Description

The OPTOMAN PP-UVFS-25.4-6.35-LLM395 is a high-performance 1064 nm laser mirror engineered for demanding Nd:YAG laser systems and high-intensity beam steering applications. Featuring a UV fused silica substrate and an ion beam sputtered (IBS) high-reflectivity coating, this optical mirror provides exceptional reflectance above 99.9% at a 45° angle of incidence while maintaining superior durability under high laser power conditions.

Designed as part of OPTOMAN’s SuperHero Power mirror series, this 25.4 mm diameter mirror delivers outstanding laser-induced damage resistance with an LIDT greater than 60 J/cm² at 1064 nm, 10 ns, and 100 Hz. Its precision surface quality, excellent flatness, and low scattering performance make it suitable for industrial laser processing, scientific research, and advanced photonics systems requiring reliable optical beam control.

PP-UVFS-25.4-6.35-LLM395 1064nm High Power Laser Mirror

Specifications

Substrate Material: UV Fused Silica
Diameter: 25.4 mm
Thickness: 6.35 mm
Wavelength Range: 1064 – 1064 nm
Angle Of Incidence (AOI): 45 – 45 deg
Surface Quality, S1 (scratch-dig): 10-5
Surface Quality, S2 (scratch-dig): Unspecified
Surface Flatness Over CA, S1 (@633 Nm Or Per Manufacturer): Lambda/10
Surface Flatness Over CA, S2 (@633 Nm Or Per Manufacturer): Unspecified
Parallelism: 0.17 arcmin
S1 Surface: Coated
S2 Surface: Uncoated
Reflectivity (HRa @ AOI, @ Peak Wavelength): 99.9 %
Manufacturer Part Number (MPN): PP-UVFS-25.4-6.35-LLM395
FindLight SKU: FL-24530

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Features

  • High reflectivity exceeding 99.9% at 1064 nm wavelength for efficient laser beam transmission and minimal energy loss.
  • UV fused silica substrate provides excellent thermal stability, low expansion characteristics, and superior optical performance.
  • Ion beam sputtered (IBS) high-reflectivity coating ensures coating durability and long-term reliability.
  • High laser-induced damage threshold (LIDT) supports demanding high-power pulsed laser applications.
  • Optimized for 45° angle of incidence beam reflection in precision laser systems.
  • Precision surface quality with excellent flatness and low scatter for accurate optical alignment.
  • Compact 25.4 mm diameter design suitable for integration into various laser assemblies.

Applications

  • High-power Nd:YAG laser systems operating at the 1064 nm fundamental wavelength.
  • Industrial laser processing equipment including laser marking, engraving, welding, and cutting systems.
  • Medical laser platforms requiring stable and reliable beam steering optics.
  • Scientific research lasers and laboratory optical setups.
  • Laser beam delivery systems, optical cavities, and precision photonics assemblies.
  • Advanced manufacturing and high-energy laser applications requiring durable high-reflectivity mirrors.

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What wavelength is the OPTOMAN PP-UVFS-25.4-6.35-LLM395 designed for?
The OPTOMAN PP-UVFS-25.4-6.35-LLM395 is designed for 1064 nm laser applications, especially Nd:YAG laser systems operating at the fundamental wavelength.
What is the reflectivity of this high-power laser mirror?
The mirror provides greater than 99.9% reflectivity at 1064 nm with a 45° angle of incidence, ensuring efficient beam reflection.
What substrate material is used in this laser mirror?
The product uses UV fused silica as the optical substrate, offering excellent thermal stability and high optical quality.
Can this mirror handle high-power pulsed laser operation?
Yes. The PP-UVFS-25.4-6.35-LLM395 is designed for high-power pulsed laser environments and provides a high laser-induced damage threshold for demanding applications.
What are the typical applications of this OPTOMAN laser mirror?
This mirror is commonly used in industrial laser processing, Nd:YAG laser systems, medical lasers, research laboratories, and precision optical beam delivery systems.

Got more questions? Use the inquiry form to ask the supplier directly.

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