Description
The OPTOMAN PP-UVFS-38.1-5.5-LLM372 is a premium Deep UV laser mirror engineered for demanding ArF excimer laser applications operating at 193.4 nm. Manufactured from high-quality Corning 7980 UV fused silica and coated using advanced Ion Beam Sputtering (IBS) technology, this mirror delivers reflectivity greater than 98% at a 28–32° angle of incidence while maintaining exceptional optical stability and low absorption.
Designed for long service life in high-energy ultraviolet laser systems, the mirror features precision surface flatness better than λ/8 at 633 nm, superior 20-10 scratch-dig surface quality, and excellent environmental durability. Its dense IBS coating resists aging, ensuring consistent optical performance even in demanding industrial, semiconductor, scientific, and research environments.
PP-UVFS-38.1-5.5-LLM372 193 nm Deep UV Laser Mirror
Specifications
| Substrate Material: | UV Fused Silica |
|---|---|
| Diameter: | 38.1 mm |
| Thickness: | 5.5 mm |
| Wavelength Range: | 193.4 – 193.4 nm |
| Angle Of Incidence (AOI): | 28 – 32 deg |
| Surface Quality, S1 (scratch-dig): | 20-10 |
| Surface Quality, S2 (scratch-dig): | Inspection Polished |
| Surface Flatness Over CA, S1 (@633 Nm Or Per Manufacturer): | Lambda/8 |
| Surface Flatness Over CA, S2 (@633 Nm Or Per Manufacturer): | Unspecified |
| Parallelism: | 1 arcmin |
| S1 Surface: | Coated |
| S2 Surface: | Uncoated |
| Reflectivity (HRa @ AOI, @ Peak Wavelength): | 98 % |
| Manufacturer Part Number (MPN): | PP-UVFS-38.1-5.5-LLM372 |
| FindLight SKU: | FL-24545 |
Got questions about specs? Use the inquiry form to ask.
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Features
- Manufacturer Part Number: PP-UVFS-38.1-5.5-LLM372
- Optimized for 193.4 nm ArF excimer lasers
- High-reflectivity IBS dielectric coating with R >98% at 28–32° AOI
- Premium Corning 7980 UV fused silica substrate
- Precision optical flatness better than λ/8 @ 633 nm
- 20-10 scratch-dig optical surface quality
- Low absorption for improved laser efficiency
- Excellent coating durability with virtually no reflectivity aging
- Designed for high average power and high repetition rate UV laser systems
- Laser-engraved wavelength identification and orientation marking for easy installation
Applications
- ArF excimer laser beam steering
- Semiconductor lithography systems
- Deep UV laser processing equipment
- Photolithography and microfabrication
- Scientific spectroscopy instruments
- Precision laser research laboratories
- UV optical test benches
- High-energy laser beam delivery systems
- Industrial ultraviolet manufacturing
- Advanced photonics and optics development
Export & Trade Information
| ECCN: | EAR99 |
|---|---|
| HTS Code: | 9001.90.6000 |
| Estimated US Tariff: | 10% |
Frequently Asked Questions
What wavelength is the PP-UVFS-38.1-5.5-LLM372 optimized for?
What advantages does Ion Beam Sputtering (IBS) coating provide?
Can this mirror be used in high-power laser systems?
What substrate material is used for this mirror?
Which industries commonly use this optical mirror?
Got more questions? Use the inquiry form to ask the supplier directly.
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