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Description

Zero-Order Air-Spaced Half-Wave Plate, 1030 nm – 25.4 mm Mounted (HWP-AS-ZO-1030-25.4)

The HWP-AS-ZO-1030-25.4 zero-order air-spaced half-wave plate is engineered for precise polarization control at a design wavelength of 1030 nm, making it an excellent choice for modern femtosecond and high-repetition-rate solid-state laser systems. Utilizing a crystalline quartz construction with an air-spaced zero-order design, this waveplate delivers a highly stable λ/2 retardance with minimal sensitivity to temperature and wavelength shifts. Its robust optical performance and mechanical stability make it ideal for demanding research and industrial environments where reliable polarization rotation and power handling are critical.

Unlike higher-order or cemented waveplates, the air-spaced zero-order configuration provides a near-ideal half-wave retardation (λ/2 ± λ/300 at 20 °C) while greatly reducing thermal drift and chromatic effects. This ensures that the state of polarization remains consistent even under fluctuating ambient conditions or slight deviations from the nominal wavelength. With a transmitted wavefront distortion of <λ/10 at 633 nm and surface quality of 20-10 scratch-dig, the optic preserves beam quality, making it suitable for tight focusing, interferometric setups, and precision metrology where beam distortion must be minimized.

Designed around a 25.4 mm black anodized metal mount with a clear aperture >18 mm, the waveplate integrates easily into standard 1-inch opto-mechanical holders and rotation mounts. The mount is clearly engraved with “λ/2 @ 1030 nm” and includes fast-axis dash marks for quick and repeatable alignment. The low beam deviation (<10 arcsec) supports applications that require accurate beam pointing and stable alignment over long optical paths, such as in multi-stage amplification systems and beam delivery lines.

An advanced broadband AR coating optimized for 1030 nm (residual reflectance <0.2% at normal incidence per surface) maximizes transmission and minimizes back-reflections that can cause interference fringes or feedback into sensitive laser cavities. Combined with an estimated laser-induced damage threshold >0.86 J/cm² at 1030 nm for 200 ns pulses at 300 kHz, this component is well suited for high-average-power and high-repetition-rate laser operation. Its performance characteristics align with the requirements of leading femtosecond laser platforms at 1030 nm, making it a strong fit for beam steering, polarization-based power control, pulse picking schemes, and polarization-sensitive imaging or micromachining systems.

In laboratory and industrial settings alike, this zero-order air-spaced half-wave plate enables precise rotation of linearly polarized light without degrading its degree of polarization. When mounted in a rotation stage, rotating the plate allows continuous and reproducible control of the polarization azimuth, which is critical for optimizing nonlinear conversion efficiency, controlling the response of polarization-dependent optics, or tuning the effective output power of polarization-sensitive attenuators. Its combination of high optical quality, rugged mechanical design, and compatibility with state-of-the-art 1030 nm femtosecond laser systems makes the HWP-AS-ZO-1030-25.4 a reliable and versatile choice for advanced photonics setups.

Zero Order Air Spaced Quartz Half Waveplate 1030 nm HWP-AS-ZO-1030-25.4

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Specifications

Waveplate Type (Retardation Order): Zero Order
Material: Crystalline Quartz
Mounting: Mounted
Shape: Round
Size (Largest Dimension): 18 mm
Design Wavelength: 1030 nm
Surface Quality (Scratch-Dig): 20-10
Retardation: Lambda/2
Retardation Tolerance: +/- Lambda/300
Transmitted Wavefront Distortion (TWD): <= Lambda/10
Material: Crystalline Quartz
Clear Aperture: >18 mm
Surface Quality: 20-10 S-D
Transmitted Wavefront Distortion: <λ/10 @ 633 nm
Design Wavelength: 1030 nm
Retardation Order: Zero Order
Retardation And Tolerance: λ/2 ± λ/300 @ 20 °C
Beam Deviation: <10 arcsec
Mount Diameter: 25.4 mm (+0 / -0.1 mm)
Mount Thickness: 6 mm ± 0.2 mm
Mount Material/finish: Black anodized metal
Engraving: λ/2 @ 1030 nm and dash marks fast axis
AR Coating: R < 0.2% @ 1030 nm, AOI = 0°, per surface
LIDT (estimated): >0.86 J/cm² @ 1030 nm, 200 ns, 300 kHz
Manufacturer Part Number (MPN): HWP-AS-ZO-1030-25.4
FindLight SKU: FL-24561

