Description
The OPTOMAN PP-UVFS-50.8-9.52-LLM64 is a high-performance UV laser mirror designed for demanding 355 nm laser applications requiring exceptional reflectivity, low absorption, and reliable operation under high-power conditions. Manufactured with a UV fused silica (JGS1) substrate and advanced ion beam sputtering (IBS) coating technology, this optical mirror provides superior beam steering performance for third harmonic Nd:YAG laser systems.
Featuring a 50.8 mm diameter and 9.52 mm thickness, the mirror delivers absolute reflectivity above 99.9% at 355 nm with a 45Β° angle of incidence. Its high laser-induced damage threshold (LIDT) and precision optical surface specifications make it suitable for industrial laser systems, scientific instruments, and advanced photonics applications where long-term stability and minimal optical losses are critical.
PP-UVFS-50.8-9.52-LLM64 355nm UV Laser Mirror with IBS Coating
Specifications
| Substrate Material: | UV Fused Silica |
|---|---|
| Diameter: | 50.8 mm |
| Thickness: | 9.52 mm |
| Wavelength Range: | 355 β 355 nm |
| Angle Of Incidence (AOI): | 45 β 45 deg |
| Surface Quality, S1 (scratch-dig): | 20-10 |
| Surface Quality, S2 (scratch-dig): | Inspection Polished |
| Surface Flatness Over CA, S1 (@633 Nm Or Per Manufacturer): | Lambda/8 |
| Surface Flatness Over CA, S2 (@633 Nm Or Per Manufacturer): | Lambda/10 |
| Parallelism: | 5 arcmin |
| S1 Surface: | Coated |
| S2 Surface: | Uncoated |
| Reflectivity (HRa @ AOI, @ Peak Wavelength): | 99.9 % |
| Manufacturer Part Number (MPN): | PP-UVFS-50.8-9.52-LLM64 |
| FindLight SKU: | FL-24556 |
Got questions about specs? Use the inquiry form to ask.
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Features
- High reflectivity exceeding 99.9% at 355 nm wavelength for efficient UV laser beam control
- UV fused silica (JGS1) substrate providing excellent thermal stability and optical durability
- Ion beam sputtering (IBS) coating technology for low absorption and enhanced coating lifetime
- Designed for 45Β° angle of incidence UV laser applications
- High laser-induced damage threshold of 7.5 J/cmΒ² at 355 nm, 20 ns, 20 Hz
- Precision 50.8 mm diameter and 9.52 mm thickness design
- Surface flatness better than Ξ»/8 at 633 nm over clear aperture
- Surface quality of 20-10 scratch-dig according to MIL-PRF-13830B standardsβ
- Clear aperture of minimum 45 mm for optimized beam transmission area
- Suitable for high repetition rate and high average power UV laser systems
Applications
- UV laser beam steering and folding systems
- 355 nm third harmonic Nd:YAG laser applications
- Industrial laser processing and micromachining equipment
- Precision laser marking, engraving, and inspection systems
- Semiconductor and electronics manufacturing processes
- Scientific research instruments and laboratory laser setups
- Biomedical and medical laser systems
- Ultrafast and high-power UV photonics applications
Export & Trade Information
| ECCN: | EAR99 |
|---|---|
| HTS Code: | 9001.90.6000 |
| Estimated US Tariff: | 10% |
Frequently Asked Questions
What wavelength is the OPTOMAN PP-UVFS-50.8-9.52-LLM64 laser mirror designed for?
What coating technology is used on this UV laser mirror?
Can this mirror be used in high-power laser systems?
Why is UV fused silica used as the substrate material?
What applications commonly use this 355 nm UV laser mirror?
Got more questions? Use the inquiry form to ask the supplier directly.
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