Description
The OPTOMAN PP-UVFS-25.4-6.35-BBHR53 is a premium deep-ultraviolet laser mirror engineered for demanding optical systems operating between 196 and 200 nm. Manufactured on a precision UV fused silica substrate and coated using advanced Ion Beam Sputtering (IBS) technology, this mirror delivers high reflectivity, exceptional environmental stability, and low optical absorption for reliable long-term operation.
Optimized for a 45° angle of incidence, the mirror provides greater than 95% s-polarized reflectivity and greater than 90% p-polarized reflectivity across the target wavelength range. Its high-quality optical surface, excellent flatness, and durable IBS coating make it an ideal choice for excimer laser systems, deep-UV spectroscopy, semiconductor processing, photolithography, and advanced scientific instrumentation where consistent beam steering and optical stability are essential.
PP-UVFS-25.4-6.35-BBHR53 Deep-UV Laser Mirror 196–200 nm
Specifications
| Substrate Material: | UV Fused Silica |
|---|---|
| Diameter: | 25.4 mm |
| Thickness: | 6.35 mm |
| Wavelength Range: | 196 – 200 nm |
| Angle Of Incidence (AOI): | 45 – 45 deg |
| Surface Quality, S1 (scratch-dig): | 20-10 |
| Surface Quality, S2 (scratch-dig): | Inspection Polished |
| Surface Flatness Over CA, S1 (@633 Nm Or Per Manufacturer): | Other |
| Surface Flatness Over CA, S2 (@633 Nm Or Per Manufacturer): | Unspecified |
| Parallelism: | 0.17 arcmin |
| S1 Surface: | Coated |
| S2 Surface: | Uncoated |
| Reflectivity (HRs @ AOI, @ Peak Wavelength): | 95 % |
| Reflectivity (HRp @ AOI, @ Peak Wavelength): | 90 % |
| Manufacturer Part Number (MPN): | PP-UVFS-25.4-6.35-BBHR53 |
| FindLight SKU: | FL-24563 |
Got questions about specs? Use the inquiry form to ask.
Download Data Sheet
Features
- Manufacturer Part Number: PP-UVFS-25.4-6.35-BBHR53
- Optimized for 196–200 nm deep-UV laser applications
- High-performance IBS dielectric coating for outstanding durability and long coating lifetime
- Reflectivity of HRs >95% and HRp >90% at 45° angle of incidence
- Precision 25.4 mm UV fused silica substrate with 6.35 mm thickness
- Surface quality of 20-10 scratch-dig over the clear aperture
- Surface flatness better than λ/5 at 633 nm
- Low absorption and minimal optical losses for stable laser performance
- Excellent resistance to coating aging and environmental degradation
- Suitable for high average power and high repetition rate UV laser systems
Applications
- Deep-UV excimer laser beam steering
- Semiconductor wafer inspection and photolithography
- UV spectroscopy and analytical instrumentation
- Scientific and university research laboratories
- Fluorescence and photochemical research systems
- High-precision industrial UV laser processing
- Optical testing and metrology equipment
- Advanced ultraviolet imaging systems
Export & Trade Information
| ECCN: | EAR99 |
|---|---|
| HTS Code: | 9001.90.6000 |
| Estimated US Tariff: | 10% |
Frequently Asked Questions
What wavelength range is this mirror designed for?
Why is Ion Beam Sputtering (IBS) beneficial?
At what angle of incidence does the mirror achieve its specified performance?
Can this mirror be used with high-power UV laser systems?
Which applications are best suited for this mirror?
Got more questions? Use the inquiry form to ask the supplier directly.
Similar Products
Your inquiry has been received.
Create an account by adding a password
Why create an account?
- Auto-complete inquiry forms
- View and manage all your past messages
- Save products to your favorites
- Close your account anytime — no hassle