. Precision polishing, λ/4 surface flatness, and durable IBS coatings help minimize optical losses while maintaining long-term stability in demanding environments. Whether used in laser marking, micromachining, medical systems, or laboratory optical setups, the PP-UVFS-25.4-6.35-MW51 offers dependable performance and excellent coating durability.

PP-UVFS-25.4-6.35-MW51 Multiwavelength Laser Mirror

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Specifications

Substrate Material: UV Fused Silica
Diameter: 25.4 mm
Thickness: 6.35 mm
Wavelength Range: 1064 – 1064 nm
Angle Of Incidence (AOI): 45 – 45 deg
Surface Quality, S1 (scratch-dig): 20-10
Surface Quality, S2 (scratch-dig): Inspection Polished
Surface Flatness Over CA, S1 (@633 Nm Or Per Manufacturer): Lambda/4
Surface Flatness Over CA, S2 (@633 Nm Or Per Manufacturer): Unspecified
Parallelism: 5 arcmin
S1 Surface: Coated
S2 Surface: Uncoated
Reflectivity (HRs @ AOI, @ Peak Wavelength): 99.9 %
Reflectivity (HRp @ AOI, @ Peak Wavelength): 99.4 %
Manufacturer Part Number (MPN): PP-UVFS-25.4-6.35-MW51
FindLight SKU: FL-24559

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Features

  • Multiwavelength high-reflectivity coating optimized for 1064 nm, 532 nm, and 635–650 nm
  • IBS dielectric coating provides outstanding durability, low absorption, and long operational lifetime
  • Reflectivity exceeding 99.9% (s-polarization) at 1064 nm and 99.8% (s-polarization) at 532 nm
  • High-performance operation at 45° angle of incidence
  • UV fused silica substrate offers excellent thermal stability and low optical absorption
  • High laser-induced damage threshold suitable for high-energy pulsed laser systems
  • Precision-polished optical surface with λ/4 flatness over the clear aperture
  • 25.4 mm diameter with 6.35 mm thickness for compatibility with standard optomechanical mounts
  • 20-10 scratch-dig surface quality minimizes scattering and preserves beam quality
  • Ideal for industrial, medical, research, and OEM laser integration applications

Applications

  • Nd:YAG laser beam steering systems
  • Laser marking and engraving equipment
  • Laser micromachining and precision manufacturing
  • Medical laser instruments
  • Scientific optical experiments
  • Nonlinear optics and harmonic generation setups
  • Multiwavelength laser alignment systems
  • OEM laser modules
  • Photonics research laboratories
  • Industrial laser processing systems

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

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Frequently Asked Questions

What wavelengths is the PP-UVFS-25.4-6.35-MW51 designed for?
The mirror is optimized for high reflectivity at 1064 nm, 532 nm, and the visible 635–650 nm wavelength range, making it ideal for multi-harmonic Nd:YAG laser systems and alignment lasers.
What coating technology is used?
The mirror features an Ion Beam Sputtered (IBS) dielectric coating, which provides excellent environmental stability, high laser damage resistance, low absorption, and long-term optical performance compared with conventional coating methods.
Is this mirror suitable for high-power pulsed lasers?
Yes. The coating is optimized for high laser-induced damage thresholds, supporting pulsed laser operation with damage thresholds exceeding 10 J/cm² at 1064 nm (10 ns) and over 5 J/cm² at 532 nm (10 ns) under specified test conditions.
What types of laser systems commonly use this mirror?
It is commonly integrated into Nd:YAG laser platforms, laser marking systems, micromachining equipment, medical lasers, research instruments, and OEM photonics assemblies requiring efficient reflection of multiple laser wavelengths.
Why choose a multiwavelength laser mirror instead of separate mirrors?
A multiwavelength mirror simplifies optical system design by efficiently reflecting several laser wavelengths with a single optic. This reduces alignment complexity, minimizes component count, and improves overall system reliability in multi-line laser applications.

Got more questions? Use the inquiry form to ask the supplier directly.

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