Factory Supply Optical LiF Lithium Fluoride Crystal

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Specifications

Material: Lithium fluoride(LiF)
Material Grade: UV, Deep UV, Extreme UV
Available Sizes: φ180mm
Wavelength Range: 110nm-7μm
Crystal Structure: Monocrystalline, Polycrystalline
Orientation: <111>, <100>
Blank Shape: Round, rectangular, wedge, lens, step, drilled, special-shaped
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Features

  • Broad UV-EUV Spectral Coverage: Unmatched transmittance in EUV (down to 105 nm), DUV (105–200 nm), and UV (200–400 nm) ranges, with extended transmittance up to 8 μm in the mid-infrared, making it one of the few materials suitable for EUV applications
  • Multi-Grade Customization: Available in UV grade (optimized for 200–400 nm), DUV grade (105–200 nm), and EUV grade (105–120 nm) to match diverse high-precision application needs, all with ultra-high purity 
  • Low Optical Absorption & Scatter: Strict control over crystal growth parameters minimizes impurity content and internal defects, ensuring low absorption and scatter in UV-DUV-EUV bands—critical for high-power and high-precision optical systems
  • Excellent Thermal & Mechanical Stability: Low thermal expansion coefficient (12.1×10⁻⁶/°C) and high melting point (845°C), resisting thermal shock and deformation in extreme temperature environments
  • Flexible Custom Solutions: Support custom crystal orientation (e.g., [100], [111]), size, shape . Flexible production batches from prototypes to mass production
  • Chemical Inertness: Non-hygroscopic (no moisture absorption) and resistant to most acids (except strong alkalis), ensuring long-term stability in laboratory, industrial, and space environments

Applications

  • Semiconductor Lithography: EUV grade LiF crystals are critical for EUV lithography tools (13.5 nm) used in advanced microchip manufacturing; DUV grade options are applied in DUV lithography systems (193 nm, 248 nm) as optical components
  • UV-DUV-EUV Optics Fabrication: Core raw material for manufacturing LiF windows, lenses, prisms, and beamsplitters used in UV-DUV-EUV optical systems
  • Scientific Research: Applied in synchrotron radiation experiments, EUV spectroscopy, high-energy physics detectors, and fusion research requiring ultra-pure optical materials for short-wavelength light manipulation
  • Aerospace & Defense: Used in space-based EUV telescopes, solar physics instruments, and missile guidance systems—withstanding extreme vacuum, temperature, and radiation conditions while maintaining EUV transmittance
  • High-Power UV Lasers: UV-DUV grade LiF crystals serve as optical components in high-power UV laser systems (e.g., excimer lasers) due to their low absorption and high laser damage threshold