Factory Custom Optical UV Fused Silica JGS1 JGS2 50R/50T Plate Beamsplitter with Coating

Specifications

Largest Dimension: 300 mm
Thickness: 2 mm
Substrate: UV Fused Silica
Wavelength Range: 180 – 3000 nm
Dimension Tolerance: +0/-0.1mm
Splitting Ratio: 50/50 or custom
Surface Quality: 60-40, 40-20, or better
Surface Accuracy: 1/4λ
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Features

  • UV-Optimized Substrate: Constructed with fused silica, tailored for excellent performance across ultraviolet to near-infrared wavelength ranges
  • Advanced Beam Splitter Coating: Equipped with specialized coatings to split incident light into separate reflected and transmitted beams reliably
  • Minimized Light Loss: Designed to reduce optical absorption in the UV spectrum, preserving the integrity of the split light beams
  • Customizable Split Ratios: The coating can be adjusted to meet specific transmission/reflection proportion needs for different applications
  • Thermal Stability: Fused silica substrate offers strong resistance to temperature fluctuations, preventing optical distortion during operation
  • Easy System Integration: Flat-plate structure allows seamless incorporation into compact or precision optical setups

Applications

  • UV Spectroscopy Systems: Used to split light for simultaneous analysis of sample absorption and emission spectra
  • UV Laser Processing: Applied in UV laser micromachining equipment to split beams for power monitoring and process control
  • UV Fluorescence Microscopy: Helps separate excitation and emission light, enhancing imaging contrast and signal clarity
  • Semiconductor Lithography: Integrated into alignment systems for high-precision chip manufacturing processes
  • Optical Metrology: Utilized in UV optical measurement devices for accurate parameter testing
  • Environmental Monitoring: Assists in detecting UV-absorbing pollutants in atmospheric or water quality analysis tools