Description
The OPTOMAN PP-UVFS-25.4-6.35-LLM84 is a high-performance UV laser mirror designed for precise beam steering and reflection in advanced ultraviolet laser systems. Manufactured with a premium UV fused silica substrate and an ion beam sputtered (IBS) high-reflectivity coating, this mirror delivers excellent optical efficiency, low absorption, and reliable performance in demanding laser environments.
Optimized for 355 nm third-harmonic Nd:YAG laser applications at a 40–50° angle of incidence, the mirror provides reflectivity greater than 99.5% while maintaining strong resistance to laser-induced damage and environmental stress. Its precision surface quality, stable fused silica construction, and durable coating make it suitable for industrial, scientific, and OEM photonics systems requiring consistent UV beam control.
PP-UVFS-25.4-6.35-LLM84 355nm UV Laser Mirror
Specifications
| Substrate Material: | UV Fused Silica |
|---|---|
| Diameter: | 25.4 mm |
| Thickness: | 6.35 mm |
| Wavelength Range: | 355 – 355 nm |
| Angle Of Incidence (AOI): | 40 – 50 deg |
| Surface Quality, S1 (scratch-dig): | 20-10 |
| Surface Quality, S2 (scratch-dig): | Inspection Polished |
| Surface Flatness Over CA, S1 (@633 Nm Or Per Manufacturer): | Lambda/8 |
| Surface Flatness Over CA, S2 (@633 Nm Or Per Manufacturer): | Unspecified |
| Parallelism: | 5 arcmin |
| S1 Surface: | Coated |
| S2 Surface: | Uncoated |
| Reflectivity (HRa @ AOI, @ Peak Wavelength): | 99.5 % |
| Manufacturer Part Number (MPN): | PP-UVFS-25.4-6.35-LLM84 |
| FindLight SKU: | FL-24567 |
Got questions about specs? Use the inquiry form to ask.
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Features
- High reflectivity IBS coating with HRa >99.5% at 355 nm for efficient ultraviolet laser beam steering
- UV fused silica substrate provides excellent thermal stability, low expansion, and reliable UV performance
- Optimized for 40–50° angle of incidence operation in 355 nm Nd:YAG laser systems
- Precision optical surface with 20-10 scratch-dig quality and λ/8 surface flatness at 633 nm
- Low absorption coating technology supports high-power and high-repetition-rate laser applications
- 25.4 mm diameter and 6.35 mm thickness standard optical format for easy system integration
- Laser-induced damage threshold greater than 0.4 J/cm² at 355 nm, 5 ps pulse duration, kHz repetition rate
Applications
- UV laser beam steering and folding systems
- 355 nm Nd:YAG third-harmonic laser platforms
- Laser micromachining and precision material processing
- Semiconductor manufacturing and photolithography equipment
- Scientific research instruments and laboratory laser setups
- Biomedical laser systems requiring stable ultraviolet reflectio
- OEM laser sources and optical assemblies requiring high-performance UV mirrors
Export & Trade Information
| ECCN: | EAR99 |
|---|---|
| HTS Code: | 9001.90.6000 |
| Estimated US Tariff: | 10% |
Frequently Asked Questions
What wavelength is the OPTOMAN PP-UVFS-25.4-6.35-LLM84 designed for?
What substrate material is used in this UV laser mirror?
What type of coating does the PP-UVFS-25.4-6.35-LLM84 have?
Can this mirror be used in high-power laser systems?
Which laser systems commonly use this 355 nm UV mirror?
Got more questions? Use the inquiry form to ask the supplier directly.
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