Description

The OPTOMAN PP-UVFS-25.4-3.0-LLM371 is a premium Deep-UV laser mirror engineered for demanding 193.4 nm ArF excimer laser applications. Manufactured from high-quality UV-grade fused silica (Corning 7980 0F) and coated using advanced Ion Beam Sputtering (IBS) technology, this mirror delivers exceptionally stable reflectivity, minimal optical absorption, and outstanding long-term durability in ultraviolet laser systems.

Designed for operation at 42°–48° angle of incidence, the mirror provides greater than 97.5% reflectivity (typically exceeding 98%) at 193.4 nm while maintaining excellent wavefront quality with λ/8 surface flatness over the clear aperture. IBS coatings eliminate coating aging and provide superior environmental stability compared to conventional deposition methods, making this optic ideal for high-average-power and high-repetition-rate excimer laser applications.

With a precision-polished 25.4 mm diameter substrate, laser-engraved orientation markings, and strict optical tolerances, the PP-UVFS-25.4-3.0-LLM371 is an excellent choice for semiconductor manufacturing, scientific research, photolithography, spectroscopy, and other ultraviolet optical systems requiring reliable long-term performance.

PP-UVFS-25.4-3.0-LLM371 Deep-UV Laser Mirror for 193.4 nm ArF Lasers

Specifications

Substrate Material: UV Fused Silica
Diameter: 25.4 mm
Thickness: 3 mm
Wavelength Range: 193.4 – 193.4 nm
Angle Of Incidence (AOI): 42 – 48 deg
Surface Quality, S1 (scratch-dig): 20-10
Surface Quality, S2 (scratch-dig): Inspection Polished
Surface Flatness Over CA, S1 (@633 Nm Or Per Manufacturer): Lambda/8
Surface Flatness Over CA, S2 (@633 Nm Or Per Manufacturer): Unspecified
Parallelism: 1 arcmin
S1 Surface: Coated
S2 Surface: Uncoated
Reflectivity (HRa @ AOI, @ Peak Wavelength): 97.5 %
Manufacturer Part Number (MPN): PP-UVFS-25.4-3.0-LLM371
FindLight SKU: FL-24537

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Features

  • Manufacturer Part Number: PP-UVFS-25.4-3.0-LLM371
  • Optimized for 193.4 nm ArF excimer lasers
  • High-reflectivity IBS dielectric coating with R >97.5% (typically >98%)
  • Designed for 42°–48° angle of incidence
  • Premium UV-grade fused silica (Corning 7980 0F) substrate
  • 25.4 mm diameter with 3 mm thickness
  • λ/8 surface flatness at 633 nm over the clear aperture
  • 20-10 scratch-dig optical surface qualit
  •  Low absorption and excellent environmental stability
  • No coating aging for consistent optical performance over time
  • Suitable for high repetition rate and high average power UV laser systems
  • Laser-engraved orientation marking for simplified installation

Applications

  • ArF excimer laser beam steering
  • Deep-UV photolithography systems
  • Semiconductor wafer processing
  • Ultraviolet laser research laboratories
  • Precision spectroscopy instrumentation
  • Industrial UV laser machining
  • Scientific optical assemblies
  • High-energy laser beam delivery systems
  • UV metrology and inspection equipment
  • Custom OEM laser platforms

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What wavelength is the PP-UVFS-25.4-3.0-LLM371 designed for?
This mirror is optimized specifically for 193.4 nm, making it ideal for ArF excimer laser systems requiring efficient Deep-UV beam reflection.
Why are IBS coatings beneficial for Deep-UV laser mirrors?
Ion Beam Sputtering produces dense, durable dielectric coatings with very low absorption, excellent environmental resistance, and stable reflectivity that does not significantly degrade over time, resulting in longer service life and consistent optical performance.
What angle of incidence should be used?
The mirror is designed to achieve its specified optical performance when operated between 42° and 48° angle of incidence, providing optimized reflectivity for ArF laser applications.
Can this mirror be used in high-power ultraviolet laser systems?
Yes. Its IBS coating technology, low optical loss, and robust UV fused silica substrate make it well suited for high-average-power and high-repetition-rate ultraviolet laser applications where long-term stability is essential.
Which industries commonly use this laser mirror?
Typical applications include semiconductor manufacturing, photolithography, precision laser processing, spectroscopy, scientific instrumentation, and research laboratories utilizing 193 nm excimer laser technology.

Got more questions? Use the inquiry form to ask the supplier directly.

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