ALD-150LX Atomic Layer Deposition System
Description
The Kurt J. Lesker Company® (KJLC®) ALD150LX™ is an Atomic Layer Deposition (ALD) system designed specifically for advanced research and development (R&D) applications. Innovative ALD150LX™ design features, like our Patented Precursor Focusing Technology™, blended with advanced process capability provide unparalleled flexibility and performance. With an emphasis on enabling and supporting innovative, cutting edge technology at the R&D level, the ALD150LX™ serves not only as a stand-alone platform, but provides connectivity with additional process and analysis modules in a cluster tool configuration.
ALD-150LX Atomic Layer Deposition System
Specifications |
|
|---|---|
| Substrate Size: | 150-150mm |
| Base Vacuum: | -- Torr |
| Max Substrate Temperature: | 500 degC |
| Process Type: | Chemical Vapor Deposition (CVD) |
Features
Unique Perpendicular Flow Reactor
Patented precursor focusing technology (PFT)TM
Thermal or plasma-enhanced ALD configuration
Analytical ports (70° angle of incidence) for in-situ ellipsometry
Multiple inlets for precursor delivery
Independent substrate heater stage
Unique heater design on source modules
Accessible, low maintenance design
Global service and process support
Applications
University, industrial and government lab R&D
Electronics
MEMS
Energy Storage
Solar encapsulation
Nanophotonics
Biomedical
And More
For pricing, technical or any other questions please contact the supplier
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How to order?
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Ships from:
United States
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Sold by:
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On FindLight:
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