Quantas-Q1-213: High Energy Compact Nanosecond DUV DPSS Laser

Specifications

Avg. Power: 0.005 W
Wavelength: 213 nm
Repetition Rate: 0.001 – 0.05 kHz
Pulse Duration: 8 ns
Pulse-to-Pulse Stability (RMS): 5 %
Cooling: Air
Pulse Energy: 0.1 to 2.5 mJ
Power Drift: <3 %
Beam Divergence: 1.5 mrad
Polarization: Linear, horizontal
Typical Beam Diameter: 1.7 mm
Transmission Range: 0.5 – 95 %
Laser Head ( W×L×H): 110 × 231× 112 mm³
Controller Unit (W×L×H): 108 × 191 × 59 mm³
Power Adapter (W×L×H): 50 × 125 × 31 mm³
Harmonic Generator (W×L×H): 110 × 242 × 112 mm³
Ambient Temperatur: 15 – 30 ℃
Mains Voltage: 90 – 230 VAC, single phase, 47 – 63 Hz
Average Power Consumption: 15 – 30 W
Relative Humidity (non-condensing): 10 – 80 %

Got questions about specs? Use the inquiry form to ask.

Document icon Download Data Sheet Download icon

Features

  • High Pulse Energy & Power – Delivers up to 40 mJ per pulse and up to 0.5 W average output power, enabling demanding applications such as LIBS, laser ablation, and nonlinear spectroscopy.
  • Adjustable Repetition Rate – Supports up to 50 Hz variable pulse repetition rate (e.g., 40 mJ @ 10 Hz, 10 mJ @ 50 Hz), with factory-set maximum and flexible external triggering for user-optimized duty cycles.
  • Short Nanosecond Pulses – Provides 7–10 ns pulse duration (FWHM), delivering high peak powers for efficient material interaction and precise time‑resolved measurements.
  • Diode-Pumped, Air-Cooled Design – Water‑free, air‑cooled architecture eliminates chillers, circulating water, and bulky external power racks, minimizing maintenance and system complexity.
  • Compact & Lightweight Turnkey System – All laser electronics are integrated into the Q1 housing; only a lightweight controller and 12 VDC mains adapter are external. Total weight < 5 kg, ideal for benchtop setups, OEM integration, and portable systems.
  • Choice of Gain Medium & Wavelength – Configurable to emit 1053 nm (Nd:YLF) or 1064 nm (Nd:YAG), allowing users to select the optimal fundamental wavelength for their process or detection scheme.
  • Excellent Beam Quality & Stability – Low divergence fundamental beam supports efficient focusing and delivery, and enables high conversion efficiency in optional harmonic generation modules.
  • Athermal Nd:YLF Operation – At 1053 nm, the athermal properties of Nd:YLF allow operation from single shot up to maximum repetition rate with minimal changes in beam divergence or profile, ensuring repeatable, stable performance.
  • Long-Lifetime Pump Diode – Robust diode pumping architecture with > 2 Gshot lifetime supports long service intervals and reduced system downtime compared to lamp‑pumped alternatives.
  • Integrated Synchronization Outputs – Built‑in sync pulse generator for precise triggering of user equipment such as detectors, cameras, and timing electronics in pump–probe and time‑of‑flight experiments.
  • Remote Monitoring & Control – Standard Ethernet interface enables remote diagnostics, status monitoring, and control from a PC or over a network, simplifying integration into automated setups and OEM systems.
  • Optional Motorized Attenuator – PC‑controlled, attachable motorized attenuator allows automated, high‑precision adjustment of output pulse energy without disturbing beam alignment.
  • Optional Pulse Energy Monitoring – Attachable pulse energy monitor provides real‑time feedback of output energy for process control, calibration, and long‑term stability tracking.
  • Fiber-Coupled Output Available – Optional fiber coupling module allows flexible beam delivery to remote locations, microscopes, and instruments while maintaining beam quality and alignment stability.
  • Modular Harmonic Generation – Optional stand‑alone 2nd, 3rd, 4th, or 5th harmonic generator modules (H1 series) convert the fundamental to common visible and UV wavelengths for spectroscopy, micromachining, and photochemistry.
  • Shared Baseplate Mounting – Optional baseplate enables rigid, pre‑aligned mounting of the Q1 laser with H1 harmonic generator or fiber coupler, enhancing mechanical stability and simplifying system integration.
  • UV Optics Protection – Optional stand‑alone air‑purging unit extends the lifetime of UV optics by minimizing contamination and absorption losses in deep‑UV operation.
  • Low Operating Overhead – Runs from a simple 12 VDC power supply with high electrical‑to‑optical efficiency relative to lamp‑pumped systems, reducing operating cost and thermal load in laboratories and OEM platforms.
  • Maintenance-Friendly Turnkey Operation – User‑friendly design with no consumable flashlamps, no water system, and integrated control electronics results in minimal maintenance, rapid installation, and straightforward daily use.
  • Optimized for Demanding Applications – Performance and reliability tailored for LIBS, laser ablation, TOF spectroscopy, LIF, nonlinear spectroscopy, flash photolysis, photoacoustics, metrology, and other high‑peak‑power nanosecond applications.

