Description

The OPTOMAN PP-UVFS-25.4-6.35-LLM290 is a premium deep-ultraviolet laser mirror engineered for demanding 193 nm ArF excimer laser systems. Manufactured from high-purity UV-grade fused silica (Corning 7980 0F) and coated using advanced Ion Beam Sputtering (IBS) technology, this mirror delivers greater than 98% reflectivity at a 45° angle of incidence while maintaining exceptional coating durability, low optical absorption, and outstanding long-term stability.

Designed for precision beam steering and beam folding, the mirror features λ/10 surface flatness, superior 10-5 scratch-dig surface quality, and a 22 mm clear aperture for excellent wavefront preservation in high-performance optical systems. Its robust IBS coating resists aging and optical degradation, making it an excellent choice for semiconductor manufacturing, DUV lithography, mask inspection, and scientific laser instrumentation requiring reliable operation under continuous UV exposure.

PP-UVFS-25.4-6.35-LLM290 193 nm Deep-UV Laser Mirror

Specifications

Substrate Material: UV Fused Silica
Diameter: 25.4 mm
Thickness: 6.35 mm
Wavelength Range: 193 – 193 nm
Angle Of Incidence (AOI): 45 – 45 deg
Surface Quality, S1 (scratch-dig): 10-5
Surface Quality, S2 (scratch-dig): Inspection Polished
Surface Flatness Over CA, S1 (@633 Nm Or Per Manufacturer): Lambda/10
Surface Flatness Over CA, S2 (@633 Nm Or Per Manufacturer): Unspecified
Parallelism: 0.17 arcmin
S1 Surface: Coated
S2 Surface: Uncoated
Reflectivity (HRa @ AOI, @ Peak Wavelength): 99.8 %
Manufacturer Part Number (MPN): PP-UVFS-25.4-6.35-LLM290
FindLight SKU: FL-24535

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Features

  • Manufacturer Part Number: PP-UVFS-25.4-6.35-LLM290
  • Optimized for 193 nm ArF DUV excimer lasers
  • High reflectivity >98% at 193 nm, 45° angle of incidence
  • Premium UV-grade fused silica (Corning 7980 0F) substrate
  • Advanced Ion Beam Sputtering (IBS) dielectric coating for superior durability
  • Excellent λ/10 surface flatness over any 15 mm diameter at 633 nm
  • High optical quality with 10-5 scratch-dig polished optical surface
  • 25.4 mm diameter with 6.35 mm thickness for easy integration
  • 22 mm clear aperture for efficient beam transmission
  • Low absorption, excellent environmental stability, and long coating lifetime

Applications

  • ArF excimer laser beam steering
  • Deep-UV optical beam folding systems
  • Semiconductor photolithography
  • Photomask writing equipment
  • Wafer inspection systems
  • High-resolution microfabrication
  • Precision laser processing
  • Scientific ultraviolet optical instruments
  • Research laboratories utilizing DUV laser systems
  • Industrial UV laser integration platforms

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What wavelength is the PP-UVFS-25.4-6.35-LLM290 designed for?
This mirror is specifically optimized for operation at 193 nm DUV, making it ideal for ArF excimer laser systems requiring efficient deep-UV beam reflection.
Why is Ion Beam Sputtering (IBS) coating beneficial?
IBS coatings provide dense, highly durable dielectric layers with low absorption, excellent environmental resistance, minimal aging, and stable reflectivity over extended operating periods, making them particularly suitable for demanding DUV applications.
What optical quality does this mirror provide?
The mirror features λ/10 surface flatness, 10-5 scratch-dig surface quality, 10 arcsecond parallelism, and a 22 mm clear aperture to preserve beam quality in precision optical systems.
Which applications commonly use this laser mirror?
It is widely used in semiconductor lithography, mask writing, wafer inspection, precision beam delivery, excimer laser systems, and other ultraviolet optical instruments requiring stable high-reflectivity performance.
Can this DUV mirror operate under continuous industrial laser exposure?
Yes. Its UV fused silica substrate combined with a robust IBS dielectric coating is designed for long-term operation in demanding industrial and scientific environments, offering excellent resistance to coating degradation, low optical losses, and reliable performance under continuous deep-UV laser illumination.

Got more questions? Use the inquiry form to ask the supplier directly.

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