Non-Polarizing BK7 UVFS, and ZnSe Plate Beamsplitters for Monochromatic Beam Applications

Specifications

Material: N-BK7, UV Fused Silica
Wavelength Range: 300 – 2000 nm
Max Beam Deviation: 3 arcmin
Surface Quality: 10-5 Scratch-Dig
Surface Figure: Lambda/20 @ 632 nm
Large Dimension And Thickness: Custom
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Features


  • Non-Polarizing Design: Maintains the polarization characteristics of the incident beam, ideal for applications requiring precise polarization control.

  • High-Quality Materials: Available in BK7, UVFS, and ZnSe for versatile application use.

  • Optimal Angle of Incidence: Designed for a 45º angle of incidence, ensuring maximum performance.

  • Precise Diameter and Thickness Tolerance: Diameter tolerance of +0.000", –0.010"; thickness tolerance of ±0.010".

  • Minimal Wedge: ≤ 3 arc minutes to ensure minimal beam deviation.

  • Defined Bevels: 0.010" – 0.030" at 45º for edge protection.

  • Clear Aperture: Central 85% of diameter, providing a large usable area.

  • Adjustable Reflectance: Reflectance range of 10% ≤ R ≤ 90% ± 3% with |R – Rs.p| ≤ 3%.

  • Advanced Anti-Reflection Coating: Unpolarized R ≤ 0.5% at 45º, enhancing transmission efficiency.

Applications


  • Optical Systems: Ideal for systems requiring the division of a monochromatic beam into reflected and transmitted components while maintaining polarization characteristics.

  • Laser Applications: Suitable for laser systems where maintaining the polarization of the incident beam is crucial.

  • Scientific Research: Used in experiments and setups that require precise control over beam splitting and polarization.

  • Imaging Systems: Can be integrated into imaging systems where non-polarizing characteristics are necessary to prevent image distortion.

  • Telecommunications: Utilized in optical communication systems to manage signal paths without altering polarization states.

  • Optical Testing Equipment: Essential in testing equipment where accurate beam splitting and polarization maintenance are required for precise measurements.

  • Microscopy: Applied in advanced microscopy techniques that benefit from non-polarizing beam splitters to enhance image clarity.

  • Holography: Used in holographic setups to ensure high-quality image reproduction by maintaining the desired beam characteristics.