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Features

  • Zero-Order Air-Spaced Half-Wave Plate for 1030 nm – Precision-engineered crystalline quartz waveplate delivering true zero-order retardation (λ/2 ± λ/300 @ 20 °C) specifically optimized for 1030 nm femtosecond laser applications.
  • Ultra-Stable Retardance with Low Temperature Sensitivity – Air-spaced, zero-order design minimizes thermal and wavelength dependence, ensuring stable polarization rotation even under varying environmental conditions and extended operation.
  • High Laser Damage Threshold for Femtosecond Systems – Estimated LIDT > 0.86 J/cm² at 1030 nm, 200 ns, 300 kHz supports demanding high-average-power and ultrafast laser setups while reducing risk of coating or substrate damage.
  • Optimized for Leading 1030 nm Femtosecond Lasers – Ideal polarization control for systems such as Light Conversion PHAROS/CARBIDE, Coherent Monaco, Lumentum FemtoBlade™, TRUMPF TruMicro, Spectra-Physics IceFyre® FS, Amplitude Satsuma/Tangor, EKSPLA FemtoLux, Thorlabs FSL1030X2, and Fluence Jasper X1.
  • High-Precision Polarization Rotation – Introduces an accurate half-wave retardation between orthogonal polarization axes, enabling smooth and repeatable rotation of linearly polarized light to any desired angle without changing its degree of polarization.
  • Low Loss AR Coating at 1030 nm – Dual-side antireflection coating with residual reflectance R < 0.2% at 1030 nm (AOI = 0° per surface) for maximum transmission, reduced ghost reflections, and improved signal-to-noise ratio in sensitive setups.
  • Excellent Surface Quality and Wavefront Integrity – High-grade optical surfaces (20-10 scratch-dig, transmitted wavefront distortion < λ/10 @ 633 nm) preserve beam quality, focusability, and mode profile in high-performance laser systems.
  • Large Clear Aperture for Versatile Beam Sizes – Clear aperture > 18 mm supports larger beam diameters and Gaussian beam waists typical of industrial and scientific femtosecond laser configurations.
  • Accurate Beam Pointing with Minimal Deviation – Beam deviation < 10 arcsec minimizes angular misalignment and walk-off, helping maintain optical axis stability in complex multi-element beamlines and polarization-sensitive instruments.
  • Standard 1" Mounted Package – Robust 25.4 mm (+0/-0.1 mm) black anodized metal mount with 6 mm (±0.2 mm) thickness fits common opto-mechanical mounts and rotation stages for straightforward integration into optical tables and laser systems.
  • Clear Engraving and Fast-Axis Marking – Mount is engraved with λ/2 @ 1030 nm and dash marks indicating the fast axis, enabling quick, unambiguous orientation and repeatable polarization settings during alignment.
  • Ideal for High-Power Polarization Control Applications – Perfect for polarization rotation in high-power femtosecond lasers, optical isolators, harmonic generation stages, pump-probe experiments, and polarization-sensitive measurement setups.
  • Low Dispersion, Crystalline Quartz Construction – High-purity crystalline quartz provides stable birefringence, low dispersion, and exceptional durability compared to polymer or multi-order waveplates, supporting long-term, high-precision operation.
  • Consistent Performance Across Similar Product Family – Part of a matched series of zero-order, air-spaced waveplates (HWP and QWP at 515 nm and 1030 nm), enabling consistent polarization control strategies across multiple wavelengths in a single system.

