Description

The OPTOMAN PP-UVFS-12.7-3.0-LLM226 is a precision laser mirror engineered for high-performance laser systems operating at 2940 nm. Manufactured on a UV-grade fused silica (UVFS) substrate, this mirror delivers greater than 99.8% reflectivity at normal incidence (0° AOI), making it an excellent choice for Er:YAG laser applications and other mid-infrared optical systems requiring minimal optical loss.

Designed with premium optical quality, the mirror features a 12.7 mm diameter, 3 mm thickness, and surface flatness better than λ/5 over an 8 mm area, helping maintain beam quality and stable optical performance. Its durable dielectric coating provides reliable long-term operation in demanding laboratory, industrial, and medical laser environments. Combining excellent reflectivity, precision manufacturing, and compact dimensions, the PP-UVFS-12.7-3.0-LLM226 is an ideal optical component for high-efficiency laser beam steering and cavity applications

PP-UVFS-12.7-3.0-LLM226 2940 nm High-Reflectivity Laser Mirror

Specifications

Substrate Material: UV Fused Silica
Diameter: 12.7 mm
Thickness: 3 mm
Wavelength Range: 2940 – 2940 nm
Angle Of Incidence (AOI): 0 – 0 deg
Surface Quality, S1 (scratch-dig): 20-10
Surface Quality, S2 (scratch-dig): Inspection Polished
Surface Flatness Over CA, S1 (@633 Nm Or Per Manufacturer): Other
Surface Flatness Over CA, S2 (@633 Nm Or Per Manufacturer): Unspecified
Parallelism: 0.17 arcmin
S1 Surface: Coated
S2 Surface: Uncoated
Reflectivity (HRa @ AOI, @ Peak Wavelength): 99.8 %
Manufacturer Part Number (MPN): PP-UVFS-12.7-3.0-LLM226
FindLight SKU: FL-24534

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Features

  • Manufacturer Part Number: PP-UVFS-12.7-3.0-LLM226
  • High-reflectivity dielectric coating with HR >99.8% at 2940 nm
  • Designed for 0° angle of incidence (normal incidence)
  • UV-grade fused silica (UVFS) substrate for excellent optical stability
  • 12.7 mm diameter with 3.0 mm thickness for compact optical assemblies
  • Surface flatness better than λ/5 over an 8 mm optical area
  • Precision optical polishing suitable for demanding laser systems
  • Low optical losses for improved laser efficiency
  • Ideal for Er:YAG and other mid-infrared laser applications

Applications

  • Er:YAG laser systems operating at 2940 nm
  • Medical and dental laser equipment
  • Mid-infrared laser beam delivery systems
  • Laser resonators and optical cavities
  • Beam steering and beam folding assemblies
  • Scientific spectroscopy instrumentation
  • Research laboratories and photonics development
  • Industrial laser processing systems

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.6000
Estimated US Tariff: 10%

Importing, tariffs & codes (Quick Guide) →

Frequently Asked Questions

What wavelength is the PP-UVFS-12.7-3.0-LLM226 optimized for?
This mirror is optimized for laser systems operating at 2940 nm, providing reflectivity greater than 99.8% at that wavelength for maximum optical efficiency.
What angle of incidence is this mirror designed for?
The dielectric coating is optimized for 0° angle of incidence (normal incidence), making it suitable for optical paths where the laser beam strikes the mirror perpendicularly.
What substrate material is used?
The mirror is manufactured from UV-grade fused silica (UVFS), a material known for its excellent optical transmission, dimensional stability, and suitability for precision laser optics.
Which laser systems commonly use this mirror?
The mirror is particularly well suited for Er:YAG laser systems, medical and dental lasers, spectroscopy instruments, and other mid-infrared laser applications operating near 2940 nm.
Why is high reflectivity important for laser mirrors?
A reflectivity above 99.8% minimizes optical losses, preserves laser power, improves overall system efficiency, and helps maintain stable beam performance in high-precision optical systems.

Got more questions? Use the inquiry form to ask the supplier directly.

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