Description

The OPTOMAN PP-UVFS-25.4-6.35-LLM316 is a high-performance deep UV laser mirror designed for 213 nm laser systems, featuring an ion beam sputtered (IBS) high-reflectivity coating optimized for Nd:YAG fifth harmonic applications. Manufactured with UV fused silica (Corning 7980 0F) substrate material, this 25.4 mm diameter optical mirror delivers excellent reflectance, low absorption, and long-term stability in demanding ultraviolet environments.

With a high reflectivity of HRa >99% at 213 nm and a 45° angle of incidence, this deep UV dielectric mirror provides reliable beam steering and folding performance for precision laser applications. Its λ/10 surface flatness specification over a 15 mm area and MIL 10/5 surface quality support accurate beam control in advanced photonics systems.

The PP-UVFS-25.4-6.35-LLM316 is ideal for applications requiring stable UV optical performance, including deep UV micromachining, semiconductor processing, scientific research, and frequency-converted laser systems where optical losses and coating durability are critical factors.

PP-UVFS-25.4-6.35-LLM316 213nm Deep UV Laser Mirror

Specifications

Substrate Material: UV Fused Silica
Diameter: 25.4 mm
Thickness: 6.35 mm
Wavelength Range: 213 – 213 nm
Angle Of Incidence (AOI): 45 – 45 deg
Surface Quality, S1 (scratch-dig): 10-5
Surface Quality, S2 (scratch-dig): Inspection Polished
Surface Flatness Over CA, S1 (@633 Nm Or Per Manufacturer): Lambda/10
Surface Flatness Over CA, S2 (@633 Nm Or Per Manufacturer): Unspecified
Parallelism: 0.17 arcmin
S1 Surface: Coated
S2 Surface: Uncoated
Reflectivity (HRa @ AOI, @ Peak Wavelength): 99 %
Manufacturer Part Number (MPN): PP-UVFS-25.4-6.35-LLM316
FindLight SKU: FL-24528

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Features

  • High Reflectivity 213 nm IBS Coating: Provides greater than 99% average reflectance at 213 nm and 45° angle of incidence, enabling efficient deep-UV beam delivery with minimal optical loss.
  • Deep-UV Optimized Performance: Specifically designed for fifth-harmonic Nd:YAG laser systems operating at 213 nm, offering reliable reflection for short-wavelength laser applications.
  • UV Fused Silica Substrate: Uses high-quality UVFS material (Corning 7980 0F) for excellent ultraviolet transmission, thermal stability, and mechanical durability.
  • Precision Optical Surface Quality: Features MIL 10/5 scratch-dig surface quality, <λ/10 flatness over a 15 mm area, and 10 arcsec parallelism for accurate optical alignment.
  • Low Absorption IBS Dielectric Coating: Provides improved environmental stability, reduced optical losses, and long operational lifetime compared with conventional UV mirror technologies.
  • Compact 25.4 mm Diameter Design: Offers a practical aperture size with a 22 mm clear aperture for integration into advanced laser systems and optical assemblies.

Applications

  • 213 nm Nd:YAG Fifth Harmonic Laser Systems: Used for beam steering and folding in frequency-converted UV laser architectures requiring efficient deep-UV reflection.
  • Deep UV Micromachining: Supports precision material processing, ablation, and surface modification of polymers, thin films, and advanced materials.
  • Semiconductor Manufacturing and Research: Suitable for UV beam delivery systems used in microfabrication and advanced semiconductor process development.
  • Scientific Laser Research: Enables reliable optical routing in ultraviolet spectroscopy, photonics experiments, and laboratory laser systems.
  • Precision UV Beam Delivery Systems: Designed for applications requiring high reflectivity, stable pointing, and low-loss optical performance in DUV environments.

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What wavelength is the OPTOMAN PP-UVFS-25.4-6.35-LLM316 laser mirror designed for?
The PP-UVFS-25.4-6.35-LLM316 is designed for deep UV applications at 213 nm wavelength with a 45° angle of incidence, making it suitable for Nd:YAG fifth harmonic laser systems.
What coating technology is used on this deep UV laser mirror?
This mirror uses an ion beam sputtered (IBS) dielectric coating on the first surface, providing high reflectivity, low absorption, and enhanced durability for demanding UV laser applications.
What substrate material is used for this OPTOMAN mirror?
The mirror is manufactured from UV fused silica (UVFS), specifically Corning 7980 0F material, selected for its excellent ultraviolet optical performance and stability.
Can this mirror be used in high-power laser systems?
Yes. The IBS-coated design provides strong resistance to optical degradation and is engineered for reliable operation in high-power and high-repetition-rate deep UV laser environments.
What are the main applications of the PP-UVFS-25.4-6.35-LLM316?
This mirror is commonly used in deep UV micromachining, semiconductor processing, scientific laser systems, and optical beam steering applications requiring high reflectivity at 213 nm.

Got more questions? Use the inquiry form to ask the supplier directly.

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