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Description

The OPTOMAN PP-UVFS-25.4-6.35-LLM417 is a high-performance 355 nm non-degrading UV laser mirror designed for demanding ultraviolet laser applications requiring exceptional reflectivity, long operational lifetime, and reliable beam control. Manufactured with a UV fused silica (Corning 7980 0F) substrate and an ion beam sputtered (IBS) high-reflectivity coating, this precision optical mirror delivers HRs >99.7% and HRp >99.6% reflectance at a 45° angle of incidence.

With a 25.4 mm diameter, 6.35 mm thickness, λ/10 surface flatness, and optimized performance at 355 nm, this UV dielectric mirror is engineered for third-harmonic Nd:YAG and Nd:YVO₄ laser systems, ultrafast UV platforms, and precision manufacturing environments where stable optical performance is critical. Its non-degrading coating technology helps reduce color-change effects, extend mirror lifetime, and minimize maintenance requirements in high-energy UV laser setups.

PP-UVFS-25.4-6.35-LLM417 355nm Non-Degrading UV Laser Mirror

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Specifications

Substrate Material: UV Fused Silica
Diameter: 25.4 mm
Thickness: 6.35 mm
Wavelength Range: 355 – 355 nm
Angle Of Incidence (AOI): 45 – 45 deg
Surface Quality, S1 (scratch-dig): 20-10
Surface Quality, S2 (scratch-dig): Inspection Polished
Surface Flatness Over CA, S1 (@633 Nm Or Per Manufacturer): Lambda/10
Surface Flatness Over CA, S2 (@633 Nm Or Per Manufacturer): Unspecified
Parallelism: 0.17 arcmin
S1 Surface: Coated
S2 Surface: Uncoated
Reflectivity (HRs @ AOI, @ Peak Wavelength): 99.7 %
Reflectivity (HRp @ AOI, @ Peak Wavelength): 99.6 %
Manufacturer Part Number (MPN): PP-UVFS-25.4-6.35-LLM417
FindLight SKU: FL-24533

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Features

  • High Reflectivity at 355 nm UV Wavelength: Provides HRs >99.7% and HRp >99.6% reflectance at 45° AOI for efficient UV beam handling.
  • Non-Degrading Mirror Technology: Designed for long-term UV exposure stability with enhanced lifetime exceeding 10,000 hours and reduced UV-induced coating degradation.
  • Premium UV Fused Silica Substrate: Built from Corning 7980 0F UVFS material for excellent transmission characteristics, thermal stability, and durability.
  • Precision Optical Quality: Features λ/10 surface flatness at 633 nm over a 15 mm aperture, 20-10 scratch-dig surface quality, and tight dimensional tolerances.
  • Ion Beam Sputtered (IBS) Coating: Advanced dielectric coating technology provides high durability and low optical losses in demanding UV laser environments.
  • Optimized for 45° Angle of Incidence: Designed specifically for UV beam steering and folding configurations in laser optical systems.

Applications

  • 355 nm Nd:YAG and Nd:YVO₄ Laser Systems: Ideal for third-harmonic UV laser beam routing, folding, and cavity applications.
  • Ultrafast UV Laser Platforms: Suitable for femtosecond and picosecond UV systems requiring stable high-reflectivity optics.
  • UV Micromachining and Precision Manufacturing: Used in laser ablation, surface structuring, glass and ceramic processing, and microfabrication applications.
  • Polymer Processing and UV Curing Research: Supports reliable UV beam delivery for industrial and laboratory systems.
  • Through Glass Via (TGV) and Advanced Materials Research: Enables precise UV laser processing where stable beam alignment and low optical loss are required.

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What wavelength is the OPTOMAN PP-UVFS-25.4-6.35-LLM417 laser mirror designed for?
The OPTOMAN PP-UVFS-25.4-6.35-LLM417 is optimized for 355 nm ultraviolet laser applications and provides high reflectivity performance at a 45° angle of incidence.
What type of coating is used on the PP-UVFS-25.4-6.35-LLM417 mirror?
This mirror uses an ion beam sputtered (IBS) dielectric coating on the first surface, providing HRs >99.7% and HRp >99.6% reflectance at 355 nm, while the second surface remains uncoated.
What makes this UV laser mirror different from standard UV mirrors?
The PP-UVFS-25.4-6.35-LLM417 features OPTOMAN’s non-degrading mirror technology, which improves resistance to UV-induced degradation, reduces color-change effects, and supports extended operating lifetime in demanding laser systems.
What substrate material is used for this 355 nm laser mirror?
The mirror is manufactured using UV fused silica (UVFS) based on Corning 7980 0F material, offering excellent stability for high-performance UV optical applications.
Which applications commonly use the PP-UVFS-25.4-6.35-LLM417 mirror?
This UV laser mirror is commonly used in third-harmonic Nd:YAG and Nd:YVO₄ lasers, UV micromachining systems, ultrafast laser platforms, precision material processing, and scientific research setups requiring reliable 355 nm beam control.

Got more questions? Use the inquiry form to ask the supplier directly.

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