Description
The NeoVan™ Ultra-Compact Diode Laser Module represents a breakthrough in laser technology, offering unparalleled performance in an incredibly compact form factor. Engineered with precision and reliability in mind, this diode laser module is ideal for a wide range of demanding applications where stability, precision, and beam quality are paramount.
At the heart of the NeoVan™ is advanced temperature stabilization technology, ensuring consistent performance even in challenging operating environments. This temperature stabilization mechanism not only enhances the stability of the laser output but also extends the operational lifespan of the module, making it a highly reliable solution for long-term use.
With a choice of wavelengths ranging from 405 nm to 640 nm and output powers of up to 500 mW, the NeoVan™ offers versatility to meet the diverse needs of various applications. Whether used in biomedical imaging, flow cytometry, confocal microscopy, spectroscopy, or laser-induced fluorescence, the NeoVan™ delivers exceptional performance across the board.
The compact design of the NeoVan™ makes it easy to integrate into existing systems without sacrificing performance. Measuring just 57 mm x 21 mm x 21 mm, this module is perfect for applications where space is limited, allowing for seamless integration into compact instruments and devices.
Furthermore, the NeoVan™ boasts outstanding beam quality, with a narrow beam diameter and low divergence, ensuring precise and accurate laser output. This high beam quality, combined with a polarization ratio exceeding 100:1, makes the NeoVan™ the preferred choice for applications requiring precision and reliability.
Backed by RPMC Lasers' reputation for excellence and innovation, the NeoVan™ Ultra-Compact Diode Laser Module sets a new standard for performance, reliability, and versatility in the world of laser technology. Whether you're conducting cutting-edge research in the lab or developing advanced medical devices in the field, trust the NeoVan™ to deliver consistent and reliable performance every time.
NeoVan: Ultra-Compact Diode Laser Module
Specifications
| Center Wavelength: | 1064 nm |
|---|---|
| Pulse Energy: | 5 mJ |
| Energy Stability (RMS): | 1 % |
| Polarization: | Unspecified |
| Spatial Mode (M^2): | <1.3 |
| Amplification Scheme: | Not Specified |
| Polarization Ration: | >100:1 |
| Input Power: | 0 – 40 dBm |
| Output Power: | 5 – 100 W |
| Mode Of Operation: | CW to ps pulses |
| Ambient Temp.: | 15-35 °C |
| Laser Controller: | 19'' Rackmount |
Got questions about specs? Use the inquiry form to ask.
Features
Key Features of the neoLASE neoYb Laser Amplifier Module
- 1030 nm Yb laser amplifier module designed for power and pulse-energy boosting in ultrafast and industrial laser systems.
- Output power range from 5 W to 100 W, supporting scalable amplification for OEM and laboratory laser platforms.
- Flexible operation from CW to femtosecond pulses, making it suitable for continuous-wave, picosecond, and femtosecond laser applications.
- Excellent beam quality with TEM00 mode and M2 < 1.3 for high-precision focusing and consistent processing results.
- OEM-type solid-state laser amplifier engineered for integration into laser machines, scientific lasers, and low-power oscillator systems.
- Compact stand-alone module with integrated amplifier and pump diode for simplified system design and fast implementation.
- Ideal power booster for femtosecond laser systems, increasing average output power while preserving high beam quality.
- Efficient pulse energy amplification for upgrading low-power seed lasers, mode-locked oscillators, and gain-switched diode sources.
- CPA-free amplification capability for bandwidth-limited ultrashort pulses, reducing system complexity by avoiding bulky compressor arrangements in suitable configurations.
- Ultra-compact, nearly monolithic design enables easy integration and cost-effective upgrading of existing laser platforms.
- Highly flexible and scalable amplifier architecture allows configuration as a pre-amplifier or main amplifier stage depending on application requirements.
- Main amplifier options exceeding 50 W output power for demanding industrial and scientific laser applications.
- High-gain pre-amplifier capability supports direct amplification of mode-locked oscillators and low-power seed sources.
- Proven long-term stability and industrial reliability based on neoLASE solid-state laser technology.
- Designed for high peak power ultrafast lasers used in precision micromachining, materials processing, research, and OEM laser system development.
- Cost-effective laser performance upgrade for increasing pulse energy or average power without replacing the complete laser source.
- Suitable for scientific and industrial environments requiring compact footprint, reliable operation, and high optical performance.