Applications

  • High‑Power Femtosecond Laser Polarization Control at 1030 nm
    Ideal for precise rotation of linear polarization in femtosecond amplifier and oscillator stages operating around 1030 nm (e.g., Yb:YAG, Yb:KGW, Yb:KYW systems). The zero‑order, air‑spaced design and high LIDT make this waveplate well suited for beam conditioning, pulse picking, and power control in industrial and scientific ultrafast laser platforms.
  • Power Stabilization and Attenuation Using Polarizer–Waveplate Combinations
    Commonly used with thin‑film polarizers or Glan‑type polarizers to build continuously variable attenuators for 1030 nm. By rotating the half‑wave plate, users can finely adjust transmitted power without changing beam quality, making it ideal for process optimization in micromachining, surface texturing, and material processing lines.
  • Polarization Optimization in Femtosecond Micromachining Workstations
    Suitable for tuning polarization at the workpiece to optimize ablation efficiency, feature quality, and edge sharpness when machining metals, glass, polymers, and ceramics with 1030 nm femtosecond lasers. Polarization control is critical in producing high‑aspect‑ratio micro‑holes, precision cuts, and burr‑free edges.
  • Beam Steering and Polarization‑Based Beam Routing
    Enables polarization‑controlled beam switching in setups that use polarization beam splitters (PBS). Rotating the half‑wave plate before a PBS allows distribution of power between multiple beam paths, supporting flexible routing in multi‑station or multi‑head laser processing systems.
  • Optical Isolators and Faraday Rotator Stages at 1030 nm
    Used as the polarization control element in custom optical isolators for ytterbium‑based femtosecond lasers. The low beam deviation (<10 arcsec) and tight retardance tolerance (λ/2 ± λ/300) help maintain high isolation ratios, protect seed oscillators, and prevent feedback into high‑gain amplifier chains.
  • Polarization‑Sensitive Nonlinear Optics and Frequency Conversion
    Beneficial for setting and maintaining the correct polarization state for second‑harmonic generation (SHG to 515 nm), third‑harmonic generation, and OPA/OPCPA stages pumped at 1030 nm. Proper polarization alignment maximizes conversion efficiency in nonlinear crystals such as LBO, BBO, and KTP.
  • Ultrafast Pump–Probe and Time‑Resolved Spectroscopy
    Enables precise polarization control between pump and probe beams at 1030 nm for studies of anisotropy, carrier dynamics, and ultrafast energy transfer in solids, liquids, and nanostructures. The zero‑order construction ensures minimal phase drift with temperature or wavelength fluctuations, improving measurement stability.
  • Polarization‑Resolved Imaging and Microscopy at 1030 nm
    Useful for advanced multiphoton, SHG, and polarization‑sensitive imaging where incident polarization must be rotated without degrading pulse duration or beam quality. Compatible with high‑NA objectives and long optical paths in microscopes operating with 1030 nm femtosecond excitation.
  • Fiber‑Laser Beam Conditioning and Polarization Matching
    Designed for matching polarization between free‑space sections and polarization‑maintaining (PM) fiber components in 1030 nm fiber laser systems. The low wavefront distortion (<λ/10 at 633 nm) and low AR reflectance (R<0.2% at 1030 nm) support stable coupling efficiency and low back‑reflection.
  • Polarization Control in Ultrafast Amplifier and CPA Chains
    Suitable for chirped‑pulse‑amplification (CPA) systems where polarization must be preserved and precisely rotated between stretcher, amplifier, and compressor stages. The air‑spaced zero‑order design is less sensitive to heating and spectral drift, which is critical for high‑average‑power femtosecond sources.
  • High‑Power Polarization Management in Industrial 1030 nm Platforms
    Applicable to high‑repetition‑rate, high‑average‑power industrial lasers used in display manufacturing, battery processing, photovoltaic scribing, and semiconductor fabrication. The estimated LIDT (>0.86 J/cm², 200 ns, 300 kHz at 1030 nm) and durable metal mount support 24/7 operation in demanding environments.
  • Polarization‑Based Contrast Control in Ultrafast Interferometry
    Enables fine tuning of interference contrast and visibility by rotating the polarization state in one arm of a Mach–Zehnder, Michelson, or common‑path interferometer. Stable retardance supports sensitive phase and amplitude measurements at 1030 nm.

