HM Harmonic Module: High-Performance Wavelength Conversion, 4 Switchable Outputs

• Multiple Wavelength Outputs: The HM Harmonic Module supports up to four switchable wavelengths (1030 nm, 515 nm, 343 nm, 258 nm) in a single unit, providing unmatched flexibility for various applications.
• High Conversion Efficiency: Achieve high conversion efficiency with pulse durations of less than 300 fs, ensuring optimal performance for demanding tasks.
• Customizable Outputs: Offers the ability to use unused harmonic outputs as a multichannel IR beam switch, allowing for tailored configurations to meet specific needs.
• Automated Conversion Control: Fully automated conversion efficiency control ensures consistent performance and ease of use.
• Advanced Power Stability: Designed for long-term power stability with closed-loop power stabilization, ensuring reliable operation over extended periods.
• Flexible Integration: The module's sealed, robust construction allows for direct mounting on the laser head or integration into any workstation, offering maximum flexibility for OEMs and system integrators.
• Customizable Beam Diameter: Beam diameter and output configurations can be customized for seamless integration into existing systems.
• Automated Wavelength Switching: Fully automated, software-controlled wavelength switching for ease of operation and quick adjustments.
• Gas Purging Capability: Designed for gas purging to ensure extended lifetime and consistent power stability.
• Compact Design: The module features a compact design with dimensions of 320 x 393 x 88.3 mm, making it suitable for various installation environments.
• User-Friendly Interface: Control the module easily with a GUI via USB, simplifying operation and monitoring.

Applications for the HM Harmonic Module

The HM Harmonic Module is designed for high-performance femtosecond laser wavelength conversion, enabling software-controlled access to 1030 nm, 515 nm, 343 nm, and 258 nm outputs. Its switchable harmonic generation, high conversion efficiency, sealed purge-ready housing, and automated beam adjustment make it suitable for demanding industrial, scientific, and OEM laser integration applications.

• Ultrafast Laser Micromachining: Ideal for precision ablation, drilling, cutting, and surface structuring where femtosecond pulse duration and stable harmonic outputs are required for minimal heat-affected zones.
• Semiconductor Processing: Supports high-precision laser processing of silicon, compound semiconductors, wafers, thin films, and advanced electronic substrates using IR, green, UV, and deep-UV wavelengths.
• Microelectronics Manufacturing: Suitable for PCB processing, flex circuit cutting, via drilling, copper patterning, ceramic substrate machining, and micro-feature generation in electronic components.
• Display and OLED Manufacturing: Enables precise processing of display materials, OLED layers, thin films, cover glass, and transparent conductive coatings using wavelength-selective femtosecond laser interaction.
• Glass and Transparent Material Processing: The 1030 nm and harmonic outputs are useful for scribing, cutting, drilling, internal modification, and selective ablation of glass, fused silica, sapphire, and other transparent materials.
• Polymer and Medical Polymer Processing: UV and DUV femtosecond outputs support clean processing of polymers, bioresorbable materials, catheters, microfluidic chips, and other heat-sensitive materials.
• Medical Device Manufacturing: Suitable for producing stents, implants, surgical tools, diagnostic components, microfluidic devices, and precision medical parts requiring clean edges and high repeatability.
• Solar Cell and Photovoltaic Processing: Can be integrated into systems for thin-film patterning, PERC cell processing, selective ablation, isolation scribes, and microstructuring of photovoltaic materials.
• Battery and Energy Storage Research: Applicable for laser structuring, electrode patterning, thin-film removal, and high-precision material modification in battery, fuel cell, and energy device development.
• Thin Film Ablation and Patterning: Enables selective removal and patterning of metallic, dielectric, semiconductor, and organic thin films with high spatial accuracy.
• Surface Functionalization: Supports laser-induced surface texturing, wettability control, friction reduction, adhesion enhancement, black marking, and micro/nano-structuring of metals, ceramics, polymers, and glass.
• High-Precision Laser Marking: Useful for permanent, high-contrast marking of industrial components, medical devices, electronics, ceramics, and metals where ultrafast laser quality is required.
• Materials Science Research: Provides flexible wavelength access for studying laser-material interaction, ablation thresholds, nonlinear absorption, carrier dynamics, and wavelength-dependent processing effects.
• Nonlinear Optics Experiments: Designed for applications requiring efficient second harmonic, third harmonic, and deep-ultraviolet generation from femtosecond pump lasers.
• Ultrafast Spectroscopy: Suitable for pump-probe spectroscopy, transient absorption measurements, time-resolved photoluminescence, and wavelength-selective excitation experiments.
• Photochemistry and Photophysics: The 343 nm and 258 nm outputs support UV and DUV excitation for molecular dynamics, photochemical reactions, protein studies, and advanced spectroscopy setups.
• Microscopy and Bioimaging: Applicable for nonlinear microscopy, multiphoton excitation, UV excitation microscopy, fluorescence studies, and advanced imaging systems requiring stable femtosecond laser wavelengths.
• Laser-Induced Fluorescence: Green, UV, and DUV outputs can be used for fluorescence excitation in analytical instrumentation, chemical sensing, environmental monitoring, and biological research.
• Raman and UV Spectroscopy: Suitable for wavelength-flexible spectroscopy platforms, including UV-enhanced Raman, resonance Raman, and material characterization systems.
• Photoelectron Spectroscopy: The DUV output option can support research systems for photoemission, surface science, and electronic structure studies where short-wavelength femtosecond pulses are required.