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OCTOS 6 Automated Thin Film Deposition Cluster Tool
Kurt J Lesker Co
The Kurt J. Lesker Company® OCTOS cluster tools are proven R&D and pilot production systems for in vacuum transfer between multiple process chambers. Typical applications include Magnetic Tunnel Junctions and Spin Logic devices (GMR, TMR, MRAM, STT), Organic Light Emitting Devices (OLED), Solar Cells (PV, OPV). The OCTOS cluster ...
  • Sustrate Size: 150 - 150 mm
  • Base Vacuum: -- Torr
  • Max Substrate Temperature: -- degC
  • Process Type: Chemical Vapor Deposition (CVD)
Data Sheet
ALD-150LX Atomic Layer Deposition System
Kurt J Lesker Co
The Kurt J. Lesker Company® (KJLC®) ALD150LX™ is an Atomic Layer Deposition (ALD) system designed specifically for advanced research and development (R&D) applications. Innovative ALD150LX™ design features, like our Patented Precursor Focusing Technology™, blended with advanced process capability provide ...
  • Sustrate Size: 150 - 150 mm
  • Base Vacuum: -- Torr
  • Max Substrate Temperature: 500 degC
  • Process Type: Chemical Vapor Deposition (CVD)
Data Sheet
PRO Line PVD 75 Thin Film Deposition System
Kurt J Lesker Co
The Kurt J. Lesker Company® PRO Line PVD 75 is the next generation thin film deposition system based on the workhorse PVD 75 platform. With more than 400 units in service worldwide, the PVD 75 is a proven, robust, and versatile design. The PRO Line PVD 75 builds on the successes of the original design with improved system base ...
  • Sustrate Size: 150 - 150 mm
  • Base Vacuum: 1500 Torr
  • Max Substrate Temperature: 850 degC
  • Process Type: Chemical Vapor Deposition (CVD)
Data Sheet
HEX Modular Deposition Systems
Korvus Technology Ltd
The HEX series is a compact and highly flexible range  of deposition systems which allow the user complete freedom to reconfigure the equipment to suit their current experimental needs or for a future change of direction. The system can be purchased at the most basic level and later upgraded to a ...
  • Sustrate Size: 0.5 - 6 mm
  • Base Vacuum: 300 Torr
  • Max Substrate Temperature: 500 degC
  • Process Type: Pulsed Laser Deposition (PLD)
Data Sheet
Pioneer 180 PED System
Neocera Inc
In Pulsed Electron Deposition (PED), a pulsed (80-100 ns) high power electron beam (approximately 1000 A, 15 keV) penetrates approximately 1 ╬╝m into the target resulting in a rapid evaporation of target material. The non-equilibrium heating of the target facilitates stoichiometric ablation of the target material. Under optimum ...
  • Sustrate Size: 10 - 50.8 mm
  • Base Vacuum: 5 x 10-7  Torr
  • Max Substrate Temperature: 850 degC
  • Process Type: Pulsed Electron Deposition (PED)
Data Sheet
Pioneer 120 Advanced PLD System
Neocera Inc
Pioneer 120 Advanced PLD System is a stand-alone system for preparing high quality epitaxial films, multi-layer heterostructures and superlattices of a variety of materials. The primary difference between this PLD system and the Pioneer 120 PLD System is the substrate heating stage. Pioneer 120 uses a conductive heating stage where ...
  • Sustrate Size: 10 - 50.8 mm
  • Base Vacuum: 5 x 10-9 Torr
  • Max Substrate Temperature: 850 degC
  • Process Type: Pulsed Laser Deposition (PLD)
Data Sheet
Pioneer 120 PLD System
Neocera Inc
Pioneer 120 PLD System is the most basic PLD System. This is a stand-alone PLD system for preparing high quality epitaxial films, multi-layer heterostructures, superlattices etc. The primary difference between this PLD system and the Pioneer 120 Advanced and Pioneer 180 PLD Systems is the substrate heating stage. Pioneer 120 uses a ...
  • Sustrate Size: 25.4 - 50.8 mm
  • Base Vacuum: 5 x 10-7 Torr
  • Max Substrate Temperature: 950 degC
  • Process Type: Pulsed Laser Deposition (PLD)
Data Sheet