The OPTOMAN PP-UVFS-12.7-3.0-LLM290 is a premium deep-UV dielectric laser mirror engineered for demanding 193 nm ArF excimer laser applications. Manufactured on a high-quality Corning 7980 UV fused silica substrate, this precision optic features an advanced Ion Beam Sputtered (IBS) high-reflectivity coating that delivers outstanding optical stability, low absorption, and exceptional durability under prolonged deep-ultraviolet exposure.

Optimized for 45° angle of incidence, the mirror provides greater than 98% reflectivity at 193 nm, making it an excellent choice for beam steering, beam folding, and optical routing in semiconductor manufacturing, photolithography, mask writing, and scientific research systems. The dense IBS coating resists environmental degradation and coating aging, ensuring reliable long-term performance even in contamination-sensitive DUV environments.

With excellent surface flatness, tight manufacturing tolerances, and superior optical quality, the PP-UVFS-12.7-3.0-LLM290 is designed for engineers and researchers requiring stable, repeatable performance in high-precision ultraviolet laser systems.