Description

The OPTOMAN PP-UVFS-50.8-9.52-LLM298 is a precision UV laser mirror designed for demanding ultraviolet laser systems operating between 343 nm and 355 nm. Manufactured on a high-quality UV fused silica (JGS1) substrate, this mirror features advanced Ion Beam Sputtered (IBS) coatings that provide exceptionally high reflectivity, low absorption, and outstanding long-term environmental stability.

Optimized for 45° angle of incidence, the mirror delivers HRs >99.9% and HRp >99.7% across the 343–355 nm wavelength range, making it an excellent choice for third-harmonic Nd:YAG and Yb:YAG laser applications. The precision-polished optical surface offers λ/10 flatness over a 30 mm aperture and 20-10 scratch-dig surface quality on the coated side, helping preserve beam quality while minimizing scattering. Built for high-average-power and high-repetition-rate laser systems, the PP-UVFS-50.8-9.52-LLM298 provides reliable performance in industrial, scientific, and OEM optical assemblies.

PP-UVFS-50.8-9.52-LLM298 UV Laser Mirror 343-355 nm

Specifications

Substrate Material: UV Fused Silica
Diameter: 50.8 mm
Thickness: 9.52 mm
Wavelength Range: 343 – 355 nm
Angle Of Incidence (AOI): 45 – 45 deg
Surface Quality, S1 (scratch-dig): 20-10
Surface Quality, S2 (scratch-dig): Inspection Polished
Surface Flatness Over CA, S1 (@633 Nm Or Per Manufacturer): Lambda/10
Surface Flatness Over CA, S2 (@633 Nm Or Per Manufacturer): Unspecified
Parallelism: 5 arcmin
S1 Surface: Coated
S2 Surface: Uncoated
Reflectivity (HRs @ AOI, @ Peak Wavelength): 99.9 %
Reflectivity (HRp @ AOI, @ Peak Wavelength): 99.7 %
Manufacturer Part Number (MPN): PP-UVFS-50.8-9.52-LLM298
FindLight SKU: FL-24549

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Features

  • Manufacturer Part Number: PP-UVFS-50.8-9.52-LLM298
  • Designed for 343–355 nm UV laser wavelengths
  • IBS dielectric coating for exceptional optical durability
  • Reflectivity: HRs >99.9% and HRp >99.7% at 45° AOI
  • UV fused silica (JGS1) substrate for excellent UV transmission and thermal stability
  • Diameter: 50.8 mm
  • Thickness: 9.52 mm
  • Clear aperture: Minimum 45 mm
  • Surface quality: 20-10 scratch-dig on coated surface
  • Surface flatness: Better than λ/10 at 633 nm over any 30 mm diameter within the clear aperture
  • Parallelism better than 5 arcmin
  • Uncoated rear surface for flexible optical integration
  • Excellent resistance to environmental stress and long-term coating stability
  • Suitable for high-average-power and high-repetition-rate UV laser systems

Applications

  • Third-harmonic (355 nm) Nd:YAG laser systems
  • Third-harmonic Yb:YAG laser beam delivery
  • UV laser micromachining
  • Precision laser material processing
  • Semiconductor manufacturing equipment
  • Laser marking and engraving
  • Scientific spectroscopy systems
  • Biomedical laser instrumentation
  • Industrial UV optical assemblies
  • Research laboratories and photonics development

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What wavelength range is this mirror optimized for?
The PP-UVFS-50.8-9.52-LLM298 is optimized for ultraviolet laser operation from 343 nm to 355 nm, making it ideal for third-harmonic solid-state laser applications.
Why are IBS coatings beneficial?
Ion Beam Sputtered (IBS) coatings produce dense, highly durable optical films with extremely low absorption, excellent environmental resistance, and long-term optical stability, making them ideal for demanding laser applications.
What angle of incidence should be used?
The mirror is specifically designed for operation at a 45° angle of incidence, where it achieves its specified high reflectivity for both s- and p-polarized light.
Can this mirror be used in high-power UV laser systems?
Yes. Its low-loss IBS coating and UV fused silica substrate make it well suited for high-average-power and high-repetition-rate ultraviolet laser systems requiring stable optical performance.
What types of systems commonly use this mirror?
This mirror is widely used in UV laser beam steering, laser micromachining, semiconductor processing, spectroscopy, scientific research, biomedical instrumentation, and OEM laser equipment where efficient reflection at 343–355 nm is required.

Got more questions? Use the inquiry form to ask the supplier directly.

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