Transmission Gratings for 800 nm

Specifications

Substrate Material: Fused Silica
Dimension (Length): 137 mm
Dimension (Height): 56 mm
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Features


  • High Diffraction Efficiency: Up to 97.5% at 800 nm with AR coating.

  • Optimized for Pulse Compression: Designed for ultrafast laser systems requiring precision.

  • Wide Line Density Range: From 1200.5 to 1841.6 lines/mm for versatile AOI tuning.

  • Premium Fused Silica: Manufactured with Heraeus Suprasil 3002 (<1 ppm OH content).

  • Excellent Angular Dispersion: Precise wavelength separation for advanced optics.

  • Customizable Formats: Available in multiple substrate sizes and thicknesses.

  • Engineered in Germany: Precision optics with world-renowned quality.

Applications


  • Ultrafast Laser Pulse Compression: Ideal for managing high-power femtosecond pulses.

  • Spectroscopy: Enables accurate wavelength dispersion for sensitive measurements.

  • Photonics Research: Supports cutting-edge optical experiments and laboratory setups.

  • Industrial Photonics: Reliable performance in advanced laser processing systems.

  • Scientific Instrumentation: Integration into precision optical devices and measurement tools.