Applications

  • Laser-Induced Breakdown Spectroscopy (LIBS) – Elemental analysis of metals, alloys, geological samples, soils, slurries, and industrial process streams; ideal for portable and lab-based LIBS systems using 1064 nm or 1053 nm high peak power pulses.
  • Laser Ablation and Micromachining – Precision removal of thin films, coatings, and bulk material on metals, ceramics, polymers, semiconductors, and glass; suitable for mask repair, patterning, surface texturing, and micro-drilling when combined with 2nd–5th harmonics.
  • Time-of-Flight (TOF) Mass Spectrometry – Pulsed desorption/ionization source for TOF and TOF‑SIMS systems; excellent temporal and spatial beam quality improves mass resolution and sensitivity.
  • Laser-Induced Fluorescence (LIF) Spectroscopy – Excitation source for LIF and PL (photoluminescence) measurements in gases, liquids, and solids; suitable for combustion diagnostics, flow visualization, plasma studies, and chemical sensing.
  • Nonlinear Optics and Frequency Conversion – Pump source for OPO/OPA, harmonic generation (2ω, 3ω, 4ω, 5ω), and other nonlinear experiments; low beam divergence and ns pulse width ensure efficient SHG/THG/FHG for UV and deep-UV generation.
  • Flash Photolysis and Pump–Probe Experiments – Excitation of transient species in photochemical and photobiological systems; ns pulses and variable repetition rate enable time-resolved kinetic studies over a wide temporal range.
  • Photoacoustic Spectroscopy and Imaging – Generation of acoustic waves for gas-phase trace detection, solid sample characterization, and biomedical photoacoustic imaging; compatible with NIR and frequency-converted VIS/UV wavelengths.
  • Metrology and Optical Testing – Precision timing, calibration, and characterization of photonic devices, detectors, and optical components; suitable for MTF measurements, reflectivity testing, and scattering studies.
  • Remote Sensing and LIDAR – Compact, air-cooled source for range finding, atmospheric sensing, and aerosol or pollutant detection using fundamental and harmonic wavelengths.
  • Raman Spectroscopy (Spontaneous and Resonant) – Excitation source for bulk and surface-enhanced Raman (SERS) spectroscopy; UV and visible harmonics are suitable for resonant Raman and pigment, polymer, or semiconductor analysis.
  • Plasma Generation and Diagnostics – Creation and probing of laser plasmas in laboratory and industrial environments; used for plasma parameter measurements, spectroscopy, and plasma-assisted material processing.
  • Optogenetics and Photostimulation (via Harmonics) – Frequency‑converted visible output for pulsed stimulation of neurons and biological tissues in neuroscience and cellular biology research.
  • Surface Structuring and Texturing – Formation of micro‑ and nano‑structured surfaces for wettability control, tribology optimization, and functional surface engineering using fundamental or UV harmonics.
  • Thin Film and Coating Characterization – Ablation-based depth profiling, defect detection, and adhesion testing of optical, electronic, and protective coatings.
  • Semiconductor and Microelectronics Processing – Marking, trimming, selective material removal, via drilling, and wafer-level characterization with tightly controlled ns pulses.
  • Scientific Research and Laboratory Development – General-purpose nanosecond laser source for university and R&D labs working in photonics, spectroscopy, quantum optics (e.g., pumping OPOs), and advanced materials studies.
  • Biomedical and Life Science Research – Time-resolved fluorescence, phosphorescence, and photoacoustic studies of biological samples; suitable as an excitation source for contrast agent development and tissue optics research.
  • Forensic and Cultural Heritage Analysis – LIBS, LIF, and Raman-based non‑destructive testing of artworks, historical artifacts, inks, paints, and residues; portable, air‑cooled design simplifies field deployment.
  • Industrial Process Monitoring and Quality Control – In‑line LIBS and ablation-based sensors for real-time composition analysis of melts, slags, powders, and production samples; robust design supports OEM integration.