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Description

The OPTOMAN PP-UVFS-12.7-6.35-LLM64 is a high-performance ultraviolet laser mirror designed for precise beam steering and reflection in demanding UV laser systems. Manufactured from UV fused silica (UVFS) substrate, this optical mirror features an IBS dielectric coating optimized for 355 nm wavelength operation at a 45° angle of incidence.

With high reflectivity exceeding 99.9%, low absorption, excellent surface quality, and strong resistance to laser-induced damage, the PP-UVFS-12.7-6.35-LLM64 provides reliable performance in high-power and high-repetition-rate laser applications. Its compact 12.7 mm diameter and 6.35 mm thickness design makes it suitable for integration into precision optical assemblies, UV laser modules, and harmonic generation systems.

PP-UVFS-12.7-6.35-LLM64 355nm UV Laser Mirror

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Specifications

Substrate Material: UV Fused Silica
Diameter: 12.7 mm
Thickness: 6.35 mm
Wavelength Range: 355 – 355 nm
Angle Of Incidence (AOI): 45 – 45 deg
Surface Quality, S1 (scratch-dig): 10-5
Surface Quality, S2 (scratch-dig): Inspection Polished
Surface Flatness Over CA, S1 (@633 Nm Or Per Manufacturer): Lambda/8
Surface Flatness Over CA, S2 (@633 Nm Or Per Manufacturer): Lambda/10
Parallelism: 0.17 arcmin
S1 Surface: Coated
S2 Surface: Uncoated
Reflectivity (HRa @ AOI, @ Peak Wavelength): 99.9 %
Manufacturer Part Number (MPN): PP-UVFS-12.7-6.35-LLM64
FindLight SKU: FL-24555

Got questions about specs? Use the inquiry form to ask.

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Features

  • High-reflectivity IBS coating with Rs(abs) >99.9% at 355 nm wavelength
  • Designed for 45° angle of incidence UV laser applications
  • UV fused silica substrate (Corning 7980 0F) for excellent UV transmission and thermal stability
  • Diameter: 12.7 mm; Thickness: 6.35 mm
  • Surface quality of 10-5 scratch-dig according to MIL-PRF-13830B standards
  • Surface flatness better than λ/8 at 633 nm over a 10 mm aperture
  • Low absorption coating technology for improved laser efficiency
  • High laser-induced damage threshold: 7.5 J/cm² at 355 nm, 20 ns, 20 Hz
  • Suitable for demanding pulsed UV laser systems

Applications

  • UV laser beam steering and folding systems
  • 355 nm Nd:YAG third harmonic laser systems
  • Laser marking, engraving, and micromachining equipment
  • Precision UV spectroscopy and analytical instruments
  • Biomedical and scientific laser research systems
  • Industrial laser processing applications
  • Optical assemblies requiring high-reflectivity UV mirrors

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

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Frequently Asked Questions

What wavelength is the OPTOMAN PP-UVFS-12.7-6.35-LLM64 laser mirror designed for?
The PP-UVFS-12.7-6.35-LLM64 is optimized for ultraviolet laser applications at 355 nm, commonly used with third harmonic Nd:YAG laser systems.
What material is used for this UV laser mirror substrate?
This mirror uses UV fused silica (UVFS), specifically Corning 7980 0F material, which provides excellent UV performance, low thermal expansion, and high optical durability.
What is the reflectivity of the OPTOMAN PP-UVFS-12.7-6.35-LLM64?
The mirror provides Rs(abs) reflectivity greater than 99.9% at 355 nm when used at a 45° angle of incidence, minimizing optical losses in UV laser systems.
Can this mirror be used in high-power laser applications?
Yes. The mirror is designed for demanding laser environments and features a high laser-induced damage threshold of 7.5 J/cm² at 355 nm, 20 ns pulse duration, and 20 Hz repetition rate.
What are the typical applications of this UV laser mirror?
Typical applications include UV laser beam delivery, harmonic generation systems, laser processing equipment, scientific instruments, and precision optical systems requiring stable 355 nm reflection performance.

Got more questions? Use the inquiry form to ask the supplier directly.

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