Rigel u80 High Power UV Laser for Industrial Applications

Specifications

Avg. Power: 80 W
Wavelength: 355 nm
Repetition Rate: 5 – 20 kHz
Spatial Mode (M^2): 25
Pulse Duration: 50 ns
Pulse-to-Pulse Stability (RMS): 1 %
Cooling: Water-to-Water
Pulse Energy: 8 mJ
Power Stability: <2%
Supply Voltage: 3-phase N+E, 220 or 400 VAC (±10%)
Supply Frequency: 50 or 60 Hz
Nominal Power Consumption: 18 kVA
Gas Purge: N2 or Air (Grade N5.0, <1 ppm THC)
Laser Dimensions: 1600 x 500 x 215 mm
Control Rack Dimensions: 1195 x 600 x 970 mm
Environmental Conditions: Temp 15 - 32°C and RH <60% (90% max, non condensing)
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Features

  • High Power Output: Delivers up to 80W average power in an unpolarized multi-mode beam at 355 nm wavelength.
  • Pulse Energy: Capable of pulse energy up to 8 mJ.
  • Pulse Duration: Short pulse duration of 50 ns for precise applications.
  • Beam Quality: M2 < 25, ensuring excellent beam quality.
  • Power Stability: Exceptional power stability with <2% variation (1σ).
  • Advanced Control System: Features a GUI-controlled interface for ease of use.
  • Output Options: Offers dual polarized outputs and a single unpolarized output for versatile applications.
  • Rugged Design: Proven durable head design suitable for industrial environments.
  • Universal Control System: Includes a system controller, temperature controller, RF driver, and heat exchanger for optimal performance.

Applications

  • Material Processing
  • Photovoltaic Processing
  • Thin Film Removal
  • Laser Lift Off (LLO)
  • Annealing
  • Surface Cleaning