Export & Trade Information

ECCN: EAR99
HTS Code: 9001.90.9000
Estimated US Tariff: 10%

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Frequently Asked Questions

What is the HWP-AS-ZO-1030-25.4 zero-order air-spaced half-wave plate and what is it used for?
The HWP-AS-ZO-1030-25.4 is a zero‑order, air‑spaced half‑wave plate made from crystalline quartz and mounted in a 25.4 mm (1 inch) black anodized metal mount. It is designed for a center wavelength of 1030 nm and introduces a λ/2 phase delay between orthogonal polarization axes, allowing you to rotate the polarization direction of linearly polarized light without changing its degree of polarization. Thanks to its low wavelength and temperature sensitivity, high surface quality (20-10 scratch-dig), and high laser damage threshold, it is ideal for polarization control in high‑power femtosecond laser systems, optical isolators, beam steering setups, and polarization‑sensitive measurements.
How does a zero-order air-spaced half-wave plate at 1030 nm differ from multi-order or cemented waveplates?
A zero‑order air‑spaced wave plate consists of two thin quartz plates with their optical axes crossed and separated by an air gap so that the net retardation is a single half‑wave (λ/2) at the design wavelength, in this case 1030 nm. Compared to multi‑order waveplates, which achieve λ/2 retardation by stacking many full waves plus a half‑wave, zero‑order plates exhibit much lower sensitivity to wavelength and temperature changes—crucial for broadband pulses and thermally varying environments. Compared to cemented (optically contacted) zero‑order plates, an air‑spaced design avoids organic cements that can limit laser damage threshold, making this type far more suitable for high‑average‑power and high‑repetition‑rate femtosecond lasers. This matches the design approach used by leading optics manufacturers for demanding ultrafast applications.
Is this 1030 nm half-wave plate compatible with common femtosecond laser systems like PHAROS, CARBIDE, Monaco, and TruMicro?
Yes. The HWP-AS-ZO-1030-25.4 is specifically optimized for 1030 nm and is intended for use with modern high‑performance femtosecond lasers that operate at or near this wavelength. Typical compatible systems include PHAROS and CARBIDE (Light Conversion), Monaco (Coherent), FemtoBlade (Lumentum), TruMicro (TRUMPF), IceFyre FS (Spectra‑Physics), Satsuma and Tangor (Amplitude), FemtoLux (EKSPLA), FSL1030X2 (Thorlabs), Jasper X1 (Fluence), and similar 1030 nm sources from Photonics Industries and other OEMs. As with any waveplate, you should confirm that the beam size fits within the >18 mm clear aperture and that the laser fluence stays below the specified damage threshold.
What laser damage threshold and AR coating performance does this 1030 nm waveplate offer for high-power applications?
This zero‑order air‑spaced half‑wave plate has an estimated laser‑induced damage threshold (LIDT) of >0.86 J/cm² at 1030 nm for 200 ns pulses at 300 kHz repetition rate, which is tailored to the high average powers and pulse trains typical in industrial femtosecond systems. The anti‑reflection (AR) coating is optimized for normal incidence at 1030 nm with residual reflectance R < 0.2% per surface, minimizing Fresnel losses and back‑reflections. For ultrafast or non‑standard operating conditions (e.g., different pulse duration, spot size, or repetition rate), you should recalculate the fluence on the optic and compare it conservatively to the given LIDT or contact the manufacturer for application‑specific guidance.
How do I orient and mount the HWP-AS-ZO-1030-25.4 half-wave plate to rotate linear polarization?
The waveplate is supplied in a 25.4 mm diameter, 6 mm thick anodized mount that fits standard 1‑inch optic holders and rotation mounts. The mount is engraved with “λ/2 @ 1030 nm” and has dash marks indicating the fast axis direction. To rotate linear polarization, place the waveplate at normal incidence in the beam, align the mount so that the marks are clearly visible, and then rotate the plate so that the angle between the input polarization direction and the fast axis equals half of the desired polarization rotation. For example, to rotate the polarization by 90°, set the fast axis at 45° to the incoming polarization. A graduated rotation mount improves reproducibility and allows fine tuning in polarization‑sensitive setups.
Can I use this 1030 nm half-wave plate at other wavelengths, such as 515 nm, and what happens to the retardance?
The HWP-AS-ZO-1030-25.4 is designed as a λ/2 retarder at 1030 nm with retardation tolerance λ/2 ± λ/300 at 20 °C. At significantly different wavelengths (e.g., 515 nm) the effective retardance will deviate from exactly half‑wave because the birefringence and optical path difference scale with wavelength. While it may still function as a polarization element over a small spectral range around 1030 nm, using it at 515 nm is not recommended when precise polarization control is required. For 515 nm applications, you should choose a dedicated 515 nm half‑wave plate (e.g., HWP‑AS‑ZO‑515‑25.4) that is AR‑coated and toleranced for that wavelength.
What are the key specifications (clear aperture, surface quality, beam deviation) that affect beam quality in this waveplate?
This waveplate is engineered to preserve high beam quality typical of femtosecond and industrial laser sources. It provides a clear aperture of >18 mm, allowing comfortable passage of common focused or collimated beams while minimizing clipping. The surface quality is specified as 20‑10 scratch‑dig, which reduces scattering and ghosting, and the transmitted wavefront distortion is < λ/10 at 633 nm, ensuring minimal wavefront degradation. Beam deviation is kept below 10 arcseconds, so the exit beam remains well aligned with the incident direction. These specifications are in line with high‑end zero‑order waveplates offered elsewhere on the market for precision polarization and beam‑delivery systems.

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