Applications
- Femtosecond laser power boosting: Ideal for increasing pulse energy and average output power in 1030 nm femtosecond laser systems without adding bulky amplifier architectures.
- Picosecond laser amplification: Suitable for amplifying short-pulse picosecond sources used in precision industrial processing, scientific research, and OEM laser platforms.
- Ultrafast laser micromachining: Enables high-quality cutting, drilling, structuring, and ablation of metals, ceramics, polymers, glass, and semiconductor materials with minimal heat affected zones.
- Precision micro-drilling: Supports high peak power laser drilling for microvias, injector nozzles, medical components, electronics, and high-precision industrial parts.
- Thin-film ablation and patterning: Well suited for selective removal and patterning of thin films in photovoltaics, displays, sensors, microelectronics, and coating technologies.
- Semiconductor processing: Applicable for wafer dicing, scribing, trimming, defect repair, surface texturing, and precision material modification using high beam quality 1030 nm laser amplification.
- Glass and transparent material processing: Useful for internal modification, cutting, welding, marking, and micro-structuring of glass, sapphire, fused silica, and other transparent materials.
- Medical device manufacturing: Supports high-precision laser processing of stents, implants, catheters, surgical tools, microfluidic devices, and biocompatible materials.
- Electronics manufacturing: Ideal for PCB microprocessing, flexible electronics structuring, laser trimming, component marking, and high-resolution material removal.
- Photovoltaic manufacturing: Suitable for solar cell scribing, edge isolation, selective emitter processing, thin-film patterning, and precision laser ablation steps.
- Battery and energy storage manufacturing: Enables precision laser structuring, cutting, drilling, and surface treatment of battery foils, electrodes, current collectors, and advanced energy materials.
- Additive manufacturing and surface finishing: Can be integrated into laser systems for surface texturing, post-processing, polishing, and localized material modification.
- Scientific ultrafast laser research: Provides a compact 1030 nm amplifier stage for laboratories requiring higher pulse energy, higher average power, or scalable ultrafast laser performance.
- Mode-locked oscillator amplification: Designed for direct amplification of mode-locked oscillators in compact femtosecond and picosecond laser architectures.
- Gain-switched diode amplification: Suitable as a pre-amplifier or booster stage for gain-switched diode laser sources requiring improved pulse energy and beam quality.
- OEM laser system integration: Compact, stand-alone amplifier module for integration into industrial laser machines, scientific instruments, and custom ultrafast laser platforms.
- Laser machine upgrades: Cost-effective solution for increasing output power or pulse energy of existing laser systems without complete source replacement.
- High-power seed laser amplification: Applicable as a main amplifier stage for seed sources that require scalable output power from 5 W up to 100 W.
- CPA-free ultrafast amplification: Useful for bandwidth-limited pico- and femtosecond pulse amplification where compactness and simplified system design are required.
- Nonlinear optics and frequency conversion: Supports generation of green, UV, and other converted wavelengths through SHG, THG, OPA/OPCPA pumping, and nonlinear optical experiments.
- Multiphoton microscopy and bioimaging: Can be used to boost ultrafast laser sources for advanced imaging, excitation, fluorescence microscopy, and biomedical photonics research.
- Time-resolved spectroscopy: Suitable for pump-probe spectroscopy, ultrafast dynamics studies, material characterization, and high-repetition-rate laboratory experiments.
- Laser-induced breakdown spectroscopy: Provides high peak power pulse amplification for LIBS systems used in material analysis, process monitoring, and elemental detection.
- Precision laser marking and engraving: Enables high-contrast, low-thermal-damage marking on metals, plastics, ceramics, glass, and technical components.
- Aerospace and automotive manufacturing: Supports microstructuring, drilling, trimming, and high-precision processing of demanding components and advanced engineering materi
Frequently Asked Questions
What is the neoLASE neoYb laser amplifier module used for?
What wavelength and output power does the neoYb amplifier module provide?
Can the neoLASE neoYb amplifier support femtosecond laser pulses?
Does the neoYb laser amplifier require chirped pulse amplification, or CPA?
What beam quality does the neoLASE neoYb amplifier module deliver?
What seed lasers can be amplified with the neoYb amplifier module?
How does the neoLASE neoYb compare with fiber laser amplifiers for ultrafast applications?
Got more questions? Use the inquiry form to ask the supplier directly.
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