Description

The OPTOMAN PP-UVFS-25.4-6.35-MW97 is a high-performance deep UV laser mirror designed for demanding ultraviolet optical systems operating at 193 nm and 635 nm wavelengths. Manufactured with a UV-grade fused silica substrate, this precision mirror provides reliable beam steering performance, excellent surface quality, and optimized reflectivity for advanced laser applications. The optic features an ion beam sputtered (IBS) coating with high reflectance of R>97.0% at 193 nm and R>95.0% at 635 nm, making it suitable for systems requiring efficient UV reflection and visible alignment capability.

With a 25.4 mm diameter and 6.35 mm thickness, the mirror offers high dimensional stability, low wavefront distortion, and precision optical performance at a 45° angle of incidence. Its UV fused silica construction ensures durability in deep ultraviolet environments, supporting integration into high-precision laser platforms, scientific instruments, and industrial photonics systems.

PP-UVFS-25.4-6.35-MW97 Deep UV Laser Mirror

Specifications

Substrate Material: UV Fused Silica
Diameter: 25.4 mm
Thickness: 6.35 mm
Wavelength Range: 193 – 193 nm
Angle Of Incidence (AOI): 45 – 45 deg
Surface Quality, S1 (scratch-dig): 40-20
Surface Quality, S2 (scratch-dig): Inspection Polished
Surface Flatness Over CA, S1 (@633 Nm Or Per Manufacturer): Lambda/10
Surface Flatness Over CA, S2 (@633 Nm Or Per Manufacturer): Unspecified
Parallelism: 0.17 arcmin
S1 Surface: Coated
S2 Surface: Uncoated
Reflectivity (HRa @ AOI, @ Peak Wavelength): 97.2 %
Manufacturer Part Number (MPN): PP-UVFS-25.4-6.35-MW97
FindLight SKU: FL-24547

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Features

  • High-reflectivity deep UV laser mirror optimized for 193 nm applications with reflectance of R>97.0% at 193 nm and R>95.0% at 635 nm for efficient ultraviolet beam steering and visible alignment
  • Premium UV fused silica (UVFS) substrate provides excellent UV durability, low thermal expansion, and stable optical performance in demanding laser environments
  • Ion beam sputtered (IBS) coating technology ensures superior coating durability, high laser damage resistance, and long-term reflectivity stability
  • Precision optical surface quality with λ/10 surface flatness at 633 nm helps minimize wavefront distortion and maintain accurate beam control
  • Designed for 45° angle of incidence operation, making it suitable for folded optical paths and compact laser system configurations
  • Standard 25.4 mm diameter format allows easy integration with commonly used optical mounts and laboratory setups
  • Optimized for deep ultraviolet laser systems requiring reliable performance, high reflectance, and precision optical alignment.

Applications

  • Deep UV laser systems using 193 nm excimer lasers for beam routing, reflection, and optical path management
  • Semiconductor manufacturing and photolithography equipment requiring high-performance UV optical components
  • UV laser micromachining applications including precision cutting, drilling, marking, and material processing
  • Scientific research instruments, spectroscopy systems, and laboratory optical setups requiring accurate UV beam manipulation
  • Biomedical and industrial UV technologies involving precision optical inspection, measurement, and analysis
  • Aerospace, defense, and advanced photonics systems requiring durable high-reflectivity UV mirrors
  • Custom laser assemblies and optical systems where compact, high-quality UV beam steering components are required.

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What wavelength range is the OPTOMAN PP-UVFS-25.4-6.35-MW97 laser mirror designed for?
The mirror is optimized for deep UV operation at 193 nm while also providing high reflectivity at 635 nm for visible alignment and optical system integration.
What material is used for this laser mirror substrate?
The mirror uses UV-grade fused silica (UVFS), a material selected for its excellent UV transmission, thermal stability, and optical durability in demanding laser environments.
What is the angle of incidence specification for this mirror?
The OPTOMAN PP-UVFS-25.4-6.35-MW97 is designed for operation at a 45° angle of incidence, making it suitable for folded beam paths and beam steering applications.
What type of coating is applied to this UV laser mirror?
The mirror features an ion beam sputtered (IBS) high-reflectivity coating engineered for deep UV performance, providing strong reflectance at 193 nm and 635 nm wavelengths.
Which industries use 193 nm UV laser mirrors like this model?
These mirrors are commonly used in semiconductor processing, UV lithography, laser micromachining, scientific research, and industrial photonics systems requiring precise ultraviolet beam control.

Got more questions? Use the inquiry form to ask the supplier directly.

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