CCD Beam Profiler UV Monitor
Description
UV laser beam profiler has a proven track record in industrial applications, and can be used for excimer lasers for processing laser materials in the semiconductor and display industries, and for the 3rd, 4th, and 5th harmonics of Nd: YAG lasers. The basic system of the product consists of a camera based on a detector for UV and advanced Beamlux II software. Depending on the active area, it is possible to measure beam diameters from 10um to 100mm.
CCD Beam Profiler UV Monitor
Specifications |
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|---|---|
| Sensor Type: | CCD |
| Measurable Sources: | CW |
| Wavelength Range: | 193-1100nm |
| # Pixels (Width): | -- |
| # Pixels (Height): | -- |
| Pixel Size (Width): | -- um |
| Pixel Size (Height): | -- um |
| Max Full Frame Rate: | -- Hz |
| ADC: | Other |
Features
- Optics
- Resonator adjustment time reduction
- User-friendly machining monitoring support
- Online analysis, automatic documentation
- Reliable connection, data transfer to database
- Beamlux for beam profile analysis compliant with EN-ISO standards
For pricing, technical or any other questions please contact the supplier
- No registration required
- No markups, no fees
- Direct contact with supplier
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How to order?
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Ships from:
Japan
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Sold by:
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On FindLight:
External Vendor
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Frequently Asked Questions
The UV laser beam profiler is used for processing laser materials in the semiconductor and display industries, as well as for the 3rd, 4th, and 5th harmonics of Nd: YAG lasers.
The basic system of the product consists of a camera based on a detector for UV and advanced Beamlux II software.
Depending on the active area, it is possible to measure beam diameters from 10um to 100mm.
The features include optics, resonator adjustment time reduction, user-friendly machining monitoring support, online analysis, automatic documentation, reliable connection, data transfer to database, and Beamlux for beam profile analysis compliant with EN-ISO standards.
The beam profiler can measure beam size, divergence angle, near-field, far-field, beam stability, power, caustic, and uniformity.