OCTOS 6 Automated Thin Film Deposition Cluster Tool
Description
The Kurt J. Lesker Company® OCTOS cluster tools are proven R&D and pilot production systems for in vacuum transfer between multiple process chambers. Typical applications include Magnetic Tunnel Junctions and Spin Logic devices (GMR, TMR, MRAM, STT), Organic Light Emitting Devices (OLED), Solar Cells (PV, OPV). The OCTOS cluster tools feature single or multiple substrate cassette load locks and allow process recipe steps to be completed in vacuum without exposing the substrate to atmosphere. OCTOS provides the ability to automatically process substrates sequentially one at a time or in parallel to increase throughput. Substrate tracking ability is available and full process datalogging is standard.
OCTOS 6 Automated Thin Film Deposition Cluster Tool
Specifications |
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|---|---|
| Substrate Size: | 150 - 150 mm |
| Base Vacuum: | -- Torr |
| Max Substrate Temperature: | -- degC |
| Process Type: | Chemical Vapor Deposition (CVD) |
Features
- High precision servo-controlled robot
- Robot MTBF >80,000 hours
- Stainless steel vacuum vessel construction with o-ring sealed top plate
- Modular framework
- Cryogenic or turbomolecular high vacuum pumping
- Accommodates up to 6'' (150 mm) substrates
- Fully automated computer control
- CF process chamber ports
Applications
- The OCTOS™ 6 robotic cluster tool facilitates accurate and repeatable multi chamber in-vacuum substrate transfer-ideal for R&D and pilot production applications.
- Fully automated with recipe control and is designed to accept standard, KJLC process modules. In addition, fully interconnected, independent control of each process module can be supplied, becoming a true multi-user installation.
For pricing, technical or any other questions please contact the supplier
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- No markups, no fees
- Direct contact with supplier
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