The PP-UVFS-12.7-6.35-LLM105 from OPTOMAN is a 355 nm UV laser mirror engineered for high-reflectivity beam steering in ultraviolet laser systems. Built on a 12.7 mm diameter UV fused silica substrate with 6.35 mm thickness, this dielectric mirror is optimized for use at 32° to 45° angle of incidence and delivers s-polarized reflectivity above 99.7% at 355 nm. Its IBS coating design supports stable performance in demanding UV beam paths where coating durability, low absorption, and repeatable optical behavior are critical.

Designed for integration into third-harmonic Nd and UV industrial laser platforms, the mirror offers the optical quality needed for beam delivery, deflection, and routing in precision ultraviolet processing systems. The UV fused silica substrate provides excellent transmission characteristics, strong resistance to thermal effects, and good compatibility with high-energy UV applications, while the specified surface quality, flatness, and clear aperture make the optic suitable for both OEM laser integration and laboratory setups.

With a measured laser-induced damage threshold above 7 J/cm² at 355 nm (6 ns, 100 Hz), the PP-UVFS-12.7-6.35-LLM105 is well suited for users seeking a UV dielectric laser mirror for 355 nm beam steering, especially in systems where long-term coating reliability and consistent reflection performance are important.