Description
The OPTOMAN PP-UVFS-25.4-3.1-MW102 is a premium multiwavelength laser mirror designed for high-performance laser systems operating at 1064 nm, 532 nm, and 635–650 nm. Manufactured on a precision UV fused silica substrate (JGS1) and coated using advanced Ion Beam Sputtering (IBS) technology, this mirror delivers outstanding reflectivity, low optical losses, and excellent environmental stability.
Optimized for a 45° angle of incidence, the mirror provides exceptionally high reflectance for the fundamental and second harmonic wavelengths of Nd:YAG lasers while also offering controlled reflection in the visible red spectrum. Its precision-polished optical surface, high-quality substrate, and durable IBS coating make it an excellent choice for demanding industrial, scientific, biomedical, and research laser applications requiring reliable multi-line beam steering and long-term performance.
PP-UVFS-25.4-3.1-MW102 Multiwavelength Laser Mirror
Specifications
| Substrate Material: | UV Fused Silica |
|---|---|
| Diameter: | 25.4 mm |
| Thickness: | 3.1 mm |
| Wavelength Range: | 1064 – 1064 nm |
| Angle Of Incidence (AOI): | 45 – 45 deg |
| Surface Quality, S1 (scratch-dig): | 20-10 |
| Surface Quality, S2 (scratch-dig): | Inspection Polished |
| Surface Flatness Over CA, S1 (@633 Nm Or Per Manufacturer): | Other |
| Surface Flatness Over CA, S2 (@633 Nm Or Per Manufacturer): | Other |
| Parallelism: | 5 arcmin |
| S1 Surface: | Coated |
| S2 Surface: | Uncoated |
| Reflectivity (HRs @ AOI, @ Peak Wavelength): | 99.9 % |
| Reflectivity (HRp @ AOI, @ Peak Wavelength): | 99.3 % |
| Manufacturer Part Number (MPN): | PP-UVFS-25.4-3.1-MW102 |
| FindLight SKU: | FL-24544 |
Got questions about specs? Use the inquiry form to ask.
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Features
- Manufacturer Part Number: PP-UVFS-25.4-3.1-MW102
- Multiwavelength coating optimized for 1064 nm, 532 nm, and 635–650 nm
- High reflectivity: HRs >99.9%, HRp >99.3% @1064 nm and HRs >99.8%, HRp >99.5% @532 nm
- Enhanced reflection in the visible red range: >92% @635–639 nm and >90% @640–650 nm
- Optimized for 45° angle of incidence
- Precision UV fused silica (JGS1) substrate for excellent thermal and optical stability
- Advanced Ion Beam Sputtering (IBS) coating for low absorption and exceptional durability
- 25.4 mm diameter with 3.1 mm thickness
- Surface quality: 20-10 scratch-dig
- Surface flatness better than λ @633 nm over 20 mm
- Suitable for high-power and precision laser systems
Applications
- Nd:YAG laser beam steering
- Second harmonic (532 nm) laser systems
- Multi-line laser beam delivery
- DPSS laser equipment
- Laser material processing
- Scientific optical experiments
- Biomedical laser instrumentation
- Precision metrology systems
- Optical alignment setups
- Industrial laser manufacturing equipment
Export & Trade Information
| ECCN: | EAR99 |
|---|---|
| HTS Code: | 9001.90.6000 |
| Estimated US Tariff: | 10% |
Frequently Asked Questions
What wavelengths is the PP-UVFS-25.4-3.1-MW102 designed for?
What coating technology is used?
Can this mirror be used with high-power lasers?
What angle of incidence is recommended?
Which applications benefit most from this mirror?
Got more questions? Use the inquiry form to ask the supplier directly.
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