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Ion Sources

3000 Ion Source
TELEMARK
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3000 Ion Source
Telemark ion beam sources have been designed to provide superior performance across large -5 and small substrates. Telemark technology offers low pressure operation (10 mbar) for a longer mean free path and higher ion energies than traditional End Hall sources.   The source design is extremely low maintenance ...

Specifications
Beam Diameter: 114 mm
Energy Range: 0.3-0.3keV
Beam Power: 3000 W
Beam Divergence: 80 deg
Weight: 30 kg
Data Sheet
750 Ion Source
TELEMARK
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750 Ion Source
Telemark ion beam sources have been designed to provide superior performance across large -5 and small substrates. Telemark technology offers low pressure operation (10 mbar) for a longer mean free path and higher ion energies than traditional End Hall sources.   The source design is extremely low maintenance with ...

Specifications
Beam Diameter: 63 mm
Energy Range: 0.3-0.3keV
Beam Power: 750 W
Beam Divergence: 80 deg
Weight: 28 kg
Data Sheet
1250 Ion Source
TELEMARK
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1250 Ion Source
Telemark ion beam sources have been designed to provide superior performance across large -5 and small substrates. Telemark technology offers low pressure operation (10 mbar) for a longer mean free path and higher ion energies than traditional End Hall sources.   The source design is extremely low maintenance ...

Specifications
Beam Diameter: 74 mm
Energy Range: 0.3-0.3keV
Beam Power: 1250 W
Beam Divergence: 80 deg
Weight: 28 kg
Data Sheet
Ion Gun Systems G-1
Beam Imaging Solutions
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Ion Gun Systems G-1
Beam Imaging Solutions (BIS) has two Ion Gun systems to offer. Each Gun includes an ion source assembly, heat sink, acceleration and focusing system, vertical deflection plates, a 6″ long velocity filter and a velocity filter guard ring control unit. Components are assembled in a vacuum housing fitted with a flange for mounting ...

Specifications
Beam Diameter: -- mm
Energy Range: 0.5-10keV
Data Sheet
6 cm RF Ion Beam Source
Plasma Process Group
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6 cm RF Ion Beam Source
Our smallest ion beam source, the 6cm RF can provide all the benefits of radio frequency ion source technology in a smaller, more compact, and less expensive form. With a maximum beam current of 200mA at 1500V, the 6cm source is ideal for research and smaller production systems. This source also finds a home in etch and ion beam ...

Specifications
Beam Diameter: 60 mm
Energy Range: 0.5-1.5keV
Data Sheet
12 cm RF Ion Beam Source
Plasma Process Group
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12 cm RF Ion Beam Source
Used primarily for ion assist, the 12cm RF ion beam source also finds great value as a deposition source in smaller systems or an ion beam figuring (IBF) source for large substrates. Providing additional service as a pre-clean source for substrates, the 12cm source is one of the most versatile options available. As with all RF ion ...

Specifications
Beam Diameter: 120 mm
Energy Range: 0.5-1.5keV
Data Sheet
16 cm RF Ion Beam Source
Plasma Process Group
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16 cm RF Ion Beam Source
Our 16cm RF high current (HC) ion beam source is an industry workhorse. When paired with our IBEAM power supply (and its internal generator) it has output capacity 800mA. This dynamic and versatile source can satisfy a huge array of needs in deposition and large-scale Ion assist processes. Available with standard molybdenum, ...

Specifications
Beam Diameter: 160 mm
Energy Range: 1-1keV
Data Sheet
FIB FOCUSED ION BEAM
Spellman High Voltage Electronics Corp
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FIB FOCUSED ION BEAM
Spellman’s FIB Series is an integrated multiple output high voltage power supply specifically designed for focused ion beam applications. It incorporates a high stability accelerator voltage with the floating outputs to drive traditional Ga Ion and Plasma Sources. An additional Lens Chassis is available, providing the high ...
Data Sheet
EBM20 OEM MODULE FOR SEM APPLICATIONS
Spellman High Voltage Electronics Corp
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EBM20 OEM MODULE FOR SEM APPLICATIONS
The EBM20 powers E-Beam Columns in Thermionic Scanning Electron Microscopes providing acceleration, bias and filament sources in a single compact package. Spellman’s proprietary HV packaging and encapsulation technology gives dramatic improvements in size, cost and performance compared to other SEM power supply offerings. The ...
Data Sheet

Frequently Asked Questions

Ion sources are used to generate streams of ions for a variety of applications, including mass spectrometry, ion beam lithography, and surface analysis. They are typically used in scientific research, but can also be found in industrial settings.

There are many different types of ion sources available, including electron impact sources, inductively coupled plasma sources, and atmospheric pressure ion sources, among others. The choice of ion source will depend on the specific application and the desired properties of the ion beam.

The specific mechanism by which an ion source works will depend on the type of source. In general, however, ion sources work by ionizing a sample or gas, and then extracting the resulting ions into a beam. The ions can then be analyzed or used for further processing.

Some important factors to consider when choosing an ion source include the type of ionization method, the required ion beam energy and current, and the compatibility of the source with your system. Other factors may include cost, maintenance requirements, and the specific features of the ion source.

Yes, the experts at various suppliers' teams are available to help you choose the right ion source for your specific application. Please feel free to use the "Contact Supplier" button (on product pages) to reach out to the supplier of those particular products.

Ion sources are crucial components of mass spectrometry and ion beam systems. At FindLight, you will find a wide selection of high-performance ion sources, including electron impact sources and inductively coupled plasma sources, among others. Our product catalog includes options from leading manufacturers, with detailed specifications and expert support available to help you find the right ion source for your application. Browse our selection today to discover the best ion sources for your needs.

Did You know?

Ion sources are devices that produce and emit streams of ions. They are used in a variety of applications, including mass spectrometry, ion beam lithography, and surface analysis. Ion sources can be classified into two main categories: gas-phase ion sources and solid-state ion sources. Gas-phase ion sources work by ionizing a gas, typically through the use of an electron beam, a laser, or a radioactive source. The resulting ions can then be extracted and used for further processing or analysis. Solid-state ion sources, on the other hand, work by ionizing a solid sample, typically through the use of a focused ion beam. The resulting ions can then be extracted and used for analysis or processing. There are many different types of ion sources available, including electron impact sources, inductively coupled plasma sources, and atmospheric pressure ion sources, among others. The choice of ion source will depend on the specific application and the desired properties of the ion beam. Ion sources can also be further classified based on their operation in either continuous or pulsed mode. Continuous ion sources emit a steady stream of ions, while pulsed sources emit short bursts of ions. Pulsed ion sources are used in time-resolved experiments, where researchers need to study processes that occur on very short timescales.
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