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Pioneer 180 PED System
Neocera Inc
In Pulsed Electron Deposition (PED), a pulsed (80-100 ns) high power electron beam (approximately 1000 A, 15 keV) penetrates approximately 1 μm into the target resulting in a rapid evaporation of target material. The non-equilibrium heating of the target facilitates stoichiometric ablation of the target material. Under optimum ...
  • Sustrate Size: 10 - 50.8 mm
  • Base Vacuum: 5 x 10-7  Torr
  • Max Substrate Temperature: 850 degC
  • Process Type: Pulsed Electron Deposition (PED)
Data Sheet
Pioneer 120 Advanced PLD System
Neocera Inc
Pioneer 120 Advanced PLD System is a stand-alone system for preparing high quality epitaxial films, multi-layer heterostructures and superlattices of a variety of materials. The primary difference between this PLD system and the Pioneer 120 PLD System is the substrate heating stage. Pioneer 120 uses a conductive heating stage where ...
  • Sustrate Size: 10 - 50.8 mm
  • Base Vacuum: 5 x 10-9 Torr
  • Max Substrate Temperature: 850 degC
  • Process Type: Pulsed Laser Deposition (PLD)
Data Sheet
Pioneer 120 PLD System
Neocera Inc
Pioneer 120 PLD System is the most basic PLD System. This is a stand-alone PLD system for preparing high quality epitaxial films, multi-layer heterostructures, superlattices etc. The primary difference between this PLD system and the Pioneer 120 Advanced and Pioneer 180 PLD Systems is the substrate heating stage. Pioneer 120 uses a ...
  • Sustrate Size: 25.4 - 50.8 mm
  • Base Vacuum: 5 x 10-7 Torr
  • Max Substrate Temperature: 950 degC
  • Process Type: Pulsed Laser Deposition (PLD)
Data Sheet