Description

UM Optics specializes in high-purity Lithium Fluoride (LiF) crystals, premium optical materials engineered for exceptional performance across ultraviolet (UV), deep ultraviolet (DUV), and extreme ultraviolet (EUV) spectral ranges (105 nm–8 μm).

Our LiF crystals are grown via advanced Bridgman-Stockbarger method, ensuring ultra-high purity, minimal internal defects (low inclusion and bubble density), and superior optical homogeneity. A key advantage of our LiF crystals is the availability of multiple grade options tailored to specific spectral requirements: UV grade, DUV grade, and EUV grade. We offer both standard and custom-sized LiF crystal blanks, lens, and windows, with flexible dimensions. 

As a professional optical manufacturer, we guarantee consistent quality, strict tolerance control, and competitive pricing, catering to high-precision applications in semiconductor lithography, scientific research, and aerospace/defense sectors.

Factory Supply Optical LiF Lithium Fluoride Crystal

Specifications

Type Of Crystal: Lithium Fluoride (LiF)
Crystal Diameter Range: 3 – 180 mm
Crystal Length Range: 3 – 180 mm
Wavelength Range: 110 – 7000 nm
Material: Lithium fluoride(LiF)
Material Grade: UV, Deep UV, Extreme UV
Available Sizes: φ180mm
Wavelength Range: 110nm-7μm
Crystal Structure: Monocrystalline, Polycrystalline
Orientation: <111>, <100>
Blank Shape: Round, rectangular, wedge, lens, step, drilled, special-shaped

Got questions about specs? Use the inquiry form to ask.

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Features

  • Broad UV-EUV Spectral Coverage: Unmatched transmittance in EUV (down to 105 nm), DUV (105–200 nm), and UV (200–400 nm) ranges, with extended transmittance up to 8 μm in the mid-infrared, making it one of the few materials suitable for EUV applications
  • Multi-Grade Customization: Available in UV grade (optimized for 200–400 nm), DUV grade (105–200 nm), and EUV grade (105–120 nm) to match diverse high-precision application needs, all with ultra-high purity 
  • Low Optical Absorption & Scatter: Strict control over crystal growth parameters minimizes impurity content and internal defects, ensuring low absorption and scatter in UV-DUV-EUV bands—critical for high-power and high-precision optical systems
  • Excellent Thermal & Mechanical Stability: Low thermal expansion coefficient (12.1×10⁻⁶/°C) and high melting point (845°C), resisting thermal shock and deformation in extreme temperature environments
  • Flexible Custom Solutions: Support custom crystal orientation (e.g., [100], [111]), size, shape . Flexible production batches from prototypes to mass production
  • Chemical Inertness: Non-hygroscopic (no moisture absorption) and resistant to most acids (except strong alkalis), ensuring long-term stability in laboratory, industrial, and space environments

Applications

  • Semiconductor Lithography: EUV grade LiF crystals are critical for EUV lithography tools (13.5 nm) used in advanced microchip manufacturing; DUV grade options are applied in DUV lithography systems (193 nm, 248 nm) as optical components
  • UV-DUV-EUV Optics Fabrication: Core raw material for manufacturing LiF windows, lenses, prisms, and beamsplitters used in UV-DUV-EUV optical systems
  • Scientific Research: Applied in synchrotron radiation experiments, EUV spectroscopy, high-energy physics detectors, and fusion research requiring ultra-pure optical materials for short-wavelength light manipulation
  • Aerospace & Defense: Used in space-based EUV telescopes, solar physics instruments, and missile guidance systems—withstanding extreme vacuum, temperature, and radiation conditions while maintaining EUV transmittance
  • High-Power UV Lasers: UV-DUV grade LiF crystals serve as optical components in high-power UV laser systems (e.g., excimer lasers) due to their low absorption and high laser damage threshold

Frequently Asked Questions

Why is LiF the preferred material for EUV applications compared to other fluoride crystals (e.g., CaF₂, MgF₂)?
Unlike CaF₂ (minimum transmittance ~130 nm) and MgF₂ (~150 nm), LiF exhibits transmittance down to 105 nm, covering the critical EUV band (10–124 nm) used in advanced lithography. Additionally, LiF has lower EUV absorption and better radiation resistance, making it the only practical fluoride crystal for high-precision EUV systems.
Can you provide EUV grade LiF crystal slices with custom orientation (e.g., [100])?
Yes, we support custom crystal orientation for all grades of LiF crystals.
Why is lithium fluoride monocrystalline material more expensive than polycrystalline? What is the main difference?
Monocrystalline lithium fluoride has no obvious grain boundary. It has higher production cost, better consistency and uniformity, and is suitable for EUV/DUV lithography, high-power UV laser products, precision spectroscopy, aerospace optics, etc. Polycrystalline lithium fluoride crystals are mainly used in general UV protective windows, uncoated products, gas analysis sensors, thermal imaging or products with no requirement for high-precision optical performance.

Got more questions? Use the inquiry form to ask the supplier directly.

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