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Frequently Asked Questions

The PRO Line PVD 75 is a thin film deposition system used for university, industrial, and government lab R&D in various applications such as OLED/PLED, photovoltaics, optics, and small batch production.

The key advantages of the PRO Line PVD 75 include improved system base pressures and pump down times, a technically superior chamber design, advanced programming capability, automatic substrate loading, and optimized thin film performance.

The features of the PRO Line PVD 75 include an enclosed instrument rack and chamber base, a 304 stainless steel chamber with an aluminum door and large viewport, manual touch-screen or recipe-controlled process automation, and options for high vacuum pumping, substrate heating/cooling/biasing, and film thickness control.

The PRO Line PVD 75 is designed for thin film deposition in university, industrial, and government lab R&D, as well as applications in OLED/PLED, photovoltaics, semiconductor devices, optics, and decorative coatings.

The PRO Line PVD 75 can be equipped with up to (6) 3'' Torus® Magnetron Sputtering Cathodes, (4) 4'' Thermal Evaporation Sources, and up to 2 LTE Organic Material Evaporation Sources. It also supports ion source substrate cleaning or assisted deposition.

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