Description
The OPTOMAN PP-UVFS-50-8-9-52-LLM135 is a premium dielectric laser mirror engineered for exceptional reflectivity at 1350 nm. Fabricated from high-quality UV fused silica, this precision optic combines excellent surface quality with low optical losses to deliver stable beam control in demanding laser applications.
Its advanced multilayer coating is designed to maintain high reflectance while minimizing absorption and scatter, making the mirror suitable for high-energy and ultrafast laser systems. The 50 mm aperture accommodates larger beam diameters, while the robust fused silica substrate provides outstanding thermal stability and resistance to environmental influences.
Designed for research laboratories, OEM laser manufacturers, and industrial photonics systems, the PP-UVFS-50-8-9-52-LLM135 delivers reliable long-term performance in applications where optical precision and durability are essential.
PP-UVFS-50-8-9-52-LLM135 UV Fused Silica Laser Mirror
Specifications
| Substrate Material: | UV Fused Silica |
|---|---|
| Diameter: | 50.8 mm |
| Thickness: | 9.52 mm |
| Wavelength Range: | 940 – 980 nm |
| Angle Of Incidence (AOI): | 45 – 45 deg |
| Surface Quality, S1 (scratch-dig): | 20-10 |
| Surface Quality, S2 (scratch-dig): | Inspection Polished |
| Surface Flatness Over CA, S1 (@633 Nm Or Per Manufacturer): | Other |
| Surface Flatness Over CA, S2 (@633 Nm Or Per Manufacturer): | Lambda/8 |
| Parallelism: | 5 arcmin |
| S1 Surface: | Coated |
| S2 Surface: | Uncoated |
| Reflectivity (HRa @ AOI, @ Peak Wavelength): | 99.9 % |
| Manufacturer Part Number (MPN): | PP-UVFS-50.8-9.52-LLM135 |
| FindLight SKU: | FL-24565 |
Got questions about specs? Use the inquiry form to ask.
Download Data Sheet
Features
- Dielectric coating optimized for high reflectivity at 1350 nm
- Premium UV fused silica substrate with excellent optical homogeneity
- 50 mm optic diameter for medium and large beam applications
- Low absorption and minimal scattering for improved optical efficiency
- High laser damage resistance for demanding laser environments
- Excellent wavefront preservation and surface quality
- Thermally stable construction for consistent long-term performance
- Compatible with research, industrial, and OEM laser systems
Applications
- Near-infrared laser beam steering
- Fiber laser optical systems
- Ultrafast laser beam delivery
- Optical spectroscopy equipment
- Nonlinear optical experiments
- Scientific instrumentation
- Biomedical laser research
- Industrial photonics integration
Export & Trade Information
| ECCN: | EAR99 |
|---|---|
| HTS Code: | 9001.90.6000 |
| Estimated US Tariff: | 10% |
Frequently Asked Questions
What is the primary operating wavelength of this mirror?
Why is UV fused silica used as the substrate? durability, making it an ideal substrate for precision laser optics.
Is this mirror suitable for high-power laser applications?
What advantages does a dielectric laser mirror provide over a metallic mirror?
Which industries commonly use this optical mirror?
Got more questions? Use the inquiry form to ask the supplier directly.
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